Prof. Michael Totzeck Profile

Prof. Michael Totzeck

Fellow at Carl Zeiss AG

SPIE Involvement:

Conference Program Committee | Author

Publications (21)

Proceedings Article | 9 September 2010 Paper

Using orientation Zernike polynomials to predict the imaging performance of optical systems with birefringent and partly polarizing components

Johannes Ruoff, Michael Totzeck

Proceedings Volume 7652, 76521T (2010) https://doi.org/10.1117/12.871896

KEYWORDS: Polarization, Zernike polynomials, Wavefronts, Imaging systems, Wave plates, Polarizers, Apodization, Chemical elements, Optical imaging, Optical components

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SPIE Journal Paper | 1 July 2009

Orientation Zernike polynomials: a useful way to describe the polarization effects of optical imaging systems

Johannes Ruoff, Michael Totzeck

JM3, Vol. 8, Issue 03, 031404, (July 2009) https://doi.org/10.1117/12.10.1117/1.3173803

KEYWORDS: Zernike polynomials, Polarization, Wavefronts, Apodization, Wave plates, Resolution enhancement technologies, Polarizers, Lithography, Critical dimension metrology, Imaging systems

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Proceedings Article | 4 December 2008 Paper

Orientation Zernike Polynomials: a systematic description of polarized imaging using high NA lithography lenses

Tilmann Heil, Johannes Ruoff, Jens Timo Neumann, Michael Totzeck, Daniel Krähmer, Bernd Geh, Paul Gräupner

Proceedings Volume 7140, 714018 (2008) https://doi.org/10.1117/12.805438

KEYWORDS: Polarization, Wavefronts, Apodization, Zernike polynomials, Lithography, Critical dimension metrology, Imaging systems, Lithographic lenses, Diffraction, Process control

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Proceedings Article | 11 April 2008 Paper

Radiometric consistency in source specifications for lithography

Alan Rosenbluth, Jaione Tirapu Azpiroz, Kafai Lai, Kehan Tian, David O.S. Melville, Michael Totzeck, Vladan Blahnik, Armand Koolen, Donis Flagello

Proceedings Volume 6924, 69240V (2008) https://doi.org/10.1117/12.775121

KEYWORDS: Diffraction, Photomasks, Solids, Lithography, Semiconducting wafers, Wave propagation, Apodization, Computer simulations, Fourier transforms, Thin films

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There is a surprising lack of clarity about the exact quantity that a lithographic source map should specify. Under the plausible interpretation that input source maps should tabulate radiance, one will find with standard imaging codes that simulated wafer plane source intensities appear to violate the brightness theorem. The apparent deviation (a cosine factor in the illumination pupil) represents one of many obliquity/inclination factors involved in propagation through the imaging system whose interpretation in the literature is often somewhat obscure, but which have become numerically significant in today's hyper-NA OPC applications. We show that the seeming brightness distortion in the illumination pupil arises because the customary direction-cosine gridding of this aperture yields non-uniform solid-angle subtense in the source pixels. Once the appropriate solid angle factor is included, each entry in the source map becomes proportional to the total |E|^2 that the associated pixel produces on the mask. This quantitative definition of lithographic source distributions is consistent with the plane-wave spectrum approach adopted by litho simulators, in that these simulators essentially propagate |E|^2 along the interfering diffraction orders from the mask input to the resist film. It can be shown using either the rigorous Franz formulation of vector diffraction theory, or an angular spectrum approach, that such an |E|^2 plane-wave weighting will provide the standard inclination factor if the source elements are incoherent and the mask model is accurate. This inclination factor is usually derived from a classical Rayleigh-Sommerfeld diffraction integral, and we show that the nominally discrepant inclination factors used by the various diffraction integrals of this class can all be made to yield the same result as the Franz formula when rigorous mask simulation is employed, and further that these cosine factors have a simple geometrical interpretation. On this basis one can then obtain for the lens as a whole the standard mask-to-wafer obliquity factor used by litho simulators. This obliquity factor is shown to express the brightness invariance theorem, making the simulator's output consistent with the brightness theorem if the source map tabulates the product of radiance and pixel solid angle, as our source definition specifies. We show by experiment that dose-to-clear data can be modeled more accurately when the correct obliquity factor is used.

Proceedings Article | 27 March 2007 Paper

Modeling polarization for hyper-NA lithography tools and masks

Kafai Lai, Alan Rosenbluth, Geng Han, Jaione Tirapu-Azpiroz, Jason Meiring, Aksel Goehnermeier, Bernhard Kneer, Michael Totzeck, Laurens de Winter, Wim de Boeij, Mark van de Kerkhof

Proceedings Volume 6520, 65200D (2007) https://doi.org/10.1117/12.712272

KEYWORDS: Polarization, Photomasks, Lithography, Optical proximity correction, Diffraction, Birefringence, Pellicles, Critical dimension metrology, Optical lithography, Thin films

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Proceedings Article | 26 March 2007 Paper

The impact of projection lens polarization properties on lithographic process at hyper-NA

Bernd Geh, Johannes Ruoff, Jörg Zimmermann, Paul Gräupner, Michael Totzeck, Markus Mengel, Uwe Hempelmann, Emil Schmitt-Weaver

Proceedings Volume 6520, 65200F (2007) https://doi.org/10.1117/12.722317

KEYWORDS: Polarization, Wave plates, Resolution enhancement technologies, Polarizers, Birefringence, Optical components, Apodization, Lithography, Matrices, Optical proximity correction

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SPIE Journal Paper | 1 July 2005

