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Najmeh Sadegh
at ARCNL
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Publications (1)
Proceedings Article | 1 May 2023 Presentation + Paper
Influence of the anion in tin-based EUV photoresists properties
Quentin Evrard, Najmeh Sadegh, Chao Chun Hsu, Nicola Mahne, Angelo Giglia, Stefano Nannarone, Yasin Ekinci, Michaela Vockenhuber, Akira Nishimura, Tsuyoshi Goya, Takuo Sugioka, Albert Brouwer
Proceedings Volume 12498, 124980Z (2023) https://doi.org/10.1117/12.2658498
KEYWORDS: Extreme ultraviolet lithography, Photoresist materials, X-ray photoelectron spectroscopy, Extreme ultraviolet, Tin, Optical lithography, Materials properties, Lithography
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