Dr. Nora V. Edwards Profile

Dr. Nora V. Edwards

at SEMATECH Inc

SPIE Involvement:

Author

Publications (12)

SPIE Journal Paper | 1 April 2006

Oxidation resistance and microstructure of ruthenium-capped extreme ultraviolet lithography multilayers

Sasa Bajt, Zu Rong Dai, Erik Nelson, Mark Wall, Jennifer Alameda, Nhan Nguyen, Sherry Baker, Jeffrey Robinson, John Taylor, Andrew Aquila, Nora Edwards

JM3, Vol. 5, Issue 02, 023004, (April 2006) https://doi.org/10.1117/12.10.1117/1.2201027

KEYWORDS: Ruthenium, Silicon, Molybdenum, Extreme ultraviolet lithography, Reflectivity, Electrons, Oxides, Resistance, Transmission electron microscopy, Oxidation

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Proceedings Article | 23 March 2006 Paper

EUV testing of multilayer mirrors: critical issues

S. Hill, I. Ermanoski, S. Grantham, C. Tarrio, T. Lucatorto, T. Madey, S. Bajt, M. Chandhok, P. Yan, O. Wood, S. Wurm, N. Edwards

Proceedings Volume 6151, 61510F (2006) https://doi.org/10.1117/12.656502

KEYWORDS: Mirrors, Extreme ultraviolet, Reflectivity, Carbon monoxide, Extreme ultraviolet lithography, Molecules, EUV optics, Carbon, Reflectometry, Synchrotrons

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Proceedings Article | 6 May 2005 Paper

XCEED: XTREME commercial EUV exposure diagnostic experiment

Erik Antonsen, Keith Thompson, Matthew Hendricks, Darren Alman, Brian Jurczyk, David Ruzic, Tran Duc Chinh, Ginger Edwards, Stefan Wurm, Obert Wood, Robert Bristol

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599799

KEYWORDS: Ions, Xenon, Mirrors, Extreme ultraviolet, Photodiodes, Diagnostics, Sensors, Plasma, Reflectivity, Iron

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Proceedings Article | 6 May 2005 Paper

Characterization of collector optic material samples before and after exposure in LPP and DPP EUV sources

Huatan Qiu, Darren Alman, Keith Thompson, Matthew Coventry, Joshua Spencer, Matthew Hendricks, Erik Antonsen, Brian Jurczyk, David Ruzic, Tim Spila, Ginger Edwards, Stefan Wurm, Obert Wood, Robert Bristol

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600093

KEYWORDS: Molybdenum, Silicon, Ruthenium, Gold, Ions, Xenon, Palladium, Extreme ultraviolet lithography, Atomic force microscopy, Crystals

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The University of Illinois at Urbana-Champaign (UIUC) and several national laboratories are collaborating on an SEMATECH effort to characterize xenon plasma exposure effects on EUV condenser optics. A series of mirror samples provided by SEMATECH were exposed for 10M shots in an Xtreme Technologies XTS 13-35 commercial EUV discharge plasma source at UIUC and 5M at the high-power TRW laser plasma source at Sandia National Laboratories. Results for both pre and post-exposure material characterization are presented, for samples exposed in both facilities. Surface analysis performed by the Center for Microanalysis of Materials at UIUC investigates mirror degradation mechanisms by measuring changes in surface roughness, texture, and grain sizes as well as analysis of implantation of energetic Xe ions, Xe diffusion, and mixing of multilayers. Materials characterization on samples removed after varying exposure times in the XTS source, together with in-situ EUV reflectivity measurements, identify the onset of different degradation mechanisms within each sample over 1M-100M shots. Results for DPP-exposed samples for 10 million shots in our XCEED (Xtreme Commercial EUV Exposure Device) experiment showed, in general, that samples were eroded and the surfaces were roughened with little change to the texture. AFM results showed an increase in roughness by a factor of 2-5 times, with two exceptions. This was confirmed by x-ray reflectivity (XRR) data, which showed similar roughening characteristics and also confirmed the smoothening of two samples. SEM pictures showed that erosion was from 4-47 nm, depending on the sample material and angle of incidence for debris ions. Finally, microanalysis of the exposed samples indicated that electrode material was implanted at varying depths in the samples. The erosion mechanism is explored using a spherical sector energy analyzer (ESA) to measure ion species and their energy spectra. Energy spectra for ions derived from various chamber sources are measured as a function of the Argon flow rate and angle from the centerline of the pinch. Results show creation of high energy ions (up to E = 13 keV). Species noted include ions of Xe, the buffer gas, and various electrode materials. The bulk of fast ion ejection from the pinch includes Xe⁺ which maximizes at ~8 keV followed by Xe²⁺ which maximizes at ~5 keV. Data from samples analysis and ESA measurements combined indicate mechanism and effect for debris-optic interactions and detail the effectiveness of the current debris mitigation schemes.

