Dr. Martijn E.A. Brouwer Profile

Dr. Martijn E.A. Brouwer

Optical Designer at TNO

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Author

Publications (4)

Proceedings Article | 26 August 2024 Presentation + Paper

System performance of the laser projection system (LPS) for the ELT

Jan Nijenhuis, Fred Kamphues, Martijn van Riel, René Hazelebach, Bart Speet, Jos Groote-Schaarsberg, Glenn van Zalen, Douwe Jan IJlst, Wouter Jonker, Max Baeten, Martijn Brouwer, Martin Lemmen, Ralph Pohl, Mike Evers, Marten Wijnja, Jeroen de Vos, Coen Blok, Bram Siebers, Emmanuel Aller-Carpentier, Domenico Bonaccini Calia, Wolfgang Hackenberg

Proceedings Volume 13100, 131001D (2024) https://doi.org/10.1117/12.3020152

KEYWORDS: Mirrors, Design, Telescopes, Manufacturing, Optical testing, Optical fabrication, Projection systems, Polarization, Laser guide stars, Baffles

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Proceedings Article | 19 October 2023 Presentation + Paper

A multispectral polarimetric instrument concept based on metasurface filters

Tiberiu Ceccotti, Benjamin Brenny, Giampiero Gerini, Martijn Brouwer, Jérôme Caron, Nurcan Aplay Koç, Anton Leemhuis

Proceedings Volume 12729, 127290X (2023) https://doi.org/10.1117/12.2680292

KEYWORDS: Tunable filters, Polarization, Optical filters, Equipment, Polarimetry, Optical transmission, Aerosols, Signal to noise ratio, Mueller matrices, Modeling

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Proceedings Article | 17 November 2017 Open Access

Optical coatings for the Tropomi UV channel

Martijn Brouwer, Robin van Buuren, Niels Gawlitta, Semen Grabarnik, Nick van der Valk, Rob Vink, Hedser van Brug, Huib Visser

Proceedings Volume 10563, 105634R (2017) https://doi.org/10.1117/12.2304065

KEYWORDS: Ultraviolet radiation, Mirrors, Stray light, Optical coatings, Reflection, Transmitters, Astronomical imaging, Surface roughness, Light scattering, Scattering

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Proceedings Article | 17 November 2017 Open Access

A platform for European CMOS image sensors for space applications

K. Minoglou, D. San Segundo Bello, D. Sabuncuoglu Tezcan, L. Haspeslagh, J. Van Olmen, B. Merry, C. Cavaco, F. Mazzamuto, I. Toqué-Trésonne, R. Moirin, M. Brouwer, M. Toccafondi, G. Preti, M. Rosmeulen, P. De Moor

Proceedings Volume 10563, 1056304 (2017) https://doi.org/10.1117/12.2304233

KEYWORDS: Semiconducting wafers, Silicon, Imaging systems, Image processing, Antireflective coatings, Annealing, Astronomical imaging, Analog electronics, Coating, Optical amplifiers

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