Dr. Mike V. Williamson Profile

Dr. Mike V. Williamson

Consulting Engineer

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 14 May 2004 Paper

Effect of background exposure dose upon line-edge roughness (LER)

Mike Williamson, Andrew Neureuther

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.535623

KEYWORDS: Line edge roughness, Data modeling, Photoresist materials, Lithography, Scanning electron microscopy, Statistical analysis, Critical dimension metrology, Photomasks, Semiconducting wafers, Diffusion

Read Abstract +

Proceedings Article | 12 June 2003 Paper

Enhanced quantitative analysis of resist image contrast upon line-edge roughness (LER)

Mike Williamson, Andrew Neureuther

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485150

KEYWORDS: Line edge roughness, Scanning electron microscopy, Point spread functions, Image enhancement, Image restoration, Photoresist materials, Image processing, Lithography, Image quality, Semiconducting wafers

Read Abstract +

Proceedings Article | 24 July 2002 Paper

Effects of image contrast and resist types upon line edge roughness (LER)

Mike Williamson, Xiaofan Meng, Andrew Neureuther

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474235

KEYWORDS: Line edge roughness, Scanning electron microscopy, Atomic force microscopy, Semiconducting wafers, Lithography, Photomasks, Metrology, Image enhancement, Chemically amplified resists, Semiconductor manufacturing

Read Abstract +

Proceedings Article | 14 September 2001 Paper

LAVA web-based remote simulation: enhancements for education and technology innovation

Sang Il Lee, Ka Chun Ng, Takashi Orimoto, Jason Pittenger, Toshi Horie, Konstantinos Adam, Mosong Cheng, Ebo Croffie, Yunfei Deng, Frank Gennari, Thomas Pistor, Garth Robins, Mike Williamson, Bo Wu, Lei Yuan, Andrew Neureuther

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435691

KEYWORDS: Printing, Java, Photomasks, Diffusion, Near field, Computer simulations, Optical simulations, Lithography, Human-machine interfaces, Etching

Read Abstract +

Proceedings Article | 23 June 2000 Paper

Lithographic performance of advanced thin resists

Mike Williamson, Andrew Neureuther

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388285

KEYWORDS: Polymers, Etching, Scanning electron microscopy, Dendrimers, Semiconducting wafers, Manufacturing, Lithography, Line edge roughness, Silicon, Oxides

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years