Dr. Ratnam Sooriyakumaran Profile

Dr. Ratnam Sooriyakumaran

at IBM Research - Almaden

SPIE Involvement:

Author

Publications (41)

Proceedings Article | 17 October 2014 Paper

Paper

Characterization of a new polarity switching negative tone e-beam resist for 14nm and 10nm logic node mask fabrication and beyond

T. Faure, A. Zweber, L. Bozano, M. Sanchez, R. Sooriyakumaran, L. Sundberg, Y. Sakamoto, S. Nash, M. Kagawa, T. Isogawa, T. Senna, M. Tanabe, T. Komizo, I. Yoshida, K. Masunaga, S. Watanabe, Y. Kawai, J. Malenfant, R. Bowley

Proceedings Volume 9235, 92350P (2014) https://doi.org/10.1117/12.2069031

KEYWORDS: Etching, Opacity, Switching, SRAF, Dry etching, Critical dimension metrology, Logic, Scanning electron microscopy, Manufacturing, Image resolution

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Proceedings Article | 9 September 2013 Paper

Paper

Defects on high-resolution negative-tone resist: "The revenge of the blobs"

M. Sanchez, L. Sundberg, L. Bozano, R. Sooriyakumaran, D. Sanders, T. Senna, M. Tanabe, T. Komizo, I. Yoshida, A. Zweber

Proceedings Volume 8880, 88800V (2013) https://doi.org/10.1117/12.2028753

KEYWORDS: Photomasks, Semiconducting wafers, Inspection, Switching, Chromium, Switches, Silicon, Ultraviolet radiation, Lamps, Optical microscopes

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Proceedings Article | 8 November 2012 Paper

Paper

Study and comparison of negative tone resists for fabrication of bright field masks for 14nm node

Amy Zweber, Tom Faure, Anne McGuire, Linda Sundberg, Ratnam Sooriyakumaran, Martha Sanchez, Luisa Bozano, Tasuku Senna, Yuki Fujita, Yoshiyuki Negishi, Masahito Tanabe, Takahiro Kaneko

Proceedings Volume 8522, 85220S (2012) https://doi.org/10.1117/12.976878

KEYWORDS: Photomasks, Line edge roughness, SRAF, Manufacturing, Opacity, Critical dimension metrology, Phase shifts, Binary data, Photoresist processing, Electron beam lithography

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Proceedings Article | 8 November 2012 Paper

Paper

Conductive layer for charge dissipation during electron-beam exposures

Luisa Bozano, Ratnam Sooriyakumaran, Takayuki Nagasawa, Satoshi Watanabe, Yoshio Kawai, Shinpei Kondo, Jun Kotani, Masayuki Kagawa, Linda Sundberg, Martha Sanchez, Elizabeth Lofano, Charles Rettner, Tasuku Senna, Thomas Faure

Proceedings Volume 8522, 85220O (2012) https://doi.org/10.1117/12.977181

KEYWORDS: Image quality, Photomasks, Semiconducting wafers, Polymers, Electron beam lithography, Line edge roughness, Image registration, Photoresist processing, Neodymium, Ions

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Proceedings Article | 20 March 2012 Paper

Paper

Investigation of pattern wiggling for spin-on organic hardmask materials

Goji Wakamatsu, Kentaro Goto, Yoshi Hishiro, Taiichi Furukawa, Satoru Murakami, Masayuki Motonari, Yoshikazu Yamaguchi, Tsutomu Shimokawa, Greg Breyta, Anuja DeSilva, Noel Arellano, Luisa Bozano, Carl Larson, Martin Glodde, Ratnam Sooriyakumaran

Proceedings Volume 8325, 83250T (2012) https://doi.org/10.1117/12.915698

KEYWORDS: Etching, Resistance, Hydrogen, Chemical vapor deposition, Fluorine, Fourier transforms, Optical lithography, Critical dimension metrology, Double patterning technology, Extreme ultraviolet

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Proceedings Article | 20 March 2012 Paper

