Mr. Noriyuki Hirayanagi Profile

Noriyuki Hirayanagi

at Nikon Research Corp of America

SPIE Involvement:

Author

Publications (25)

Proceedings Article | 10 April 2024 Presentation + Paper

Presentation + Paper

Imaging study of phase shift spatial light modulator for digital scanner

Yoji Watanabe, Yuho Kanaya, Yosuke Okudaira, Shunsuke Kibayashi, Toshiaki Sakamoto, Yasushi Mizuno, Kazuo Masaki, Soichi Owa, Thomas Koo, Bryant Lin, Michael Tan, David Tseng, Conrad Sorensen, Sujuan Li, Stephen Renwick, Noriyuki Hirayanagi, Bausan Yuan

Proceedings Volume 12953, 129530R (2024) https://doi.org/10.1117/12.3010082

KEYWORDS: Spatial light modulators, Micromirrors, Optical lithography, Maskless lithography, Phase shifting

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Proceedings Article | 29 September 2023 Paper

Paper

Pixel-based data preparation for digital scanner

Yuho Kanaya, Yoji Watanabe, Toshiaki Sakamoto, Yasushi Mizuno, Ryota Matsui, Yosuke Okudaira, Shunsuke Kibayashi, Koshi Komuro, Hiroyuki Tsukamoto, Kazuo Masaki, Soichi Owa, Thomas Koo, David Tseng, Conrad Sorensen, Sujuan Li, Michael Tan, Bryant Lin, Stephen Renwick, Noriyuki Hirayanagi, Bausan Yuan

Proceedings Volume 12915, 129150G (2023) https://doi.org/10.1117/12.2684546

KEYWORDS: Maskless lithography, Direct write lithography, Scanners, Printing, Optical proximity correction, Spatial light modulators, Semiconducting wafers, Photomasks, Raster graphics, Projection systems

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SPIE Journal Paper | 5 June 2023

Development of deep ultraviolet optical maskless exposure tool for advanced lithography

Yoji Watanabe, Yuho Kanaya, Yusuke Saito, Toshiaki Sakamoto, Kazuo Masaki, Soichi Owa, Thomas Koo, David Tseng, Conrad Sorensen, Bryant Lin, Michael Tan, Sujuan Li, Stephen Renwick, Noriyuki Hirayanagi, Bausan Yuan

JM3, Vol. 22, Issue 04, 041403, (June 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.4.041403

KEYWORDS: Semiconducting wafers, Spatial light modulators, Deep ultraviolet, Optical proximity correction, UV optics, Solid state lasers, Pulsed laser operation, Lithography, Chip manufacturing, Printing

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Proceedings Article | 28 April 2023 Presentation + Paper

Presentation + Paper

Expected performance of digital scanner and the potential application for advanced semiconductor fabrication

Yoji Watanabe, Yuho Kanaya, Yusuke Saito, Toshiaki Sakamoto, Kazuo Masaki, Soichi Owa, Thomas Koo, Bryant Lin, Michael Tan, David Tseng, Conrad Sorensen, Sujuan Li, Stephen Renwick, Noriyuki Hirayanagi, Bausan Yuan

Proceedings Volume 12494, 124940A (2023) https://doi.org/10.1117/12.2657730

KEYWORDS: Semiconducting wafers, Scanners, Optical proximity correction, Optical lithography, Laser scanners, Semiconductors, Printing, Solid state lasers, Fabrication, Chip manufacturing

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Proceedings Article | 1 December 2022 Poster + Paper

Poster + Paper

Data preparation for digital scanner

Yuho Kanaya, Yoji Watanabe, Yusuke Saito, Toshiaki Sakamoto, Ryota Matsui, Yosuke Okudaira, Shunsuke Kibayashi, Koshi Komuro, Hiroyuki Tsukamoto, Soichi Owa, Thomas Koo, David Tseng, Conrad Sorensen, Sujuan Li, Stephen Renwick, Noriyuki Hirayanagi, Bausan Yuan

Proceedings Volume 12293, 122930U (2022) https://doi.org/10.1117/12.2641419

KEYWORDS: Scanners, Data conversion, Photomasks, Spatial light modulators, Optical proximity correction, Raster graphics, Semiconducting wafers, Phase shifts, Deep ultraviolet, Maskless lithography

