Mr. Ron Davidescu Profile

Ron Davidescu

SPIE Involvement:

Author

Publications (1)

This will count as one of your downloads.

You will have access to both the presentation and article (if available).

DOWNLOAD NOW

This content is available for download via your institution's subscription. To access this item, please sign in to your personal account.

Email or Username Forgot your username?

Password Forgot your password?

Show

Keep me signed in

No SPIE account? Create an account

Proceedings Article | 24 March 2020 Presentation + Paper

Accelerating on-device overlay metrology accuracy verification

Yaniv Abramovitz, Lior Sarig, Guy Levin, Shimon Levi, Ron Davidescu, Daniel Harel, Ofer Adan, Philippe Leray, Sandip Halder

Proceedings Volume 11325, 1132515 (2020) https://doi.org/10.1117/12.2568682

KEYWORDS: Overlay metrology, Semiconducting wafers, Scanning electron microscopy, Photomasks, Metrology, Wafer-level optics, Etching, Transmission electron microscopy

Read Abstract +

Node to node design rule are shrinking to enable better performance envelope in storage, computing power and electrical usage. A major part of every technology development is verification of the actual device overlay for thick stacks. Today the IC manufactures utilize TEM, Fib and other methods to understand the impact of overlay for thick stacks. These methods, which are considered as a “ground truth” of the fab, can give very good resolution of the features shape characteristics, material contrast, metrology and defectivity. That said, some are destructive and have long time to results. Another approach for thick stack is to use eBeam high kV landing with elluminator technology, this enables fast see through measurements of overlay, yet this approach has also limitation where layer stack thickness exceeds see through imaging capability while chipmakers still require seeing the bottom layer to measure the overlay. In this paper, we propose a flow of accurate in-line runtime delayer method flowed by an eBeam elluminator technology for overlay verification as an extension of current eBeam measurement capabilities. This flow can be complimentary for different applications space where there’s imaging limitation of the eBeam. The excellent local delayer control enables shorter time to root cause, process and design verification metrology (as a “golden ruler”) in runtime fab. The work is based on IMEC frontend wafer at source drain Implant process steps after Hard Mask Etch. Looking at device features we explore the accuracy of new flow in sampling fins, dummy gate and Hard mask openings for implant process steps. Reference eBeam metrology will verify the accuracy of the delayer metrology.

My Library

You currently do not have any folders to save your paper to! Create a new folder below.

Folder Name

Folder Description

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks. You are receiving this notice because your organization may not have SPIE eBooks access.*

*Shibboleth/Open Athens users─please sign in to access your institution's subscriptions.

To obtain this item, you may purchase the complete book in print or electronic format on SPIE.org.

ORGANIZATIONAL
Sign in with credentials provided by your organization.

Organizational Username

Organizational Password

Show/Hide Password

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members:

Non-members: ADD TO CART

Keywords/Phrases

Search In:

Publication Years