Paper

Conductive layer for charge dissipation during electron-beam exposures

Luisa Bozano, Ratnam Sooriyakumaran, Linda Sundberg, Martha Sanchez, Elizabeth Lofano, Charles Rettner, Takayuki Nagasawa, Satoshi Watanabe, Yoshio Kawai, Nagarajan Palavesam, Gustavo Gandara Montano

Proceedings Volume 8325, 83250X (2012) https://doi.org/10.1117/12.916756

KEYWORDS: Image quality, Polymers, Semiconducting wafers, Gold, Electron beams, Resistance, Lithography, Chemically amplified resists, Thin film coatings, Neodymium

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Proceedings Article | 16 April 2011 Paper

Paper

Hexafluoroalcohol (HFA) containing molecular resist materials for high-resolution lithographic applications

Anuja De Silva, Linda Sundberg, Ratnam Sooriyakumaran, Luisa Bozano, Greg Breyta, William Hinsberg, Masaki Fujiwara

Proceedings Volume 7972, 79721Z (2011) https://doi.org/10.1117/12.881735

KEYWORDS: Magnesium, Lithography, Glasses, Silicon, Extreme ultraviolet lithography, Electron beam lithography, Molecules, Extreme ultraviolet, Polymers, Thin films

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Proceedings Article | 16 April 2011 Paper

Paper

Extending photo-patternable low-κ concept to 193nm lithography and e-beam lithography

Qinghuang Lin, A. Nelson, L. Bozano, P. Brock, S. Cohen, B. Davis, R. Kwong, E. Liniger, D. Neumayer, J. Rathore, H. Shobha, R. Sooriyakumaran, S. Purushothaman, R. Miller, R. Allen, T. Spooner, R. Wisnieff

Proceedings Volume 7972, 79721A (2011) https://doi.org/10.1117/12.881571

KEYWORDS: Dielectrics, Electron beam lithography, Lithography, Photomasks, Silicon, Scanning electron microscopy, Scanners, Copper, Back end of line, Optical lithography

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Proceedings Article | 26 March 2010 Paper

Paper

Multilevel integration of patternable low-κ material into advanced Cu BEOL

Qinghuang Lin, S. Chen, A. Nelson, P. Brock, S. Cohen, B. Davis, N. Fuller, R. Kaplan, R. Kwong, E. Liniger, D. Neumayer, J. Patel, H. Shobha, R. Sooriyakumaran, S. Purushothaman, T. Spooner, R. Miller, R. Allen, R. Wisnieff

Proceedings Volume 7639, 76390J (2010) https://doi.org/10.1117/12.851225

KEYWORDS: Back end of line, Copper, Dielectrics, Optical lithography, Scanning electron microscopy, Silicon, Manufacturing, Semiconducting wafers, Ultraviolet radiation, Polymers

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Proceedings Article | 26 March 2010 Paper

Paper

A silicon-containing resist for immersion lithography

Ratnam Sooriyakumaran, Wu-Song Huang, Sally Swanson, Hoa Truong, Phillip Brock, Alexander Friz, Kuang-Jung Chen, Robert Allen

Proceedings Volume 7639, 76390F (2010) https://doi.org/10.1117/12.846280

KEYWORDS: Silicon, Polymers, Immersion lithography, Etching, Lithography, Photoresist materials, Reactive ion etching, Anisotropic etching, Silicon films, Multilayers

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Proceedings Article | 15 April 2008 Paper

Paper

A new class of low bake resists for 193-nm immersion lithography

Ratnam Sooriyakumaran, Richard DiPietro, Hoa Truong, Phillip Brock, Robert Allen, Luisa Bozano, Irene Popova, Wu-Song Huang, Rex Chen, Mahmoud Khojasteh, Pushkara Rao Varanasi

Proceedings Volume 6923, 69230C (2008) https://doi.org/10.1117/12.772947

KEYWORDS: Polymers, Immersion lithography, Diffusion, Image processing, 193nm lithography, Lithography, Chemically amplified resists, Humidity, Photoresist processing, Standards development

