Dr. Mireille K. Akilian
Associate at Exponent Inc
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Dr. Akilian's areas of expertise include mechanical system design and testing; failure analysis; instrumentation and data acquisition; thin optics; surface metrology including interferometry and systems utilizing Shack-Hartmann wavefront sensors; and analytical and finite element analysis (FEA) including stress analysis, thermal analysis, and modal analysis.

Dr. Akilian’s previous work covers a wide range of precision design principles and applications with sub-micron repeatability requirements. She has extensive experience with ceramics, particularly porous ceramics used in precision air bearing, filtration, and high temperature applications. She has also worked with amorphous glasses, particularly on reducing the surface warp of sheet glass used in flat screen technologies, such as plasma screens and liquid crystal displays (LCD).
Publications (4)

Proceedings Article | 15 June 2006 Paper
Proceedings Volume 6266, 62663O (2006) https://doi.org/10.1117/12.672037
KEYWORDS: Metrology, Surface finishing, Epoxies, Space telescopes, Diffraction gratings, Assembly tolerances, Silicon, Semiconducting wafers, Polishing, X-ray telescopes

Proceedings Article | 1 September 2005 Paper
Ralf Heilmann, Mireille Akilian, Chi-Hao Chang, Robert Hallock, Ed Cleaveland, Mark Schattenburg
Proceedings Volume 5900, 590009 (2005) https://doi.org/10.1117/12.617788
KEYWORDS: Semiconducting wafers, Magnetorheological finishing, Metrology, Wafer-level optics, Silicon, Polishing, X-ray telescopes, X-rays, X-ray optics, Surface finishing

Proceedings Article | 11 October 2004 Paper
Proceedings Volume 5488, (2004) https://doi.org/10.1117/12.552001
KEYWORDS: Nanoimprint lithography, Reflection, Metrology, Diffraction gratings, Wafer-level optics, Thermography, Silicon, Wavefront sensors, Semiconducting wafers, Distortion

Proceedings Article | 29 January 2004 Paper
Proceedings Volume 5168, (2004) https://doi.org/10.1117/12.510258
KEYWORDS: Semiconducting wafers, Silicon, Etching, Diffraction gratings, Assembly tolerances, Optical fabrication, Optical lithography, Metrology, Nanoimprint lithography, Roentgenium

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