Mr. Michael Mesawich Profile

Michael Mesawich

Vice President of Marketing at Pall Corp

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 23 March 2020 Paper

Defect mitigation and characterization in silicon hardmask materials

Vineet Alexander, Shyam Paudel, Glenn Dado, Lucia D'Urzo, Virgil Briggs, Mona Bavarian, Rao Varanasi, Tim Limmer, Nick Brakensiek, Levi Gildehaus, Mike Mesawich, Douglas Guerrero

Proceedings Volume 11326, 113261Q (2020) https://doi.org/10.1117/12.2552833

KEYWORDS: Silicon, Particles, Ions, Aluminum, Semiconducting wafers, Scanning electron microscopy, Plasma etching, Lithography

Read Abstract +

Proceedings Article | 27 March 2017 Paper

Advanced lithographic filtration and contamination control for 14nm node and beyond semiconductor processes

Rao Varanasi, Michael Mesawich, Patrick Connor, Lawrence Johnson

Proceedings Volume 10146, 101462B (2017) https://doi.org/10.1117/12.2260001

KEYWORDS: Semiconducting wafers, Particles, Photoresist materials, Lithography, Metals, Contamination control, Semiconductors, Wafer testing, Defect detection, Contamination

Read Abstract +

Proceedings Article | 1 April 2009 Paper

Microbridge and e-test opens defectivity reduction via improved filtration of photolithography fluids

Michael Mesawich, Michael Sevegney, Barry Gotlinsky, Santos Reyes, Patrick Abbott, Jeremy Marzani, Mario Rivera

Proceedings Volume 7273, 72730O (2009) https://doi.org/10.1117/12.814374

KEYWORDS: Ozone, Particles, Optical lithography, Microfluidics, Manufacturing, Photoresist materials, Back end of line, Semiconductors, Bridges, Lithography

Read Abstract +

Proceedings Article | 14 May 2004 Paper

Optimized filtration for reduced defectivity and improved dispense recipe in 193-nm BARC lithography

Phong Do, Joe Pender, Thomas Lehmann, Leo Mc Ardle, Barry Gotlinsky, Michael Mesawich

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.535557

KEYWORDS: Etching, Lithography, 193nm lithography, Industrial chemicals, Semiconducting wafers, Metals, Photoresist materials, Polymers, Chemistry, Logic

Read Abstract +

Proceedings Article | 12 June 2003 Paper

Spin-on bottom antireflective coating defect reduction by proper filter selection and process optimization

Nickolas Brakensiek, Brian Kidd, Michael Mesawich, Don Stevens, Barry Gotlinsky

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485101

KEYWORDS: Coating, Diffractive optical elements, Manufacturing, Thin film coatings, Semiconducting wafers, Bottom antireflective coatings, Chemistry, Sensors, Digital filtering, Particles

Read Abstract +

Proceedings Article | 23 June 2000 Paper

Measuring the effects of sub-0.1-um filtration on 248-nm photoresist performance

Barry Gotlinsky, James Beach, Michael Mesawich

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388292

KEYWORDS: Photoresist materials, Semiconducting wafers, Nitrogen, Deep ultraviolet, Particles, Polymers, Optical lithography, Contamination, Scanning electron microscopy, Tin

Read Abstract +

Showing 5 of 6 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years