Dr. Nick Pugliano Profile

Dr. Nick Pugliano

Global Marketing and Business Development Director at TE Circuit Protection

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Author

Publications (8)

Proceedings Article | 15 April 2008 Paper

Reflection control for immersion lithography at 45/32-nm nodes

Wan-Ju Tseng, Ruei-Hung Hsu, Shu Huei Hou, Tzu-Huai Tseng, Bill Lin, Chun Chi Yu, Sue Ryeon Kim, Jeong Yun Yu, Gerald Wayton, Maurizio Ciambra, Suzanne Coley, David Praseuth, Nick Pugliano

Proceedings Volume 6923, 69232Z (2008) https://doi.org/10.1117/12.776671

KEYWORDS: Metals, Lithography, Reflectivity, Optical lithography, Line width roughness, Immersion lithography, Reflection, Logic devices, Critical dimension metrology, Etching

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Proceedings Article | 15 April 2008 Paper

Reflection control for line features of multiple pitches at hyper NA

Michael Reilly, Michael Wagner, Warren Montgomery, Nick Pugliano, Stewart Robertson

Proceedings Volume 6923, 69233X (2008) https://doi.org/10.1117/12.772909

KEYWORDS: Reflectivity, Reflection, Diffraction, Polarization, Calibration, Photomasks, Light, Refractive index, Image acquisition, Photoresist processing

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Proceedings Article | 11 March 2005 Paper

Progress toward board-level optical interconnect technology

Matthew Moynihan, Bruno Sicard, Tuan Ho, Luke Little, Nick Pugliano, James Shelnut, Hai Bin Zheng, Phil Knudsen, Dan Lundy, Nancy Chiarotto, Curtis Lustig, Craig Allen

Proceedings Volume 5731, (2005) https://doi.org/10.1117/12.594675

KEYWORDS: Waveguides, Silicon, Optical interconnects, Copper, Signal attenuation, Polymers, Optics manufacturing, Reliability, Epoxies, Lithography

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Proceedings Article | 10 June 2004 Paper

Progress toward the development of manufacturable integrated optical data buses

Nick Pugliano, Nancy Chiarroto, John Fisher, Noel Heiks, Tuan Ho, Garo Khanarian, Matthew Moynihan, Nathan Pawlowski, Jim Shelnut, David Sherrer, Bruno Sicard, Hai-Bin Zheng

Proceedings Volume 5358, (2004) https://doi.org/10.1117/12.526879

KEYWORDS: Waveguides, Optics manufacturing, Polymers, Integrated optics, Manufacturing, Plating, Connectors, Silicon, Metals, Data integration

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Proceedings Article | 10 November 2003 Paper

Hybrid inorganic-organic aqueous base compatible waveguide materials for optical interconnect applications

Matthew Moynihan, Craig Allen, Tuan Ho, Luke Little, Nathan Pawlowski, Nick Pugliano, James Shelnut, Bruno Sicard, Hai Bin Zheng, Garo Khanarian

Proceedings Volume 5212, (2003) https://doi.org/10.1117/12.508142

KEYWORDS: Waveguides, Silicon, Optical interconnects, Lithography, Planar waveguides, Refractive index, Polymers, Scattering, Thermography, Birefringence

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Proceedings Article | 12 June 2003 Paper

Negative tone 193-nm photoresists

Nick Pugliano, Patrick Bolton, Tony Barbieri, Matt King, Michael Reilly, William Lawrence, Doris Kang, George Barclay

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485075

KEYWORDS: Photoresist materials, Polymers, Etching, Photomasks, Optical lithography, Lithography, Photoresist developing, Switching, Critical dimension metrology, Line edge roughness

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Proceedings Article | 12 June 2003 Paper

Mechanistic understanding of post-etch roughness in 193-nm photoresists

Young Bae, George Barclay, Patrick Bolton, Robert Kavanagh, Lujia Bu, Tatum Kobayashi, Tim Adams, Nick Pugliano, James Thackeray

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.483761

KEYWORDS: Etching, Photoresist materials, Oxides, Monochromatic aberrations, Polymers, Resistance, Atomic force microscopy, Chemical analysis, Lithography, Spatial light modulators

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Proceedings Article | 24 July 2002 Paper

Investigation of lithographic performance for 120-nm and sub-120-nm gate applications of advanced ArF resists based on VEMA co-polymers

Robert Kavanagh, George Orsula, Marie Hellion, George Barclay, Stefan Caporale, Nick Pugliano, James Thackeray, Benedicte Mortini

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474212

KEYWORDS: Polymers, Lithography, Line edge roughness, Prototyping, Logic, Data modeling, Manufacturing, Etching, Photoresist processing, Photoresist materials

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Showing 5 of 8 publications

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