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Proceedings Article | 26 March 2008 Paper

Paper

The limitations of high-index resists for 193-nm hyper-NA lithography

Gregory McIntyre, Daniel Sanders, Ratnam Sooriyakumaran, Hoa Truong, Robert Allen

Proceedings Volume 6923, 692304 (2008) https://doi.org/10.1117/12.773114

KEYWORDS: Absorption, Refractive index, Water, Lithography, Polarization, Refraction, Chemistry, Critical dimension metrology, Sodium, Reflection

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Proceedings Article | 2 April 2007 Paper

Paper

Fluoro-alcohol materials with tailored interfacial properties for immersion lithography

Daniel Sanders, Linda Sundberg, Ratnam Sooriyakumaran, Phillip Brock, Richard DiPietro, Hoa Truong, Dolores Miller, Margaret Lawson, Robert Allen

Proceedings Volume 6519, 651904 (2007) https://doi.org/10.1117/12.712768

KEYWORDS: Fluorine, Polymers, Immersion lithography, Lithography, Interfaces, Semiconducting wafers, Carbon, Water, Surface properties, Hydrogen

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Proceedings Article | 2 April 2007 Paper

Paper

Contact angles and structure/surface property relationships of immersion materials

Linda Sundberg, Daniel Sanders, Ratnam Sooriyakumaran, Phillip Brock, Robert Allen

Proceedings Volume 6519, 65191Q (2007) https://doi.org/10.1117/12.712632

KEYWORDS: Fluorine, Polymers, Immersion lithography, Surface properties, Semiconducting wafers, Polymer thin films, Lithography, Carbon, Silicon, Quartz

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Proceedings Article | 22 March 2007 Paper

Paper

Impact of curing kinetics and materials properties on imprint characteristics of resists for UV nano-imprint lithography

Frances Houle, Ann Fornof, Ratnam Sooriyakumaran, Hoa Truong, Dolores Miller, Martha Sanchez, Blake Davis, Teddie Magbitang, Robert Allen, Mark Hart, Geraud Dubois

Proceedings Volume 6519, 65191C (2007) https://doi.org/10.1117/12.712298

KEYWORDS: Ultraviolet radiation, Fluorine, Polymers, Glasses, Silicon, Polymerization, Data conversion, Scanning electron microscopy, Dielectrics, Materials processing

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Proceedings Article | 29 March 2006 Paper

Paper

Direct determination of photoresist composition changes during UV exposure

Frances Houle, Vaughn Deline, Hoa Truong, Ratnam Sooriyakumaran

Proceedings Volume 6153, 61530Z (2006) https://doi.org/10.1117/12.655687

KEYWORDS: Silicon, Ions, Polymers, Mass spectrometry, Photoresist materials, Spectroscopy, Semiconducting wafers, Ultraviolet radiation, Silicon carbide, Sputter deposition

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Proceedings Article | 4 May 2005 Paper

Paper

Line edge roughness reduction by plasma curing photoresists

Arpan Mahorowala, Kuang-Jung Chen, Ratnam Sooriyakumaran, Aleksandra Clancy, Dakshi Murthy, Stacy Rasgon

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.600043

KEYWORDS: Photoresist materials, Plasma, Etching, Line edge roughness, Polymers, Surface roughness, Polymer thin films, Semiconducting wafers, Atomic force microscopy, FT-IR spectroscopy

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Proceedings Article | 4 May 2005 Paper

Paper

Molecular resists based on polyhedral oligomeric silsesquioxanes (POSS)

Ratnam Sooriyakumaran, Hoa Truong, Linda Sundberg, Mark Morris, Bill Hinsberg, Hiroshi Ito, Robert Allen, Wu-Song Huang, Dario Goldfarb, Sean Burns, Dirk Pfeiffer