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Proceedings Article | 26 May 2022 Presentation + Paper

Presentation + Paper

Technology development progress of digital scanner

Yoji Watanabe, Yuho Kanaya, Yusuke Saito, Toshiaki Sakamoto, Soichi Owa, Thomas Koo, Rocky Mai, David Tseng, Conrad Sorensen, Hwan Lee, Stephen Renwick, Noriyuki Hirayanagi, Bausan Yuan

Proceedings Volume 12051, 1205108 (2022) https://doi.org/10.1117/12.2613902

KEYWORDS: Semiconducting wafers, Photomasks, Scanners, Data conversion, Spatial light modulators, Printing, Deep ultraviolet, Semiconductors, Optical lithography, Solid state lasers

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Proceedings Article | 12 October 2021 Presentation + Paper

Presentation + Paper

Subpixel pattern edge placement controllability of digital scanner

Yuho Kanaya, Yoji Watanabe, Yusuke Saito, Toshiaki Sakamoto, Soichi Owa, Noriyuki Hirayanagi, Thomas Koo, Craig Poppe, David Tseng, Conrad Sorensen, Hwan Lee, Stephen Renwick, Bausan Yuan

Proceedings Volume 11855, 1185508 (2021) https://doi.org/10.1117/12.2600898

KEYWORDS: Spatial light modulators, Projection systems, Scanners, Semiconducting wafers, Digital imaging, Image resolution, Raster graphics, Photomasks, Micromirrors

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Proceedings Article | 22 February 2021 Presentation + Paper

Presentation + Paper

Digital scanner, optical maskless exposure tool with DUV solid state laser

Yoji Watanabe, Hirotaka Kono, Yuho Kanaya, Yusuke Saito, Toshiaki Sakamoto, Soichi Owa, Noriyuki Hirayanagi, Thomas Koo, Craig Poppe, David Tseng, Conrad Sorensen, Hwan Lee, Stephen Renwick, Bausan Yuan

Proceedings Volume 11613, 1161309 (2021) https://doi.org/10.1117/12.2583680

KEYWORDS: Deep ultraviolet, Solid state lasers, Laser scanners, 3D scanning, Spatial light modulators, Semiconducting wafers, Prototyping, Laser optics, Security printing, Printing

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Proceedings Article | 15 March 2016 Paper

Paper

Expected innovations of optical lithography in the next 10 years

Soichi Owa, Noriyuki Hirayanagi

Proceedings Volume 9780, 978004 (2016) https://doi.org/10.1117/12.2219918

KEYWORDS: Optical lithography, Lithography, Metamaterials, Optical metamaterials, Split ring resonators, Immersion lithography, High volume manufacturing, Maskless lithography, Semiconductor manufacturing, Scanners, Spatial light modulators, Photomasks, Semiconductors, Particles

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SPIE Journal Paper | 9 April 2015 Open Access

Open Access

Sub-10-nm patterning process using directed self-assembly with high χ block copolymers

Naoko Kihara, Yuriko Seino, Hironobu Sato, Yusuke Kasahara, Katsutoshi Kobayashi, Ken Miyagi, Shinya Minegishi, Koichi Yatsuda, Tomoharu Fujiwara, Noriyuki Hirayanagi, Hideki Kanai, Yoshiaki Kawamonzen, Katsuyoshi Kodera, Tsukasa Azuma, Teruaki Hayakawa

JM3, Vol. 14, Issue 02, 023502, (April 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.2.023502

KEYWORDS: Etching, Polymethylmethacrylate, Optical lithography, Silicon, Polymers, Lithography, Scanning electron microscopy, Image processing, Polymerization, Directed self assembly

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Proceedings Article | 28 March 2014 Paper

Paper

Defect-aware process margin for chemo-epitaxial directed self-assembly lithography using simulation method based on self-consistent field theory

Katsuyoshi Kodera, Hironobu Sato, Hideki Kanai, Yuriko Seino, Naoko Kihara, Yusuke Kasahara, Katsutoshi Kobayashi, Ken Miyagi, Shinya Minegishi, Koichi Yatsuda, Tomoharu Fujiwara, Noriyuki Hirayanagi, Yoshiaki Kawamonzen, Tsukasa Azuma

