Dr. Miroslav Mihov Profile

Dr. Miroslav Mihov

at Univ of Limerick

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 15 October 2003 Paper

Two-step modified NERIME process using combined focused ion beam lithography and plasma etching

Khalil Arshak, Miroslav Mihov, Arous Arshak, Declan McDonagh, David Sutton, Simon Newcomb

Proceedings Volume 5220, (2003) https://doi.org/10.1117/12.503510

KEYWORDS: Image processing, Gallium, Photoresist processing, Lithography, Oxygen, Ions, Ion beams, Dry etching, Etching, Reactive ion etching

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Proceedings Article | 27 August 2003 Paper

Analysis techniques for investigation of photoresist silylation processes

Thomas Kinsella, Arousian Arshak, Declan McDonagh, Miroslav Mihov, Khalil Arshak, John Fitzgerald

Proceedings Volume 4876, (2003) https://doi.org/10.1117/12.463775

KEYWORDS: Photoresist materials, Photoresist developing, Silicon, Lanthanum, Statistical analysis, Scanning electron microscopy, Standards development, Optical microscopes, Image enhancement, Oxygen

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Proceedings Article | 27 August 2003 Paper

Liquid-phase silylation characterization of Shipley SPR500A-series resists using PRIME top-surface imaging process

Khalil Arshak, Miroslav Mihov, Arousian Arshak, Declan McDonagh, David Sutton, Simon Newcomb, Thomas Kinsella

Proceedings Volume 4876, (2003) https://doi.org/10.1117/12.463645

KEYWORDS: Silicon, Photoresist processing, Scanning electron microscopy, Image processing, Ultraviolet radiation, Absorbance, FT-IR spectroscopy, Spectroscopy, Transmission electron microscopy, Diffusion

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Proceedings Article | 12 June 2003 Paper

Negative resist image by dry etching as a novel top surface imaging process for ion-beam lithography

Khalil Arshak, Miroslav Mihov, Arousian Arshak, Declan McDonagh, David Sutton, Simon Newcomb

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485073

KEYWORDS: Gallium, Image processing, Photoresist processing, Ion beams, Lithography, Dry etching, Ions, Oxygen, Etching, Ion beam lithography

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Proceedings Article | 24 July 2002 Paper

Nanostructure patterns for Shipley SPR505A resist using PRIME process

Khalil Arshak, Miroslav Mihov, Arousian Arshak, Declan McDonagh, Michael Pomeroy, Simon Newcomb

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474177

KEYWORDS: Silicon, Photoresist processing, Ultraviolet radiation, Diffusion, FT-IR spectroscopy, Absorbance, Spectroscopy, Scanning electron microscopy, Lithography, Picture Archiving and Communication System

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