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.600615

KEYWORDS: Silicon, Line edge roughness, Polymers, Glasses, Standards development, Diffusion, Lithography, Spectroscopy, Macromolecules, Chemically amplified resists

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Proceedings Article | 4 May 2005 Paper

Paper

193nm single layer photoresists: defeating tradeoffs with a new class of fluoropolymers

Pushkara Varanasi, Ranee Kwong, Mahmoud Khojasteh, Kaushal Patel, Kuang-Jung Chen, Wenjie Li, M. Lawson, Robert Allen, Ratnam Sooriyakumaran, P. Brock, Linda Sundberg, Mark Slezak, Gary Dabbagh, Z. Liu, Yukio Nishimura, Takashi Chiba, Tsutomu Shimokawa

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599700

KEYWORDS: Polymers, 193nm lithography, Lithography, Etching, Photoresist materials, Fluorine, Immersion lithography, Modulation, Photomasks, Reactive ion etching

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Proceedings Article | 14 May 2004 Paper

Paper

193-nm negative resist based on acid-catalyzed elimination of polar molecules

Ratnam Sooriyakumaran, Blake Davis, Carl Larson, Phillip Brock, Richard DiPietro, Thomas Wallow, Eric Connor, Linda Sundberg, Gregory Breyta, Robert Allen, Kaushal Patel, Pushkara Rao Varanasi

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.536432

KEYWORDS: Polymers, Molecules, Switches, Standards development, Distortion, Photoresist materials, Lithography, Spectroscopy, Photomasks, Photoresist developing

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Proceedings Article | 24 July 2002 Paper

Paper

Evolution of a 193-nm bilayer resist for manufacturing

Ranee Kwong, Mahmoud Khojasteh, Margaret Lawson, Timothy Hughes, Pushkara Varanasi, William Brunsvold, Robert Allen, Phillip Brock, Ratnam Sooriyakumaran, Hoa Truong, Arpan Mahorowala, David Medeiros

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474239

KEYWORDS: Silicon, Etching, Polymers, Lithography, Reactive ion etching, 193nm lithography, Photomasks, Manufacturing, Absorbance, Resistance

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Proceedings Article | 24 July 2002 Paper

Paper

Building high-performance chemically amplified resists with polymer blends

Qinghuang Lin, John Simons, Marie Angelopoulos, Ratnam Sooriyakumaran

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474203

KEYWORDS: Polymers, Silicon, Lithography, Glasses, Reactive ion etching, Etching, Chemically amplified resists, Ions, Modulation, Atomic force microscopy

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The greatly compressed resist development cycle and the explosion of the number of resists at a specific lithographic wavelength have necessitated a hastened pace in developing high-performance resists. Traditionally, high- performance chemically amplified resists have been developed by copolymerization of monomers with various functionalities to achieve the desired properties. This approach, while immensely successful, however suffers from long lead times to deliver successful products to the markplace. In this paper, we report a more rapid approach to developing high- performance chemically amplified resists by blending different polymers with complementary properties. As a model system, a 248nm negative-tone bilayer resist has been demonstrated based on acid catalyzed cross-linking of blends of silicon-containing polymers with a non-silicon-containing polymer. The silicon-containing polymers and the non- silicon-containing polymer used were poly(p- hydroxybenzylsilesquioxane-co-p-methoxybenzylsilsesquioxane) (PHBS/MBS), poly(p-hydroxyphenylethylsilesquioxane-co-t- butylsilsesquioxane)(PHPES/BS) and poly(p- hydroxystyrene)(PHS), respectively. The resist based on this simple polymer blend approach has achieved lithographic performance comparable to that based on more elaborate copolymers that require time-consuming synthetic optimization. Differential scanning calorimetry (DSC), quartz crystal microbalance (QCM), and atomic force microscopy (AFM) were employed to probe the properties of the polymer blends and the resist. DSC results suggested that PHBS/MSB and PHS are miscible throughout the entire composition range. Addition of the phenolic polymer into the silicon-containing polymer dramatically improves the lithographic performance of the bilayer resist. This improvement in lithographic performance is attributed to the enhancement of thermal properties (i.e. glass transition temperature), the modulation of dissolution properties, and more cross-linkable sites for the acid catalyzed cross-linking. O₂ RIE etch selectivity of the blends vs. and organic underlayer increases with increasing concentration of the silicon-containing polymer in the blends. The present approach could also be applied to developing other high-performance resists more swiftly at other lithographic wavelengths.

