Mr. Pedro P. Herrera Profile

Pedro P. Herrera

SPIE Involvement:

Author

Publications (18)

Proceedings Article | 26 March 2019 Presentation + Paper

Presentation + Paper

Process drift compensation by tunable wavelength homing in scatterometry-based overlay

Kun Gao, Pedro Herrera, Vidya Ramanathan, Victoria Naipak, Meng Wang, Renan Milo, Tal Yaziv, Nir BenDavid, Chen Dror, Hao Mei, Weihua Li, Xindong Gao, Linfei Gao, Md. Motasim Bellah, Karsten Gutjahr, Dongyue Yang, Cheuk Wun Wong, Xueli Hao, Tony Joung, DeNeil Park, Yue Zhou, Abhishek Gottipati

Proceedings Volume 10959, 1095906 (2019) https://doi.org/10.1117/12.2514548

KEYWORDS: Overlay metrology, Scatterometry, Process control

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Proceedings Article | 26 March 2019 Paper

Paper

Process monitoring and control with tunable wavelength overlay coupled with simulation-to-measurement analysis

Pedro Herrera, Kun Gao, Chen Dror, Eitan Hajaj, Alon Alexander Volfman, Raviv Yohanan, Vidya Ramanathan, Victoria Naipak, Renan Milo, Tal Yaziv, Nir BenDavid, Meng Wang, Hao Mei, Weihua Li, Xindong Gao, Dongyue Yang, Cheuk Wun Wong, Karsten Gutjahr, Xueli Hao, Tony Joung, Md. Motasim Bellah, DeNeil Park, Yue Zhou, Abhishek Gottipati

Proceedings Volume 10959, 1095928 (2019) https://doi.org/10.1117/12.2514725

KEYWORDS: Overlay metrology, Metrology, Process control, Semiconducting wafers, Inspection, Optical filters, Polarization, Modeling and simulation, Scatterometry

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Proceedings Article | 28 March 2017 Paper

Paper

SAQP pitch walk metrology using single target metrology

Fang Fang, Pedro Herrera, Taher Kagalwala, Janay Camp, Alok Vaid, Stilian Pandev, Franz Zach

Proceedings Volume 10145, 101452R (2017) https://doi.org/10.1117/12.2261620

KEYWORDS: Metrology, Process control, Critical dimension metrology, Scatterometry, Optical lithography, Scanning electron microscopy, Scanners, Lithography, Etching, Semiconducting wafers, Diffractive optical elements

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Proceedings Article | 24 March 2016 Paper

Paper

Root cause analysis of overlay metrology excursions with scatterometry overlay technology (SCOL)

Karsten Gutjahr, Dongsuk Park, Yue Zhou, Winston Cho, Ki Cheol Ahn, Patrick Snow, Richard McGowan, Tal Marciano, Vidya Ramanathan, Pedro Herrera, Tal Itzkovich, Janay Camp, Michael Adel

Proceedings Volume 9778, 97781M (2016) https://doi.org/10.1117/12.2219668

KEYWORDS: Overlay metrology, Semiconducting wafers, Scatterometry, Diffractive optical elements, Metrology, Photovoltaics, Etching, Detection and tracking algorithms, Signal processing, Optical properties

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Proceedings Article | 2 April 2014 Paper

Paper

Lithography focus/exposure control and corrections to improve CDU at post etch step

Young Ki Kim, Mark Yelverton, John Tristan, Joungchel Lee, Karsten Gutjahr, Ching-Hsiang Hsu, Hong Wei, Lester Wang, Chen Li, Lokesh Subramany, Woong Jae Chung, Jeong Soo Kim, Vidya Ramanathan, LipKong Yap, Jie Gao, Ram Karur-Shanmugam, Anna Golotsvan, Pedro Herrera, Kevin Huang, Bill Pierson

Proceedings Volume 9050, 90501Y (2014) https://doi.org/10.1117/12.2045433

KEYWORDS: Semiconducting wafers, Etching, Lithography, Finite element methods, Scatterometry, Critical dimension metrology, Factory automation, Scanners, High volume manufacturing, Scatter measurement

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Proceedings Article | 10 April 2013 Paper

Paper

Lithography focus/exposure control and corrections to improve CDU

Young Ki Kim, Mark Yelverton, Joungchel Lee, Jerry Cheng, Hong Wei, Jeong Soo Kim, Karsten Gutjahr, Jie Gao, Ram Karur-Shanmugam, Pedro Herrera, Kevin Huang, Roie Volkovich, Bill Pierson

Proceedings Volume 8681, 86811P (2013) https://doi.org/10.1117/12.2011534

KEYWORDS: Semiconducting wafers, Finite element methods, Lithography, Scatterometry, Critical dimension metrology, Scanners, Factory automation, Scatter measurement, Metrology, Process control

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Proceedings Article | 2 April 2010 Paper

Paper

Use of multiple azimuthal angles to enable advanced scatterometry applications

Matthew Sendelbach, Alok Vaid, Pedro Herrera, Ted Dziura, Michelle Zhang, Arun Srivatsa

Proceedings Volume 7638, 76381G (2010) https://doi.org/10.1117/12.846692

KEYWORDS: Metals, Scatterometry, Silicon, Transmission electron microscopy, Metrology, Semiconducting wafers, Critical dimension metrology, Data modeling, Back end of line, Semiconductors

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Proceedings Article | 22 March 2008 Paper

Paper

Characterization of 32nm node BEOL grating structures using scatterometry

Shahin Zangooie, Matthew Sendelbach, Matthew Angyal, Charles Archie, Alok Vaid, Itty Matthew, Pedro Herrera

