Dr. Shaowen Gao Profile

Dr. Shaowen Gao

at Synopsys Inc

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Publications (6)

Proceedings Article | 20 March 2019 Presentation + Paper

Machine learning based wafer defect detection

Yuansheng Ma, Feng Wang, Qian Xie, Le Hong, Joerg Mellmann, Yuyang Sun, Shao Wen Gao, Sonal Singh, Panneerselvam Venkatachalam, James Word

Proceedings Volume 10962, 1096208 (2019) https://doi.org/10.1117/12.2513232

KEYWORDS: Data modeling, Machine learning, Semiconducting wafers, Defect detection, Statistical modeling, Optics manufacturing, Optical proximity correction, Wafer-level optics, Feature extraction, High volume manufacturing

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Proceedings Article | 28 March 2018 Presentation + Paper

Combinational optical rule check on hotspot detection

Alexander Wei, Shaowen Gao, Yuansheng Ma, Shumay Shang, Yuyang Sun, Rui Wu, Lianghong Yin, Hongxin Zhang

Proceedings Volume 10588, 105880K (2018) https://doi.org/10.1117/12.2297425

KEYWORDS: Optical proximity correction, Failure analysis, Semiconducting wafers, Calibration, Data modeling, Photomasks, Inspection, Optics manufacturing, Bridges, Finite element methods

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Proceedings Article | 16 October 2017 Paper

Implementation of CDSEM contour extraction on OPC verification

Liang Cao, Jie Zhang, Hongxin Zhang, Jiechang Hou, Guoxiang Ning, William Wilkinson, Shaowen Gao, Norman Chen

Proceedings Volume 10451, 104510Z (2017) https://doi.org/10.1117/12.2280422

KEYWORDS: Silicon, Optical proximity correction, Critical dimension metrology, Image processing, Lithography, Data modeling, Metrology, Semiconducting wafers, Statistical analysis, Scanning electron microscopy

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Proceedings Article | 23 March 2016 Paper

Expanding the printable design space for lithography processes utilizing a cut mask

Jerome Wandell, Mohamed Salama, William Wilkinson, Mark Curtice, Jui-Hsuan Feng, Shao Wen Gao, Abhishek Asthana

Proceedings Volume 9781, 978112 (2016) https://doi.org/10.1117/12.2219201

KEYWORDS: Photomasks, Lithography, Optical proximity correction, Double patterning technology, Optical lithography, Design for manufacturability, Manufacturing, Lithographic illumination, Semiconductors, Logic devices, Printing, Photovoltaics, Analog electronics, Etching, Line width roughness, SRAF

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Proceedings Article | 29 March 2013 Paper

Investigation of trench and contact hole shrink mechanism in the negative tone develop process

Sohan Singh Mehta, Craig Higgins, Vikrant Chauhan, Shyam Pal, Hui Peng Koh, Jean Raymond Fakhoury, Shaowen Gao, Lokesh Subramany, Salman Iqbal, Bumhwan Jeon, Pedro Morrison, Chris Karanikas, Yayi Wei, David Cho

Proceedings Volume 8682, 86820O (2013) https://doi.org/10.1117/12.2012331

KEYWORDS: Diffusion, Critical dimension metrology, Polymers, Photoresist processing, Image processing, Manufacturing, Lithography, Optical lithography, Data modeling, Modulation

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Proceedings Article | 23 March 2011 Paper

Optimizing OPC data sampling based on "orthogonal vector space"

Yuyang Sun, Yee Mei Foong, Yingfang Wang, Jacky Cheng, Dongqing Zhang, Shaowen Gao, Nanshu Chen, Byoung Il Choi, Antoine Bruguier, Mu Feng, Jianhong Qiu, Stefan Hunsche, Liang Liu, Wenjin Shao

Proceedings Volume 7973, 79732K (2011) https://doi.org/10.1117/12.881575

KEYWORDS: Data modeling, Vector spaces, Calibration, Optical proximity correction, Semiconducting wafers, Statistical modeling, Metrology, Time metrology, Process modeling, Image analysis

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Showing 5 of 6 publications

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