Proceedings Article | 24 August 2001 Paper

Paper

IBM 193-nm bilayer resist: materials, lithographic performance, and optimization

Ranee Kwong, Pushkara Varanasi, Margaret Lawson, Timothy Hughes, George Jordhamo, Mahmoud Khojasteh, Arpan Mahorowala, Ratnam Sooriyakumaran, Phillip Brock, Carl Larson, Debra Fenzel-Alexander, Hoa Truong, Robert Allen

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436892

KEYWORDS: Etching, 193nm lithography, Photomasks, Polymers, Reactive ion etching, Lithography, Silicon, Resistance, Glasses, Antireflective coatings

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Proceedings Article | 24 August 2001 Paper

Paper

Silicon-containing resists for 157-nm applications

Ratnam Sooriyakumaran, Debra Fenzel-Alexander, Nicolette Fender, Gregory Wallraff, Robert Allen

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436861

KEYWORDS: Polymers, Silicon, Lithography, Standards development, Polymer thin films, Absorbance, Etching, Semiconductor manufacturing, Resistance, Transparency

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Proceedings Article | 23 June 2000 Paper

Paper

193-nm positive-tone bilayer resist based on norbornene-maleic anhydride copolymers

Ratnam Sooriyakumaran, Debra Fenzel-Alexander, Phillip Brock, Carl Larson, Richard Di Pietro, Gregory Wallraff, Donald Hofer, Dan Dawson, Arpan Mahorowala, Marie Angelopoulos

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388282

KEYWORDS: Polymers, Silicon, Lithography, Etching, Absorbance, Silicon films, Image processing, Photoresist developing, Deep ultraviolet, Oxygen

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Proceedings Article | 23 June 2000 Paper

Paper

Toward controlled resist line-edge roughness: material origin of line-edge roughness in chemically amplified positive-tone resists

Qinghuang Lin, Ratnam Sooriyakumaran, Wu-Song Huang

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388307

KEYWORDS: Polymers, Polymer thin films, Surface roughness, Line edge roughness, Chemically amplified resists, Silicon, Atomic force microscopy, Coating, Silicon films, Chemical analysis

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Proceedings Article | 11 June 1999 Paper

Paper

High-resolution 248-nm bilayer resist

Qinghuang Lin, Karen Petrillo, Katherina Babich, Douglas LaTulipe, David Medeiros, Arpan Mahorowala, John Simons, Marie Angelopoulos, Gregory Wallraff, Carl Larson, Debra Fenzel-Alexander, Ratnam Sooriyakumaran, Gregory Breyta, Phillip Brock, Richard Di Pietro, Donald Hofer

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350207

KEYWORDS: Silicon, Etching, Polymers, Reactive ion etching, Lithography, Imaging systems, Resistance, Optical properties, Photomasks, Silicon films

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Proceedings Article | 11 June 1999 Paper

Paper

Approaches to etch-resistant 193-nm photoresists: performance and prospects

Robert Allen, Juliann Opitz, Hiroshi Ito, Thomas Wallow, Daniel Casmier, Richard Di Pietro, Phillip Brock, Gregory Breyta, Ratnam Sooriyakumaran, Carl Larson, Donald Hofer, Pushkara Varanasi, Ann Mewherter, Saikumar Jayaraman, Richard Vicari, Larry Rhodes, Shenliang Sun

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350262

KEYWORDS: Polymers, Polymerization, Etching, Absorbance, Resistance, Photoresist materials, Oxides, Transparency, Lithography, Deep ultraviolet

