Ms. Renee D. Lambert Profile

Renee D. Lambert

Associate Staff at MIT Lincoln Lab

SPIE Involvement:

Author

Publications (13)

Proceedings Article | 31 August 2022 Presentation + Paper

Performance of high frame-rate x-ray CCDs for future strategic missions

M. Bautz, R. Foster, C. Grant, B. LaMarr, A. Malonis, E. Miller, G. Prigozhin, B. Burke, M. Cooper, K. Donlon, R. Lambert, K. Warner, D. Young, T. Chattopadhyay, S. Herrmann, R. Morris, C. Leitz, S. Allen

Proceedings Volume 12181, 121812A (2022) https://doi.org/10.1117/12.2630139

KEYWORDS: Sensors, X-rays, Charge-coupled devices, CCD image sensors, Spectral resolution, Amplifiers, Observatories, X-ray imaging

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Proceedings Article | 23 August 2021 Presentation + Paper

Manufacture and performance of blazed soft x-ray transmission gratings for Arcus and Lynx

Ralf Heilmann, Alexander Bruccoleri, Jungki Song, Bethany Levenson, Brian Smallshaw, Mallory Whalen, Alan Garner, Sarah Trowbridge Heine, Herman Marshall, Matthew Cook, James Gregory, Renee Lambert, Dmitri Shapiro, Douglas Young, Eric Gullikson, Tomoyuki Nonaka, Akimi Uchida, Manuel Quijada, Ed Hertz, Peter Cheimets, Randall Smith, Mark Schattenburg

Proceedings Volume 11822, 1182215 (2021) https://doi.org/10.1117/12.2594951

KEYWORDS: Diffraction gratings, Computed tomography, Semiconducting wafers, X-rays, Diffraction, Etching, Deep reactive ion etching, Photomasks, Optical alignment, X-ray diffraction

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Proceedings Article | 13 December 2020 Presentation + Paper

Towards volume manufacturing of high-performance soft x-ray critical-angle transmission gratings

Ralf Heilmann, Alexander Bruccoleri, Jungki Song, Matthew Cook, James Gregory, Renee Lambert, Dimitri Shapiro, Douglas Young, Miranda Bradshaw, Vadim Burwitz, Gisela Hartner, Andreas Langmeier, Randall Smith, Mark Schattenburg

Proceedings Volume 11444, 114441H (2020) https://doi.org/10.1117/12.2562388

KEYWORDS: Diffraction gratings, X-rays, Manufacturing, Spectroscopy, Computed tomography, Diffraction, Absorption, Emission spectroscopy, Diagnostics, Plasmas

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Proceedings Article | 13 December 2020 Presentation + Paper

Germanium charge-coupled devices for hard x-ray astronomy

C. Leitz, K. Donlon, D. Young, R. Lambert, M. Collins, B. Burke, M. Zhu, S. Rabe, M. Cooper, D. O'Mara

Proceedings Volume 11454, 114541B (2020) https://doi.org/10.1117/12.2562583

KEYWORDS: Charge-coupled devices, Semiconducting wafers, Germanium, Back end of line, Silicon, Atomic layer deposition, Sensors, Reticles, Hard x-rays, Back illuminated sensors

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Proceedings Article | 13 May 2019 Paper

Rapid prototyping of single-photon-sensitive backside-illuminated silicon avalanche photodiode arrays

Kevin Ryu, K. Alexander McIntosh, Steven Rabe, Joseph Ciampi, Renee Lambert, Rabindra Das, Bradley Felton, David Volfson, Christopher Leitz, Daniel Schuette, Brian Aull

Proceedings Volume 10980, 109800L (2019) https://doi.org/10.1117/12.2520798

KEYWORDS: Avalanche photodetectors, Semiconducting wafers, Silicon, Readout integrated circuits, Etching, Oxides, Avalanche photodiodes, Sensors, Wet etching, Wafer bonding

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Proceedings Article | 6 July 2018 Paper

Oxide-bonded molecular-beam epitaxial backside passivation process for large-format CCDs

K. Ryu, C. Leitz, H. Clark, X. Chen, M. Cooper, M. Zhu, P. Welander, R. Lambert, V. Bolkhovsky, D.-R. Yost, B. Burke, J. Gregory, V. Suntharalingam