Proceedings Volume 9049, 904926 (2014) https://doi.org/10.1117/12.2046159

KEYWORDS: Monte Carlo methods, Lithography, Particles, Thin film coatings, Systems modeling, Computer simulations, Image segmentation, Extreme ultraviolet lithography, Semiconductors, Directed self assembly

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SPIE Journal Paper | 2 December 2013 Open Access

Open Access

Impact of realistic source shape and flexibility on source mask optimization

Hirohiko Izumi, Keiichi Tajima, Joachim Siebert, Wolfgang Demmerle, Tomoyuki Matsuyama, Hajime Aoyama, Yasushi Mizuno, Noriyuki Hirayanagi, Naonori Kita, Ryota Matsui

JM3, Vol. 13, Issue 01, 011005, (December 2013) https://doi.org/10.1117/12.10.1117/1.JMM.13.1.011005

KEYWORDS: Source mask optimization, Scanners, Fiber optic illuminators, Critical dimension metrology, Photomasks, Optical proximity correction, Semiconducting wafers, SRAF, 3D modeling, Printing

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Proceedings Article | 12 April 2013 Paper

Paper

The impact of realistic source shape and flexibility on source mask optimization

Hajime Aoyama, Yasushi Mizuno, Noriyuki Hirayanagi, Naonori Kita, Ryota Matsui, Hirohiko Izumi, Keiichi Tajima, Joachim Siebert, Wolfgang Demmerle, Tomoyuki Matsuyama

Proceedings Volume 8683, 86830M (2013) https://doi.org/10.1117/12.2011353

KEYWORDS: Source mask optimization, Scanners, Optical proximity correction, Electroluminescence, Fiber optic illuminators, Photomasks, Critical dimension metrology, Semiconducting wafers, SRAF, Printing

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Proceedings Article | 12 April 2013 Paper

Paper

Illumination pupilgram control using an intelligent illuminator

Noriyuki Hirayanagi, Yasushi Mizuno, Masakazu Mori, Naonori Kita, Ryota Matsui, Tomoyuki Matsuyama

Proceedings Volume 8683, 86830D (2013) https://doi.org/10.1117/12.2011077

KEYWORDS: Modulation, Fiber optic illuminators, Distortion, Scanners, Photomasks, 3D modeling, Software development, Optimization (mathematics), Optical proximity correction, Lithography

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Proceedings Article | 6 May 2005 Paper

Paper

Device based evaluation of electron projection lithography

Carmelo Romeo, Pietro Cantu, Daniel Henry, Hidekazu Takekoshi, Noriyuki Hirayanagi, Kazuaki Suzuki, Martin McCallum, Hiroshi Fujita, Tadahiko Takikawa, Morihisa Hoga

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.598751

KEYWORDS: Photomasks, Semiconducting wafers, Electron beam lithography, Optical lithography, Manufacturing, Etching, Projection lithography, Electron beams, Silicon, Printing

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Proceedings Article | 6 May 2005 Paper

Paper

Nikon EPL tool: the latest development status and results

Takaharu Miura, Shintaro Kawata, Kazunari Hada, Yukio Kakizaki, Masaya Miyazaki, Kazuaki Suzuki, Noriyuki Hirayanagi, Atsushi Yamada, Junji Ikeda, Takehisa Yahiro, Jin Udagawa, Hidekazu Takekoshi, Takaaki Umemoto, Yukiharu Ohkubo, Toshimasa Shimoda, Toru Tanida, Yoichi Watanabe, Kaoru Ohmori, Futoshi Mori, Shigeru Takemoto, Takeshi Yoshioka, Kenji Morita

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.598687

KEYWORDS: Semiconducting wafers, Reticles, Electron beams, Wafer-level optics, Electron beam lithography, Photomasks, Control systems, Projection lithography, Lithography, Reliability

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Proceedings Article | 20 May 2004 Paper

Paper

Total performance of Nikon EB stepper R&D tool

Tomoharu Fujiwara, Noriyuki Hirayanagi, Jin Udagawa, Junji Ikeda, Sumito Shimizu, Hidekazu Takekoshi, Kazuaki Suzuki

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.537008

KEYWORDS: Reticles, Semiconducting wafers, Electron beams, Distortion, Electron beam lithography, Optical alignment, Interferometers, Wafer-level optics, Scanning electron microscopy, Projection lithography

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Proceedings Article | 16 June 2003 Paper

