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Nelson Hung
Account Manager at Rohm and Haas Electronic Materials Taiwan Ltd
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Publications (1)
Proceedings Article | 24 May 2004 Paper
Quantification of CD-SEM wafer global charging effect on CD and CD uniformity of 193 nm lithography
Chih-Ming Ke, Hsueh-Liang Hung, Anderson Chang, Jeng-Horng Chen, Tsai-Sheng Gau, Yao-Ching Ku, Burn Lin, Tadashi Otaka, Kazuhiro Ueda, Hiroki Kawada, Hiroaki Nomura, Nelson Ren
Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.536147
KEYWORDS: Semiconducting wafers, Scanning electron microscopy, Critical dimension metrology, Lithography, Metrology, Silicon, Standards development, Very large scale integration, Distortion, Inspection
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