Dr. Peter Hahmann
at Vistec Electron Beam Lithography Group
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 3 April 2010 Paper
Proceedings Volume 7637, 76371T (2010) https://doi.org/10.1117/12.846517
KEYWORDS: Reflection, Silicon, Teeth, Monte Carlo methods, Semiconducting wafers, Electron beams, Sensors, Objectives, Lithography, Critical dimension metrology

Proceedings Article | 27 May 2009 Paper
U. Weidenmueller, P. Hahmann, M. Lemke, B. Schnabel, L. Pain, S. Manakli
Proceedings Volume 7470, 74700P (2009) https://doi.org/10.1117/12.835187
KEYWORDS: Vestigial sideband modulation, Electron beam direct write lithography, Electron beam lithography, Beam shaping, Scanning electron microscopy, Standards development, Lithography, Prototyping, Semiconducting wafers, Electron beams

Proceedings Article | 18 March 2009 Paper
Proceedings Volume 7271, 72712O (2009) https://doi.org/10.1117/12.814156
KEYWORDS: Sensors, Signal to noise ratio, Monte Carlo methods, Signal detection, Lithography, Etching, Scattering, Electron beams, Direct write lithography, Vestigial sideband modulation

Proceedings Article | 26 March 2008 Paper
H. Alves, P. Hahmann, K.-H. Kliem, U. Weidenmueller, S. Jahr, C. Frase, D. Gnieser, H. Bosse, R. Zimmermann, C. Arndt
Proceedings Volume 6921, 69210I (2008) https://doi.org/10.1117/12.771585
KEYWORDS: Optical alignment, Monte Carlo methods, Sensors, Silicon, Signal to noise ratio, Signal detection, Semiconducting wafers, Vestigial sideband modulation, Electron beam direct write lithography, Lithography

Proceedings Article | 3 May 2007 Paper
Proceedings Volume 6533, 65330J (2007) https://doi.org/10.1117/12.736974
KEYWORDS: Electron beam direct write lithography, Electron beams, Vestigial sideband modulation, Semiconductors, Prototyping, Manufacturing, Photomasks, Beam shaping, Electron beam lithography, Lithography

Showing 5 of 8 publications
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