Dr. Rui Jiang Profile

Dr. Rui Jiang

at illumina Inc

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Author

Publications (4)

Proceedings Article | 13 March 2012 Paper

Advanced light source technologies that enable high-volume manufacturing of DUV lithography extensions

Theodore Cacouris, Rajasekhar Rao, Rostislav Rokitski, Rui Jiang, John Melchior, Bernd Burfeindt, Kevin O'Brien

Proceedings Volume 8326, 83261G (2012) https://doi.org/10.1117/12.917827

KEYWORDS: Light sources, Lithography, Metrology, Deep ultraviolet, Double patterning technology, Optical lithography, Optical testing, Light, Neodymium, High volume manufacturing

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Proceedings Article | 23 March 2011 Paper

High-range laser light bandwidth measurement and tuning

Kevin O'Brien, Rui Jiang, Nora Han, Efrain Figueroa, Raj Rao, Robert Rafac

Proceedings Volume 7973, 797326 (2011) https://doi.org/10.1117/12.881167

KEYWORDS: Metrology, Control systems, Light sources, Laser stabilization, Lithography, Light, Laser drilling, Switching, Sensors, Optical testing

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Proceedings Article | 4 March 2010 Paper

High reliability ArF light source for double patterning immersion lithography

Rostislav Rokitski, Toshi Ishihara, Rajeskar Rao, Rui Jiang, Mary Haviland, Theodore Cacouris, Daniel Brown

Proceedings Volume 7640, 76401Q (2010) https://doi.org/10.1117/12.849065

KEYWORDS: Light sources, Double patterning technology, Reliability, Immersion lithography, Electrodes, Lithography, Scanners, Deep ultraviolet, Optical proximity correction, Excimer lasers

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Proceedings Article | 11 December 2009 Paper

Flexible 60-90W ArF light source for double patterning immersion lithography in high volume manufacturing

Slava Rokitski, Toshi Ishihara, Rajeskar Rao, Rui Jiang, Daniel Riggs, Mary Haviland, Theodore Cacouris, Daniel Brown

Proceedings Volume 7520, 752013 (2009) https://doi.org/10.1117/12.839803

KEYWORDS: Light sources, Double patterning technology, Control systems, Scanners, Immersion lithography, Lithography, Deep ultraviolet, Polarization, Optical proximity correction, High volume manufacturing

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