Paper

Distortion management strategy for EPL reticle

Hajime Yamamoto, Takashi Aoyama, Noriyuki Hirayanagi, Kazuaki Suzuki

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.483743

KEYWORDS: Reticles, Distortion, Metrology, Semiconducting wafers, Sensors, Electron beam lithography, Data corrections, Photography, Manufacturing, Projection lithography

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Proceedings Article | 16 June 2003 Paper

Paper

Predicting local thermomechanical distortions of the 200-mm EPL mask system

Po-Tung Lee, Roxann Engelstad, Edward Lovell, Shintaro Kawata, Noriyuki Hirayanagi, Michael Sogard

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.504552

KEYWORDS: Photomasks, Semiconducting wafers, Electron beams, Silicon, Reticles, Thermal modeling, Prototyping, Lithography, Electron beam lithography, Projection lithography

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Proceedings Article | 16 June 2003 Paper

Paper

Nikon EB stepper: its system design and preliminary performance

Noriyuki Hirayanagi, Tomoharu Fujiwara, Kazunari Hada, Toshimasa Shimoda, Kazuaki Suzuki

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484972

KEYWORDS: Reticles, Semiconducting wafers, Electron beams, Sensors, Servomechanisms, Image sensors, Electron beam lithography, Projection lithography, Beam controllers, Photography

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SPIE Journal Paper | 1 July 2002

High-accuracy aerial image measurement for electron beam projection lithography

Takehisa Yahiro, Noriyuki Hirayanagi, Takeshi Irita, Hiroyasu Shimizu, Kazuaki Suzuki

JM3, Vol. 1, Issue 02, (July 2002) https://doi.org/10.1117/12.10.1117/1.1451082

KEYWORDS: Signal detection, Image sensors, Calibration, Silicon, Sensors, Electron beams, Electron beam lithography, Signal to noise ratio, Optical testing, Projection lithography

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Proceedings Article | 20 August 2001 Paper

Paper

Nikon EB Stepper: the latest development status

Kazuaki Suzuki, Tomoharu Fujiwara, Kazunari Hada, Noriyuki Hirayanagi, Shintaro Kawata, Kenji Morita, Kazuya Okamoto, Teruaki Okino, Sumito Shimizu, Takehisa Yahiro, Hajime Yamamoto

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436632

KEYWORDS: Reticles, Semiconducting wafers, Electron beams, Silicon, Sensors, Optical alignment, Optical lithography, Photomasks, Wafer-level optics, Image sensors

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Proceedings Article | 20 August 2001 Paper

Paper

High-accuracy aerial image measurement for electron-beam projection lithography

Takehisa Yahiro, Noriyuki Hirayanagi, Kenji Morita, Takeshi Irita, Hajime Yamamoto, Shohei Suzuki, Hiroyasu Shimizu, Shintaro Kawata, Teruaki Okino, Kazuaki Suzuki

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436679

KEYWORDS: Image sensors, Signal detection, Calibration, Sensors, Signal to noise ratio, Silicon, Monochromatic aberrations, Electron beams, Projection lithography, Electron beam lithography

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Proceedings Article | 21 July 2000 Paper

Paper

Nikon EB stepper: its system concept and countermeasures for critical issues

Kazuaki Suzuki, Tomoharu Fujiwara, Kazunari Hada, Noriyuki Hirayanagi, Shintaro Kawata, Kenji Morita, Kazuya Okamoto, Teruaki Okino, Sumito Shimizu, Takehisa Yahiro

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390057

KEYWORDS: Reticles, Semiconducting wafers, Silicon, Electron beams, Critical dimension metrology, Electron beam lithography, Scattering, Wafer-level optics, Sensors, Optical alignment

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Proceedings Article | 21 July 2000 Paper

Paper

Data of scattered electron characteristics in 100-kV EB stepper

Kenji Morita, Takehisa Yahiro, Sumito Shimizu, Hajime Yamamoto, Noriyuki Hirayanagi, Tomoharu Fujiwara, Syouhei Suzuki, Hiroyasu Shimizu, Shintaro Kawata, Teruaki Okino, Kazuaki Suzuki

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390111

KEYWORDS: Reticles, Scattering, Silicon, Semiconducting wafers, Laser scattering, Electron beams, Monte Carlo methods, Lithography, Calibration, Optical alignment

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Showing 5 of 25 publications

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