Polarization influence on imaging

Michael Totzeck, Paul Gräupner, Tilmann Heil, Aksel Göhnermeier, Olaf Dittmann, Daniel Kraehmer, Vladimir Kamenov, Johannes Ruoff, Donis Flagello

JM3, Vol. 4, Issue 03, 031108, (July 2005) https://doi.org/10.1117/12.10.1117/1.2049187

KEYWORDS: Polarization, Diffraction, Wavefronts, Imaging systems, Zernike polynomials, Superposition, Jones vectors, Radio propagation, Birefringence, Lithography

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SPIE Journal Paper | 1 July 2005

Polarization effects associated with hyper-numerical-aperture (>1) lithography

Donis Flagello, Bernd Geh, Steven Hansen, Michael Totzeck

JM3, Vol. 4, Issue 03, 031104, (July 2005) https://doi.org/10.1117/12.10.1117/1.2039081

KEYWORDS: Polarization, Reticles, Birefringence, Photoresist materials, Chromium, Photomasks, Lithography, Sodium, Fiber optic illuminators, Imaging systems

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Proceedings Article | 12 May 2005 Paper

How to describe polarization influence on imaging

M. Totzeck, P. Graupner, T. Heil, A. Gohnermeier, O. Dittmann, D. Krahmer, V. Kamenov, J. Ruoff, D. Flagello

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.599908

KEYWORDS: Polarization, Diffraction, Wavefronts, Superposition, Imaging systems, Jones vectors, Zernike polynomials, Radio propagation, Wave propagation, Birefringence

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Proceedings Article | 12 May 2005 Paper

Challenges with hyper-NA (NA>1.0) polarized light lithography for sub lambda/4 resolution

Donis Flagello, Steven Hansen, Bernd Geh, Michael Totzeck

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.599913

KEYWORDS: Polarization, Reticles, Birefringence, Photoresist materials, Chromium, Lithography, Photomasks, Dielectric polarization, Imaging systems, Critical dimension metrology

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Proceedings Article | 4 November 2003 Paper

Comparative linewidth measurements on chrome and MoSi structures using newly developed microscopy methods

Bernd Bodermann, Werner Mirande, Norbert Kerwien, Alexander Tavrov, Michael Totzeck, Hans Tiziani

Proceedings Volume 5188, (2003) https://doi.org/10.1117/12.509713

KEYWORDS: Microscopy, Polarization, Diffraction, Photomasks, Optical microscopy, Interferometry, Grazing incidence, Phase shifting, Microscopes, Chromium

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Proceedings Article | 30 May 2003 Paper

Vector simulations of dark beam interaction with nanoscale surface features

Alexander Tavrov, Norbert Kerwien, Reinhard Berger, Hans Tiziani, Michael Totzeck, Boris Spektor, Josef Shamir, Gregory Toker, Andrei Brunfeld

Proceedings Volume 5144, (2003) https://doi.org/10.1117/12.500588

KEYWORDS: Polarization, Microscopes, Signal detection, Microscopy, Photodetectors, Interference (communication), Diffraction, Signal to noise ratio, Objectives, Inspection

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SPIE Journal Paper | 1 August 2002

Rigorous coupled-wave analysis calculus of submicrometer interference pattern and resolving edge position versus signal-to-noise ratio

Alexander Tavrov, Michael Totzeck, Norbert Kerwien, Hans Tiziani

OE, Vol. 41, Issue 08, (August 2002) https://doi.org/10.1117/12.10.1117/1.1490589

KEYWORDS: Signal to noise ratio, Polarization, Microscopes, Image analysis, Interference (communication), Interferometry, Silicon, Optical engineering, Calculus, Microscopy

Proceedings Article | 20 June 2002 Paper

Inspection of sub-wavelength structures and zero-order gratings using polarization interferometry

Michael Totzeck, Alexander Tavrov, Norbert Kerwien, Hans Tiziani

Proceedings Volume 4777, (2002) https://doi.org/10.1117/12.472233

KEYWORDS: Polarization, Interferometry, Silicon, Dielectric polarization, Phase interferometry, Birefringence, Refractive index, Polarizers, Phase shifts, Microscopy

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Proceedings Article | 20 June 2002 Paper

Quantitative Zernike phase-contrast microscopy by use of structured birefringent pupil-filters and phase-shift evaluation

Michael Totzeck, Norbert Kerwien, Alexander Tavrov, Eva Rosenthal, Hans Tiziani

Proceedings Volume 4777, (2002) https://doi.org/10.1117/12.472223

KEYWORDS: Wave plates, Polarization, Phase shifts, Interferometry, Microscopy, Polarizers, Liquid crystals, Mica, Phase interferometry, Numerical simulations

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Proceedings Article | 9 April 2001 Paper

High-resolution inspection of 2D microstructures using multimode polarization microscopy

Michael Totzeck, Harald Jacobsen, Hans Tiziani

Proceedings Volume 4349, (2001) https://doi.org/10.1117/12.425083

KEYWORDS: Polarization, Microscopy, Phase shifts, Interferometry, Polarizers, Mica, Dielectric polarization, Silicon, Phase measurement, Wave plates

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Proceedings Article | 11 November 1999 Paper

Usage of polarization for high-accuracy micrometrology sensors

Michael Totzeck, Harald Jacobsen, Hans Tiziani

Proceedings Volume 3897, (1999) https://doi.org/10.1117/12.369336

KEYWORDS: Polarization, Silicon, Microscopy, Diffraction, Microscopes, Interferometry, Sensors, Geometrical optics, Phase measurement, Numerical simulations

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