Dr. Michael E. Malinowski Profile

Dr. Michael E. Malinowski

Member of Technical Staff at Sandia National Labs California

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Publications (9)

Proceedings Article | 16 June 2003 Paper

Relation between electron- and photon-caused oxidation in EUVL optics

Michael Malinowski, Charles Steinhaus, Donald Meeker, W. Miles Clift, Leonard Klebanoff, Sasa Bajt

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.499360

KEYWORDS: Extreme ultraviolet lithography, Silicon, Mirrors, Photons, Electron beams, Extreme ultraviolet, Lithography, Electrons, Oxidation

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Proceedings Article | 16 June 2003 Paper

Design and performance of capping layers for EUV multilayer mirrors

Sasa Bajt, Henry Chapman, Nhan Nguyen, Jennifer Alameda, Jeffrey Robinson, Michael Malinowski, Eric Gullikson, Andy Aquila, Charles Tarrio, Steven Grantham

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484966

KEYWORDS: Reflectivity, Multilayers, Electron beams, Extreme ultraviolet lithography, Mirrors, Extreme ultraviolet, Ruthenium, Silicon, Molybdenum, Oxidation

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Proceedings Article | 1 July 2002 Paper

Controlling contamination in Mo/Si multilayer mirrors by Si surface capping modifications

Michael Malinowski, Chip Steinhaus, W. Miles Clift, Leonard Klebanoff, Stanley Mrowka, Regina Soufli

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472320

KEYWORDS: Reflectivity, Carbon, Silicon, Extreme ultraviolet, Extreme ultraviolet lithography, Contamination, Silicon carbide, Photons, Mirrors, Interfaces

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Proceedings Article | 1 July 2002 Paper

Studies of EUV contamination mitigation

Samual Graham, Michael Malinowski, Chip Steinhaus, Philip Grunow, Leonard Klebanoff

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472319

KEYWORDS: Carbon, Hydrogen, Reflectivity, EUV optics, Extreme ultraviolet lithography, Contamination, Extreme ultraviolet, Silicon, Etching, Oxidation

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Proceedings Article | 20 August 2001 Paper

First environmental data from the EUV engineering test stand

Leonard Klebanoff, Michael Malinowski, Philip Grunow, W. Miles Clift, Chip Steinhaus, Alvin Leung, Steven Haney

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436676

KEYWORDS: Contamination, Extreme ultraviolet, Carbon, Fiber optic illuminators, EUV optics, Reticles, Electrons, Bioalcohols, Wafer-level optics, Oxidation

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Proceedings Article | 20 August 2001 Paper

Use of molecular oxygen to reduce EUV-induced carbon contamination of optics

Michael Malinowski, Philip Grunow, Chip Steinhaus, W. Miles Clift, Leonard Klebanoff

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436677

KEYWORDS: Oxygen, Extreme ultraviolet, Carbon, Reflectivity, Extreme ultraviolet lithography, Mirrors, Silicon, Contamination, Information operations, Oxidation

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Proceedings Article | 23 November 1999 Paper

Lifetime studies of Mo/Si and Mo/Be multilayer coatings for extreme ultraviolet lithography

Marco Wedowski, Sasa Bajt, James Folta, Eric Gullikson, Ulf Kleineberg, Leonard Klebanoff, Michael Malinowski, W. Miles Clift

Proceedings Volume 3767, (1999) https://doi.org/10.1117/12.371120

KEYWORDS: Multilayers, Extreme ultraviolet lithography, Reflectivity, Extreme ultraviolet, Optical coatings, Carbon, Ozone, Mirrors, Contamination, Optical components

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Proceedings Article | 13 May 1994 Paper

Development of a laboratory extreme-ultraviolet lithography tool

Daniel Tichenor, Glenn Kubiak, Michael Malinowski, Richard Stulen, Steven Haney, Kurt Berger, Rodney Nissen, G. Wilkerson, Phillip Paul, S. Birtola, P. Jin, Richard Arling, Avijit Ray-Chaudhuri, William Sweatt, Weng Chow, John Bjorkholm, Richard Freeman, Marc Himel, Alastair MacDowell, Donald Tennant, Linus Fetter, Obert Wood, Warren Waskiewicz, Donald White, David Windt, Tanya Jewell

Proceedings Volume 2194, (1994) https://doi.org/10.1117/12.175834

KEYWORDS: Cameras, Semiconducting wafers, Extreme ultraviolet, Photomasks, Mirrors, Extreme ultraviolet lithography, Imaging systems, Multilayers, Plasma, Optical alignment

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Proceedings Article | 1 February 1994 Paper

Application of laser plasma sources in soft x-ray projection lithography

Daniel Tichenor, Glenn Kubiak, Michael Malinowski, Richard Stulen, Steven Haney, Kurt Berger, Rodney Nissen, Randal Schmitt, G. Wilkerson, P. Jin, William Sweatt, Weng Chow, John Bjorkholm, Richard Freeman, Marc Himel, Alastair MacDowell, Donald Tennant, Obert Wood, Warren Waskiewicz, Donald White, David Windt, Tanya Jewell

Proceedings Volume 2015, (1994) https://doi.org/10.1117/12.167986

KEYWORDS: Plasma, Imaging systems, Xenon, X-rays, Solids, Objectives, Projection lithography, Mirrors, Photomasks, Multilayers

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Showing 5 of 9 publications

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