To maintain high transmittance for long time use in the ArF and F2 lithography exposure tools is highly requested, which is strongly dependent on the transmittance of the optical coatings. The following experimental fact was reported in the F2 laser durability testing; the transmittance degradation of the optical coatings did not occur under low power laser irradiation of less than 5 mJ/cm2, but a catastrophic degradation of transmittance did under high power laser irradiation over 15 mJ/cm2. We have set a program to investigate the causes of the laser-induced degradation of the optical coatings. Consequently, we have found a relationship between the contaminations of the irradiation atmosphere and the transmittance degradation through various experimental conditions and analyses such as SIMS and GCMS. Finally, we have succeeded in remarkably improving the durability of the antireflection coating (ARC) by optimizing the atmospheric conditions.
In the F2 laser lithography, it is essential to reduce the loss of the optical coatings deposited on calcium fluoride lenses. In order to make low loss optical coatings, we have developed measurement apparatus, evaluated the coatings with various analyses, and found a correlation with the optical constants. In this paper we describe the optical loss measurement apparatus and the evaluation results analyzed for either single layer coatings or multi-layer anti-reflection coatings.
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