Dr. Sarath Samdurala
at Lawrence Berkeley National Lab.
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 31 October 2022 Poster
Proceedings Volume PC12292, PC122920Y (2022) https://doi.org/10.1117/12.2645263
KEYWORDS: Extreme ultraviolet, Ruthenium, Phase shifts, Photomasks, Stochastic processes, Resolution enhancement technologies, Extreme ultraviolet lithography, Double patterning technology, Reticles, Optical lithography

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