Dr. Moitreyee Mukherjee-Roy Profile

Dr. Moitreyee Mukherjee-Roy

Member of Technical Staff at Grace Semiconductor Manufacturing Corp

SPIE Involvement:

Author

SPIE Journal Paper | 1 April 2005

Intensity imbalance in phase shift masks and correction by multiple exposures

Moitreyee Mukherjee-Roy, Navab Singh, Sohan Mehta, Yasuki Kimura, Hideki Suda, Kazunori Nagai

JM3, Vol. 4, Issue 02, 023004, (April 2005) https://doi.org/10.1117/12.10.1117/1.1898043

KEYWORDS: Photomasks, Phase shifts, Monochromatic aberrations, Reticles, Diffraction, Critical dimension metrology, Cadmium, Scattering, Optical lithography, Semiconducting wafers

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Proceedings Article | 28 May 2004 Paper

Key challenges in across-pitch 0.33-k1 trench patterning using hybrid mask

Navab Singh, Moitreyee Mukherjee-Roy, Sohan Mehta, Hideki Suda, Takao Kubota, Yasuki Kimura, Hiroshi Kinoshita

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.547729

KEYWORDS: Photomasks, Optical lithography, Etching, Modulation, Phase shifts, Lithography, Binary data, Scanners, Manufacturing, Scanning electron microscopy

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Proceedings Article | 24 May 2004 Paper

Alignment in chromeless masks

Moitreyee Mukherjee-Roy, Navab Singh, Sohan Mehta, Hideki Suda, Takao Kubota, Yasuki Kimura, Hiroshi Kinoshita

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.538224

KEYWORDS: Scanning electron microscopy, Overlay metrology, Monochromatic aberrations, Optical lithography, Reticles, Photomasks, Etching, Mask making, Phase shifts, Structural design

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Proceedings Article | 3 May 2004 Paper

Patterning sub-50-nm Fin-FET using KrF lithography tool

Navab Singh, S. Jagar, Sohan Mehta, Moitreyee Mukherjee Roy, Rakesh Kumar, N. Balasubramanian

Proceedings Volume 5379, (2004) https://doi.org/10.1117/12.536040

KEYWORDS: Directed energy weapons, Optical lithography, Photomasks, Lithography, Field effect transistors, Semiconducting wafers, Electron beam lithography, Reticles, Scanning electron microscopy, Scanners

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Proceedings Article | 26 June 2003 Paper

Impact of scattering bars in damascene trench patterning

Sohan Mehta, Navab Singh, Moitreyee Mukherjee-Roy, Rakesh Kumar

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485377

KEYWORDS: Scattering, Critical dimension metrology, Binary data, Optical lithography, Photomasks, Reticles, Semiconducting wafers, Phase shifts, Modulation, Diffraction

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Proceedings Article | 2 June 2003 Paper

Evaluation of alignment target designs for Cu and low-K dual damascene processes

Moitreyee Mukherjee-Roy, Navab Singh, Sohan Mehta, Wai Chik, Chin Tiong Sim, Francis Cheong

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.482800

KEYWORDS: Optical alignment, Semiconducting wafers, Thin film coatings, Dielectrics, Signal processing, Photomasks, Overlay metrology, Sensors, Copper, Etching

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Proceedings Article | 30 July 2002 Paper

Effect of feature size, pitch, and resist sensitivity on side-lobe and ring formation for via hole patterning in attenuated phase-shift masks

Navab Singh, Moitreyee Mukherjee-Roy

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474484

KEYWORDS: Photomasks, Nanoimprint lithography, Optical lithography, Printing, Phase shifts, Diffraction, Scanning electron microscopy, Reticles, Lithography, Resolution enhancement technologies

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Proceedings Article | 24 July 2002 Paper

Effect of developer surfactant on lithography process latitudes and post pattern defect concentration

Moitreyee Mukherjee-Roy, Ngooi Wei, Rakesh Kumar, Satoshi Kawada

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474270

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Lithography, Defect inspection, Microelectronics, Optical lithography, Head-mounted displays, Scanning electron microscopy, Photoresist processing, Manufacturing

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Proceedings Article | 14 September 2001 Paper

Effect of hole shape error on lithography process window

Rakesh Kumar, Moitreyee Mukherjee-Roy, Cher-Huan Tan

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435672

KEYWORDS: Lithography, Optical lithography, Semiconducting wafers, Critical dimension metrology, Lithographic illumination, Image quality, Photomasks, Microelectronics, Roads, Metrology

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Proceedings Article | 24 August 2001 Paper

Organic BARC process evaluation for via first dual-damascene patterning

Cher-Huan Tan, Moitreyee Mukherjee-Roy, Woo-Min Jo, Rakesh Kumar, Pang Dow Foo, Santhanesh Sathappan, Siew Ngooi

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436913

KEYWORDS: Etching, Coating, Optical lithography, Photoresist processing, Lithography, Scanning electron microscopy, Semiconducting wafers, Reflectivity, Inspection, Thin films

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Proceedings Article | 22 August 2001 Paper

Evaluation of overlay measurement target designs for Cu dual-damascene process

Moitreyee Mukherjee-Roy, Rakesh Kumar, Ganesh Samudra

Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436732

KEYWORDS: Metals, Dielectrics, Copper, Oxides, Etching, Optical alignment, Photomasks, Overlay metrology, Reticles, Semiconducting wafers

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Proceedings Article | 26 April 2001 Paper

Exposure tool chuck flatness study and effects on lithography

Moitreyee Mukherjee-Roy, Cher-Huan Tan, Yong Tan, Ganesh Samudra

Proceedings Volume 4404, (2001) https://doi.org/10.1117/12.425211

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Scanners, Lithography, Optical lithography, Manufacturing, Manufacturing equipment, Factor analysis, Distortion, Sensors

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Showing 5 of 12 publications

Conference Committee Involvement (3)

Metrology, Inspection, and Process Control for Microlithography XX

20 February 2006 | San Jose, California, United States

Metrology, Inspection, and Process Control for Microlithography XIX

28 February 2005 | San Jose, California, United States

Metrology, Inspection, and Process Control for Microlithography XVIII

23 February 2004 | Santa Clara, California, United States

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