Proceedings Volume 10699, 106993P (2018) https://doi.org/10.1117/12.2311512

KEYWORDS: Semiconducting wafers, Charge-coupled devices, Hydrogen, Oxides, Silicon, Quantum efficiency, Wafer bonding, Ultraviolet radiation, Interfaces, Plasma enhanced chemical vapor deposition, Molecular beam epitaxy

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Proceedings Article | 24 July 2014 Paper

Development of CCDs for REXIS on OSIRIS-REx

Kevin Ryu, Barry Burke, Harry Clark, Renee Lambert, Peter O'Brien, Vyshnavi Suntharalingam, Christopher Ward, Keith Warner, Mark Bautz, Richard Binzel, Steven Kissel, Rebecca Masterson

Proceedings Volume 9144, 91444O (2014) https://doi.org/10.1117/12.2055260

KEYWORDS: Charge-coupled devices, X-rays, Aluminum, Silicon, Semiconducting wafers, X-ray imaging, Imaging systems, Absorption, Asteroids, Spectral resolution

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Proceedings Article | 10 July 2003 Paper

Dense only phase-shift template lithography

Michael Fritze, Brian Tyrrell, Renee Mallen, Bruce Wheeler, Peter Rhyins, Patrick Martin

Proceedings Volume 5042, (2003) https://doi.org/10.1117/12.485244

KEYWORDS: Photomasks, Lithography, Resolution enhancement technologies, Semiconducting wafers, Phase shifts, Optical proximity correction, Spatial frequencies, Computer aided design, Wafer-level optics, Neodymium

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Proceedings Article | 26 June 2003 Paper

Limits of strong phase-shift patterning for device research

Michael Fritze, Renee Mallen, Bruce Wheeler, Donna Yost, John Snyder, Bryan Kasprowicz, Benjamin Eynon, Hua-Yu Liu

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485332

KEYWORDS: Optical proximity correction, Photomasks, Etching, Transistors, Optical lithography, Phase shifts, Line edge roughness, Image processing, Photoresist processing, Oxidation

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SPIE Journal Paper | 1 October 2002

Investigation of the physical and practical limits of dense-only phase shift lithography for circuit feature definition

Brian Tyrrell, Michael Fritze, David Astolfi, Renee Mallen, Bruce Wheeler, Peter Rhyins, Patrick Martin

JM3, Vol. 1, Issue 03, (October 2002) https://doi.org/10.1117/12.10.1117/1.1503349

KEYWORDS: Photomasks, Lithography, Phase shifts, Image processing, Optical proximity correction, Semiconducting wafers, Optical lithography, Inspection, Binary data, System on a chip

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Proceedings Article | 12 July 2002 Paper

Investigation of the physical and practical limits of dense-only phase-shift lithography for circuit feature definition

Brian Tyrrell, Michael Fritze, Renee Mallen, Bruce Wheeler, Peter Rhyins, Patrick Martin

Proceedings Volume 4692, (2002) https://doi.org/10.1117/12.475686

KEYWORDS: Photomasks, Lithography, Phase shifts, Semiconducting wafers, Optical proximity correction, Optical lithography, Image processing, Inspection, Binary data, Photoresist processing

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Proceedings Article | 14 September 2001 Paper

100-nm node lithography with KrF?

Michael Fritze, Brian Tyrrell, David Astolfi, Donna Yost, Paul Davis, Bruce Wheeler, Renee Mallen, J. Jarmolowicz, Susan Cann, Hua-Yu Liu, M. Ma, David Chan, Peter Rhyins, Chris Carney, John Ferri, B. Blachowicz

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435719

KEYWORDS: Photomasks, Lithography, Optical proximity correction, Photoresist processing, Optical lithography, Optics manufacturing, Image processing, Scanning electron microscopy, Double patterning technology, Etching

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Proceedings Article | 22 August 2001 Paper

Investigation of full-field CD control of sub-100-nm gate features by phase-shift 248-nm lithography

Michael Fritze, Brian Tyrrell, David Astolfi, Paul Davis, Bruce Wheeler, Renee Mallen, J. Jarmolowicz, Susan Cann, David Chan, Peter Rhyins, Martin Mastovich, Neal Sullivan, Robert Brandom, Chris Carney, John Ferri, B. Blachowicz

Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436759

KEYWORDS: Lithography, Semiconducting wafers, Optical lithography, Photomasks, Critical dimension metrology, Reticles, Cadmium, Resolution enhancement technologies, Metrology, Phase shifts

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Showing 5 of 13 publications

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