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Masahiko Kitayama
Manager at Kuraray Co Ltd
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Publications (4)
Proceedings Article | 15 April 2008 Paper
Synthesis and evaluation of novel resist monomers and copolymers for ArF lithography: Part II
Osamu Nakayama, Takashi Fukumoto, Miki Tachibana, Junko Sato, Masahiko Kitayama, Tsuyoshi Kajiyashiki
Proceedings Volume 6923, 69233F (2008) https://doi.org/10.1117/12.771130
KEYWORDS: Polymers, Lithography, Chemical species, Spectroscopy, Quartz, Crystals, Polymerization, Chemical analysis, Oscillators, Oxygen
Proceedings Article | 6 April 2007 Paper
Dissolution behavior of resist polymers studied by Quartz-Crystal-Microbalance method II
Proceedings Volume 6519, 651913 (2007) https://doi.org/10.1117/12.711926
KEYWORDS: Polymers, Protactinium, Data modeling, Statistical analysis, Solids, Interfaces, Quartz, Crystals, Liquids, Modulation
Proceedings Article | 22 March 2007 Paper
Observing morphology on surface of poly(methacrylate) in ArF lithography using AFM phase image
Proceedings Volume 6519, 65193W (2007) https://doi.org/10.1117/12.711392
KEYWORDS: Polymers, Line edge roughness, Atomic force microscopy, Coating, Polymer thin films, Lithography, Molecules, Atomic force microscope, Chemically amplified resists, Polymerization
Proceedings Article | 29 March 2006 Paper
Synthesis and evaluation of novel resist monomers and copolymers for ArF lithography
Proceedings Volume 6153, 61532A (2006) https://doi.org/10.1117/12.656159
KEYWORDS: Polymers, Polymer thin films, Lithography, Quartz, Crystals, Oscillators, Line edge roughness, Absorption, Thin films, Photoresist processing
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