Proceedings Article | 6 May 2005 Paper

Investigation of plasma-induced erosion of multilayer condenser optics

Richard Anderson, Dean Buchenauer, K. Williams, W. M. Clift, L. Klebanoff, N. V. Edwards, O. Wood, S. Wurm

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599859

KEYWORDS: Ions, Xenon, Plasma, Silicon, Molybdenum, Sputter deposition, Carbon, Pulsed laser operation, Gold, Silicon carbide

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Proceedings Article | 6 May 2005 Paper

Oxidation resistance of Ru-capped EUV multilayers

Sasa Bajt, Zu Rong Dai, Erik Nelson, Mark Wall, Jennifer Alameda, Nhan Nguyen, Sherry Baker, Jeffrey Robinson, John Taylor, Miles Clift, Andy Aquila, Eric Gullikson, N. V. Ginger Edwards

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.597443

KEYWORDS: Ruthenium, Reflectivity, Silicon, Multilayers, Oxides, Electron beams, Resistance, Molybdenum, Extreme ultraviolet lithography, Oxidation

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Proceedings Article | 6 May 2005 Paper

UIUC collector erosion and optical lifetime project results: time dependent exposures

Darren Alman, Huatan Qiu, Keith Thompson, Erik Antonsen, Joshua Spencer, Matthew Hendricks, Brian Jurczyk, David Ruzic, Timothy Spila, Ginger Edwards, Stefan Wurm, Obert Wood, Robert Bristol

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599978

KEYWORDS: Photodiodes, Mirrors, Extreme ultraviolet lithography, Extreme ultraviolet, Electrodes, Reflectivity, Atomic force microscopy, Scanning electron microscopy, Ions, Xenon

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Proceedings Article | 6 May 2005 Paper

The effect of debris on collector optics, its mitigation and repair: next-step a gaseous Sn EUV DPP source

Brian Jurczyk, Darren Alman, Erik Antonsen, Michael Jaworski, Michael Williams, David Ruzic, Tim Spila, Ginger Edwards, Stefan Wurm, Obert Wood, Robert Bristol

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600048

KEYWORDS: Ions, Plasma, Tin, Extreme ultraviolet, Mirrors, Gold, EUV optics, Metals, Etching, Molybdenum

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The critical issue related to advanced fuel plasma EUV sources is collector lifetime. The Illinois Debris-mitigation EUV Applications Laboratory (IDEAL) is continuing research with a dense plasma focus (DPF) light source. The IDEAL DPF electrodes have been redesigned in order to allow for advanced fuel testing, better pinch operation and increased debris generation. The DPF light source operates at negative polarity, 50 Hz, 3 kV and 7.5 Joules of energy per pulse with tetramethyltin [(CH3)4Sn] as an advanced fuel source. EUV output power is measured with filtered photodiodes and results from a gridded energy analyzer still show two primary ion components with a high-energy peak near 6keV. A Faraday-shielded immersed RF antenna provides a 2kW secondary discharge near the DPF for both pre-ionization and mitigation of the debris with a foil trap (>90%). In addition the Surface Cleaning of Optics by Plasma Exposure (SCOPE) facility has been constructed where evaporated and/or ion implanted metals can be deposited on and removed from EUV mirrors. In SCOPE metals were evaporated on to mirror samples held at various temperatures. A metal ion beam was also added to simulate the energetic erosive flux and a helicon plasma was used in situ to study plasma cleaning. Reactive ion etching of tin by chlorine and other gases has shown 500:1 selectivity factors and very high etch rates suitable to refresh an optical mirror surface within a few seconds. Mirror samples were analyzed at the Center for Microanalysis of Material where the diffusion and transport of the metals and surface roughness were studied for lifetime estimation. Lastly, the Xtreme Characterization EUV Experiment Device (XCEED) was used for characterization of the debris has been accomplished by use of an energy sector analyzer in combination with ion time-of-flight. This diagnostic has been designed to measure velocity, mass and charge states of the incoming ions and neutrals, giving discrete debris spectra while in negative polarity operation. Latest results will be presented based on this work.

Proceedings Article | 20 May 2004 Paper

The erosion of materials exposed to a laser-pulsed-plasma (LPP) extreme ultraviolet (EUV) illumination source

Richard Anderson, Dean Buchenauer, Leonard Klebanoff, Obert Wood, Nora Edwards

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.537852

KEYWORDS: Ions, Xenon, Plasma, Silicon, Extreme ultraviolet, Extreme ultraviolet lithography, Sputter deposition, Gold, Molybdenum, Particles

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Proceedings Article | 20 May 2004 Paper

Scaling studies of capping layer oxidation by water exposure with EUV radiation and electrons

W. Clift, Leonard Klebanoff, Charles Tarrio, Steven Grantham, Obert Wood, Stefan Wurm, Nora Edwards

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.537403

KEYWORDS: Electrons, Extreme ultraviolet lithography, Silicon, Oxides, Extreme ultraviolet, Oxygen, EUV optics, Mirrors, Reflectivity, Oxidation

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Proceedings Article | 17 December 2003 Paper

157-nm attenuated phase-shift mask materials with irradiation stability

James Wasson, Nora Edwards, Bing Lu, Pawitter Mangat, Andrew Grenville

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.517893

KEYWORDS: Inspection, Phase shifts, Photomasks, Attenuators, Semiconducting wafers, Reflection, Lithography, Vacuum ultraviolet, Optical properties, Chromium

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Proceedings Article | 27 December 2002 Paper

Integration of antireflection coatings on EUV absorber stacks

James Wasson, Sang-In Han, N. Edwards, Eric Weisbrod, William Dauksher, Pawitter Mangat, Donald Pettibone

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468104

KEYWORDS: Inspection, Reflectivity, Reticles, Etching, Extreme ultraviolet, Multilayers, Chromium, Extreme ultraviolet lithography, Antireflective coatings, Photomasks

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Showing 5 of 12 publications

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