Recently, there has been considerable interest in mass production technology of metal three-dimensional periodic nanostructures. For mass production, photolithography using diffraction phenomenon is well suited expect the disadvantage that it is difficult to fabricate the metal structures. Therefore, this paper reports for the first time a fabrication of the metal three-dimensional periodic nanostructures, by the diffraction-based lithography using metal ion-containing photoresists. In this report, Ag was used as a metal material to fabricate the structures. An examination of Ag+ concentration shows that for Ag+ equal to 0.28% or less, Ag nanoparticles are not formed on the photoresist. Under these conditions, it is found that the optimum exposure for fabricating the structures is 400 mJ/cm2.
In recent years, unique functions of nano-periodic structures have attracted much attention, and there is a need for
processing techniques with high processing efficiency and flexibility. Therefore, we focused on Talbot lithography, which
has excellent processing efficiency for periodic structures. In this paper, we use hologram-assisted Talbot lithography to
improve the processing flexibility of Talbot lithography. Hologram-assisted Talbot lithography is a method to improve
the processing flexibility of structures by using CNN to estimate the incident light distribution. In order to improve the
accuracy of the hologram-assisted Talbot lithography method for controlling periodic structures, we studied the learning
of CNN. And we showed that the shape and period of the structure can be controlled by using CNN.
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