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Proceedings Article | 11 June 1999 Paper

Paper

Development of an incremental structural parameter model for predicting reactive ion etch rates of 193-nm photoresist polymer platforms

Thomas Wallow, Phillip Brock, Richard Di Pietro, Robert Allen, Juliann Opitz, Ratnam Sooriyakumaran, Donald Hofer, Ann Mewherter, Yuping Cui, Wendy Yan, G. Worth, Wayne Moreau, Jeff Meute, Jeff Byers, Georgia Rich, Martin McCallum, Saikumar Jayaraman, Richard Vicari, Joy Cagle, Shenliang Sun, Karen Hullihen

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350211

KEYWORDS: Etching, Polymers, Reactive ion etching, Photoresist materials, Oxides, Carbon, Photoresist developing, Chemical species, Ions, Data modeling

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Proceedings Article | 29 June 1998 Paper

Paper

Photoresists using tetrahydropyranyl- and tetrahydrofuranyl-protected styrene maleic anhydride half-ester polymers

Wu-Song Huang, Ratnam Sooriyakumaran, Ranee Kwong, Ahmad Katnani

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312382

KEYWORDS: Polymers, Shape memory alloys, Deep ultraviolet, Absorption, Lithography, Photoresist materials, Semiconducting wafers, Silicon, Photoresist processing, Etching

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Proceedings Article | 29 June 1998 Paper

Paper

Extension of 248-nm optical lithography: a thin film imaging approach

Qinghuang Lin, Ahmad Katnani, Timothy Brunner, Charlotte DeWan, Cindy Fairchok, Douglas LaTulipe, John Simons, Karen Petrillo, Katherina Babich, David Seeger, Marie Angelopoulos, Ratnam Sooriyakumaran, Gregory Wallraff, Donald Hofer

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312417

KEYWORDS: Silicon, Reactive ion etching, Etching, Polymers, Photomasks, Lithography, Thin films, Line edge roughness, Optical lithography, Silicon films

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Proceedings Article | 29 June 1998 Paper

Paper

Reactive ion etching of 193-nm resist candidates: current platforms and future requirements

Thomas Wallow, Phillip Brock, Richard Di Pietro, Robert Allen, Juliann Opitz, Ratnam Sooriyakumaran, Donald Hofer, Jeff Meute, Jeff Byers, Georgia Rich, Martin McCallum, S. Schuetze, Saikumar Jayaraman, Karen Hullihen, Richard Vicari, Larry Rhodes, Brian Goodall, Robert Shick

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312362

KEYWORDS: Etching, Polymers, Reactive ion etching, Oxides, Photoresist materials, Photoresist processing, Carbon, Resistance, Chemical reactions, Control systems

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Proceedings Article | 29 June 1998 Paper

Paper

Positive bilayer resists for 248- and 193-nm lithography

Ratnam Sooriyakumaran, Gregory Wallraff, Carl Larson, Debra Fenzel-Alexander, Richard Di Pietro, Juliann Opitz, Donald Hofer, Douglas LaTulip, John Simons, Karen Petrillo, Katherina Babich, Marie Angelopoulos, Qinghuang Lin, Ahmad Katnani

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312411

KEYWORDS: Silicon, Polymers, Lithography, Etching, Plasma etching, Chemistry, Plasma, Deep ultraviolet, Imaging systems, Standards development

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Proceedings Article | 29 June 1998 Paper

Paper

New approaches to production-worthy 193-nm photoresists based on acrylic copolymers

Thomas Wallow, Robert Allen, Juliann Opitz, Richard Di Pietro, Phillip Brock, Ratnam Sooriyakumaran, Donald Hofer

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312470

KEYWORDS: Reactive ion etching, Polymers, Etching, Photoresist materials, Resistance, Photoresist developing, Prototyping, Lithography, Solids, Photoresist processing

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Proceedings Article | 14 June 1996 Paper

