Dr. Saša Bajt Profile

Dr. Saša Bajt

Group Leader at CFEL/ DESY

SPIE Involvement:

Editor | Author

Publications (37)

Proceedings Article | 8 July 2021 Open Access

Open Access

Paper

On the use of multilayer Laue lenses with X-ray free electron lasers

Mauro Prasciolu, Kevin Murray, Nikolay Ivanov, Holger Fleckenstein, Martin Domaracký, Luca Gelisio, Fabian Trost, Kartik Ayyer, Dietrich Krebs, Steve Aplin, Salah Awel, Ulrike Boesenberg, Grega Belšak, Anton Barty, Armando Estillore, Matthias Fuchs, Yaroslav Gevorkov, Joerg Hallmann, Chan Kim, Juraj Knoška, Jochen Küpper, Chufeng Li, Wei Lu, Valerio Mariani, Andrew Morgan, Johannes Möller, Anders Madsen, Dominik Oberthür, Gisel Peña Murillo, David Reis, Markus Scholz, Božidar Šarler, Pablo Villanueva-Perez, Oleksandr Yefanov, Kara Zielinski, Alexey Zozulya, Henry Chapman, Saša Bajt

Proceedings Volume 11886, 118860M (2021) https://doi.org/10.1117/12.2592229

Read Abstract +

Proceedings Article | 12 May 2015 Paper

Paper

Diffraction gratings based on asymmetric-cut multilayers

Mauro Prasciolu, Henry Chapman, Saša Bajt

Proceedings Volume 9510, 95100S (2015) https://doi.org/10.1117/12.2178246

KEYWORDS: Multilayers, Silicon, Diffraction gratings, Polishing, Coating, Silica, X-rays, Etching, Surface roughness, Wet etching

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Proceedings Article | 3 May 2013 Paper

Paper

Characterizing the focus of a multilayer coated off-axis parabola for FLASH beam at λ = 4.3 nm

Adam F. Leontowich, Andrew Aquila, Francesco Stellato, Richard Bean, Holger Fleckenstein, Mauro Prasciolu, Mengning Liang, Daniel DePonte, Anton Barty, Fenglin Wang, Jakob Andreasson, Janos Hajdu, Henry Chapman, Saša Bajt

Proceedings Volume 8777, 87770T (2013) https://doi.org/10.1117/12.2022403

KEYWORDS: Multilayers, Free electron lasers, Photomicroscopy, Polymethylmethacrylate, Optical testing, Signal attenuation, Mirrors, Reflectivity, Photons, X-ray optics

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Proceedings Article | 19 October 2012 Paper

Paper

Profiling structured beams using injected aerosols

N. Loh, Dmitri Starodub, Lukas Lomb, Christina Hampton, Andrew Martin, Raymond Sierra, Anton Barty, Andrew Aquila, Joachim Schulz, Jan Steinbrener, Robert Shoeman, Stephan Kassemeyer, Christoph Bostedt, John Bozek, Sascha Epp, Benjamin Erk, Robert Hartmann, Daniel Rolles, Artem Rudenko, Benedikt Rudek, Lutz Foucar, Nils Kimmel, Georg Weidenspointner, Günther Hauser, Peter Holl, Emanuele Pedersoli, MengNing Liang, Mark Hunter, Lars Gumprecht, Nicola Coppola, Cornelia Wunderer, Heinz Graafsman, Filipe R. N. Maia, Tomas Ekeberg, Max Hantke, Holger Fleckenstein, Helmut Hirsemann, Karol Nass, Thomas White, Herbert Tobias, George Farquar, W. Henry Benner, Stefan Hau-Riege, Christian Reich, Andreas Hartmann, Heike Soltau, Stefano Marchesini, Sasa Bajt, Miriam Barthelmess, Lothar Strueder, Joachim Ullrich, Philip Bucksbaum, Keith Hodgson, Mathias Frank, Ilme Schlichting, Henry Chapman, Michael Bogan

Proceedings Volume 8504, 850403 (2012) https://doi.org/10.1117/12.930075

KEYWORDS: Optical spheres, Free electron lasers, Diffraction, Sensors, Photons, Profiling, X-rays, Wavefronts, Aerosols, Scattering

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Proceedings Article | 5 October 2011 Paper

Paper

Polarization measurements of plasma excited x-ray lasers

Andrew Aquila, Davide Bleiner, Jürg Balmer, Saša Bajt

Proceedings Volume 8140, 81400Z (2011) https://doi.org/10.1117/12.893317

KEYWORDS: Polarization, X-ray lasers, Plasma, Diffraction gratings, Polarizers, Multilayers, X-rays, X-ray optics, Diffraction, Linear polarizers

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Proceedings Article | 21 May 2011 Paper