Proceedings Volume 6922, 69220S (2008) https://doi.org/10.1117/12.773088

KEYWORDS: Copper, Scatterometry, Back end of line, Metals, Critical dimension metrology, Semiconducting wafers, Chemical mechanical planarization, Metrology, Inspection, Dielectrics

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Proceedings Article | 22 March 2008 Paper

Paper

Assessing scatterometry for measuring advanced spacer structures with embedded SiGe

Matthew Sendelbach, Shahin Zangooie, Alok Vaid, Pedro Herrera, Jingmin Leng, InKyo Kim

Proceedings Volume 6922, 69220R (2008) https://doi.org/10.1117/12.774823

KEYWORDS: Transmission electron microscopy, Semiconducting wafers, Deep ultraviolet, Single crystal X-ray diffraction, Ultraviolet radiation, Oxides, Scatterometry, UV optics, Metrology, Scatter measurement

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Proceedings Article | 6 April 2007 Paper

Paper

Enabling gate etch process development using scatterometry

Jophy Koshy, Matthew Sendelbach, Pedro Herrera

Proceedings Volume 6518, 65184X (2007) https://doi.org/10.1117/12.716723

KEYWORDS: Scatterometry, Scatter measurement, Semiconducting wafers, Etching, Metrology, Calibration, Critical dimension metrology, Plasma etching, Error analysis, Oxides

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Proceedings Article | 5 April 2007 Paper

Paper

Characterization of capacitive 3D deep trench mask open structures using scatterometry

Shahin Zangooie, Pedro Herrera, Abebe Mesfin, Chas Archie, Matthew Sendelbach

Proceedings Volume 6518, 651827 (2007) https://doi.org/10.1117/12.712763

KEYWORDS: Scatterometry, Silicon, Metrology, Semiconducting wafers, Critical dimension metrology, Photomasks, 3D metrology, Scatter measurement, Scanning electron microscopy, Etching

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Proceedings Article | 5 April 2007 Paper

Paper

Predicting electrical measurements by applying scatterometry to complex spacer structures

Matthew Sendelbach, Javier Ayala, Pedro Herrera

Proceedings Volume 6518, 651825 (2007) https://doi.org/10.1117/12.714870

KEYWORDS: Scatterometry, Error analysis, Scatter measurement, Resistance, Semiconducting wafers, Oxides, Transistors, Picosecond phenomena, Data modeling, Control systems

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Proceedings Article | 10 May 2005 Paper

Paper

Improving STI etch process development by replacing XSEM metrology with scatterometry

Matthew Sendelbach, Andres Munoz, Pedro Herrera

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.600880

KEYWORDS: Silicon, Scatterometry, Calibration, Etching, Scatter measurement, Semiconducting wafers, Metrology, Critical dimension metrology, Laser induced breakdown spectroscopy, Error analysis

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Proceedings Article | 24 May 2004 Paper

Paper

Correlating scatterometry to CD-SEM and electrical gate measurements at the 90-nm node using TMU analysis

Matthew Sendelbach, Charles Archie, Bill Banke, Jason Mayer, Hideaki Nii, Pedro Herrera, Matt Hankinson

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.538009

KEYWORDS: Scatterometry, Semiconducting wafers, Scatter measurement, Scanning electron microscopy, Critical dimension metrology, Metrology, Manufacturing, Electrodes, Data modeling, Capacitance

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Proceedings Article | 16 July 2002 Paper

Paper

Spectral scatterometry for 2D trench metrology of low-K dual-damascene interconnect

Vladimir Ukraintsev, Mak Kulkarni, Christopher Baum, Karen Kirmse, Marco Guevremont, Suresh Lakkapragada, Kamal Bhatia, Pedro Herrera, Umar Whitney

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473457

KEYWORDS: Scatterometry, Critical dimension metrology, Atomic force microscopy, Scanning electron microscopy, Transmission electron microscopy, Silicon, Metrology, Dielectrics, Reactive ion etching, Semiconducting wafers

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Proceedings Article | 22 August 2001 Paper

Paper

Implementation of spectroscopic critical dimension (SCD) (TM) for gate CD control and stepper characterization

John Allgair, David Benoit, Mark Drew, Robert Hershey, Lloyd Litt, Pedro Herrera, Umar Whitney, Marco Guevremont, Ady Levy, Suresh Lakkapragada

Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436771

KEYWORDS: Single crystal X-ray diffraction, Critical dimension metrology, Semiconducting wafers, Scanning electron microscopy, Process control, Spectroscopy, Spectroscopes, Metrology, Precision measurement, Control systems

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Proceedings Article | 8 June 1998 Paper

Paper

SPC tracking and run monitoring of a CD SEM

John Allgair, Dustin Ruehle, Richard Elliott, Pedro Herrera, John Miller

Proceedings Volume 3332, (1998) https://doi.org/10.1117/12.308732

KEYWORDS: Critical dimension metrology, Line scan image sensors, Scanning electron microscopy, Semiconducting wafers, Manufacturing, Contamination, Diagnostics, Time metrology, Calibration, Semiconductor manufacturing

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Proceedings Article | 7 July 1997 Paper

Paper

Alternative method for monitoring an in-line CD SEM

Pedro Herrera, Susan Dick, John Allgair

Proceedings Volume 3050, (1997) https://doi.org/10.1117/12.275948

KEYWORDS: Semiconducting wafers, Scanning electron microscopy, Critical dimension metrology, Contamination, Manufacturing, Semiconductor manufacturing, Semiconductors, Electron microscopes, Process control, Imaging systems

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Showing 5 of 18 publications

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