Paper

Protecting groups for 193-nm photoresists

Robert Allen, Ratnam Sooriyakumaran, Juliann Opitz, Gregory Wallraff, Richard Di Pietro, Gregory Breyta, Donald Hofer, Roderick Kunz, Saikumar Jayaraman, Robert Shick, Brian Goodall, Uzodinma Okoroanyanwu, C. Grant Willson

Proceedings Volume 2724, (1996) https://doi.org/10.1117/12.241832

KEYWORDS: Polymers, Etching, Photoresist materials, Plasma etching, Resistance, Plasma, Photoresist developing, Polymer chemistry, Deep ultraviolet, Temperature metrology

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Proceedings Article | 16 May 1994 Paper

Paper

Further improvements in CGR formulation and process

William Brunsvold, Will Conley, Jeffrey Gelorme, Ronald Nunes, Ratnam Sooriyakumaran, Steven Holmes, John Sturtevant

Proceedings Volume 2195, (1994) https://doi.org/10.1117/12.175350

KEYWORDS: Semiconducting wafers, Reticles, Etching, Image processing, Excimer lasers, Materials processing, Manufacturing, Deep ultraviolet, Lithography, Imaging systems

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Proceedings Article | 15 September 1993 Paper

Paper

Negative DUV photoresist for 16Mb-DRAM production and future generations

Will Conley, William Brunsvold, Richard Ferguson, Jeffrey Gelorme, Steven Holmes, Ronald Martino, Magda Petryniak, Paul Rabidoux, Ratnam Sooriyakumaran, John Sturtevant

Proceedings Volume 1925, (1993) https://doi.org/10.1117/12.154744

KEYWORDS: Semiconducting wafers, Photoresist materials, Deep ultraviolet, Lithography, Logic, Manufacturing, Silicon, Etching, Photoresist developing, Ultraviolet radiation

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Proceedings Article | 15 September 1993 Paper

Paper

Evaluation of a deep-UV bilayer resist for sub-half micron lithography

William Brunsvold, Kevin Stewart, Premlatha Jagannathan, Ratnam Sooriyakumaran, J. Parrill, Karl Muller, Harbans Sachdev

Proceedings Volume 1925, (1993) https://doi.org/10.1117/12.154772

KEYWORDS: Semiconducting wafers, Etching, Silicon, Deep ultraviolet, Polymers, Excimer lasers, Printing, Lithography, Reactive ion etching, Photomasks

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Proceedings Article | 15 September 1993 Paper

Paper

Molecular design for stabilization of chemical amplification resist toward airborne contamination

Hiroshi Ito, William England, Nicholas Clecak, Gregory Breyta, Hoosung Lee, Do Yoon, Ratnam Sooriyakumaran, William Hinsberg

Proceedings Volume 1925, (1993) https://doi.org/10.1117/12.154794

KEYWORDS: Polymers, Contamination, Polymer thin films, Absorption, Refractive index, Lithography, Annealing, Glasses, Ultraviolet radiation, Silicon

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Proceedings Article | 15 September 1993 Paper

Paper

New silicon-containing negative resist for bilayer lithography

Premlatha Jagannathan, Ratnam Sooriyakumaran, Harbans Sachdev

Proceedings Volume 1925, (1993) https://doi.org/10.1117/12.154802

KEYWORDS: Polymers, Lithography, Silicon, Etching, Reactive ion etching, Deep ultraviolet, Resistance, Photoresist processing, Semiconducting wafers, Oxygen

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Proceedings Article | 1 June 1991 Paper

Paper

Acid-catalyzed pinacol rearrangement: chemically amplified reverse polarity change

Ratnam Sooriyakumaran, Hiroshi Ito, Eugene Mash

Proceedings Volume 1466, (1991) https://doi.org/10.1117/12.46390

KEYWORDS: Polymers, Absorption, Deep ultraviolet, Polymer thin films, Spectroscopy, Ultraviolet radiation, Chromatography, Polymerization, Photomicroscopy, Matrices

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Showing 5 of 41 publications

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