Paper

Single particle imaging with soft x-rays at the Linac Coherent Light Source

Andrew Martin, Jakob Andreasson, Andrew Aquila, Saša Bajt, Thomas R. Barends, Miriam Barthelmess, Anton Barty, W. Henry Benner, Christoph Bostedt, John Bozek, Phillip Bucksbaum, Carl Caleman, Nicola Coppola, Daniel DePonte, Tomas Ekeberg, Sascha Epp, Benjamin Erk, George Farquar, Holger Fleckenstein, Lutz Foucar, Matthias Frank, Lars Gumprecht, Christina Hampton, Max Hantke, Andreas Hartmann, Elisabeth Hartmann, Robert Hartmann, Stephan Hau-Riege, Günther Hauser, Peter Holl, André Hoemke, Olof Jönsson, Stephan Kassemeyer, Nils Kimmel, Maya Kiskinova, Faton Krasniqi, Jacek Krzywinski, Mengning Liang, Ne-Te Duane Loh, Lukas Lomb, Filipe R. N. Maia, Stefano Marchesini, Marc Messerschmidt, Karol Nass, Duško Odic, Emanuele Pedersoli, Christian Reich, Daniel Rolles, Benedikt Rudek, Artem Rudenko, Carlo Schmidt, Joachim Schultz, M. Marvin Seibert, Robert Shoeman, Raymond Sierra, Heike Soltau, Dmitri Starodub, Jan Steinbrener, Francesco Stellato, Lothar Strüder, Martin Svenda, Herbert Tobias, Joachim Ullrich, Georg Weidenspointner, Daniel Westphal, Thomas White, Garth Williams, Janos Hajdu, Ilme Schlichting, Michael Bogan, Henry Chapman

Proceedings Volume 8078, 807809 (2011) https://doi.org/10.1117/12.886754

KEYWORDS: Diffraction, Particles, X-rays, Light sources, Sensors, Liquid crystal lasers, X-ray imaging, X-ray diffraction, Coherence imaging, Free electron lasers

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Proceedings Article | 19 May 2011 Paper

Paper

X-ray laser-induced ablation of lead compounds

V. Hájková, L. Juha, P. Boháček, T. Burian, J. Chalupský, L. Vyšín, J. Gaudin, P. Heimann, S. Hau-Riege, M. Jurek, D. Klinger, J. Pelka, R. Sobierajski, J. Krzywinski, M. Messerschmidt, S. Moeller, B. Nagler, M. Rowen, W. Schlotter, M. Swiggers, J. Turner, S. Vinko, T. Whitcher, J. Wark, M. Matuchová, S. Bajt, H. Chapman, T. Dzelzainis, D. Riley, J. Andreasson, J. Hajdu, B. Iwan, N. Timneanu, K. Saksl, R. Fäustlin, A. Singer, K. Tiedtke, S. Toleikis, I. Vartaniants, H. Wabnitz

Proceedings Volume 8077, 807718 (2011) https://doi.org/10.1117/12.890134

KEYWORDS: X-rays, Liquid crystal lasers, Laser ablation, Lead, Free electron lasers, Signal attenuation, Extreme ultraviolet, X-ray lasers, Laser damage threshold, Polymethylmethacrylate

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Proceedings Article | 19 May 2011 Paper

Paper

Thermal stability on Mo/B[sub]4[/sub]C multilayers

Miriam Barthelmess, Saša Bajt

Proceedings Volume 8077, 807710 (2011) https://doi.org/10.1117/12.886751

KEYWORDS: Annealing, Reflectivity, Temperature metrology, Multilayers, Transmission electron microscopy, Molybdenum, Interfaces, Crystals, Diffusion, X-ray optics

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Proceedings Article | 29 September 2009 Paper

Paper

Perspective for high energy density studies on x-ray FELs

R. Lee, B. Nagler, U. Zastrau, R. Fäustlin, S. Vinko, T. Whitcher, R. Sobierajski, J. Krzywinski, L. Juha, A. Nelson, S. Bajt, K. Budil, R. Cauble, T. Bornath, T. Burian, J. Chalupsky, H. Chapman, J. Cihelka, T. Döppner, T. Dzelzainis, S. Düsterer, M. Fajardo, E. Förster, C. Fortmann, S. Glenzer, S. Göde, G. Gregori, V. Hajkova, P. Heimann, M. Jurek, F. Khattak, A. Khorsand, D. Klinger, M. Kozlova, T. Laarmann, H.-J. Lee, K.-H. Meiwes-Broer, P. Mercere, W. Murphy, A. Przystawik, R. Redmer, H. Reinholz, D. Riley, G. Röpke, K. Saksl, R. Thiele, J. Tiggesbäumker, S. Toleikis, T. Tschentscher, I. Uschmann, R. Falcone, R. Shepherd, J. Hastings, W. White, J. Wark

Proceedings Volume 7451, 74510E (2009) https://doi.org/10.1117/12.825349

KEYWORDS: Free electron lasers, X-rays, Extreme ultraviolet, Electrons, Absorption, Luminescence, Liquid crystal lasers, Photons, Fusion energy, Chemical species

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Proceedings Article | 18 May 2009 Paper

Paper

Optical emission spectroscopy of various materials irradiated by soft x-ray free-electron laser

J. Cihelka, L. Juha, J. Chalupský, F. Rosmej, O. Renner, K. Saksl, V. Hájková, L. Vyšin, E. Galtier, R. Schott, A. Khorsand, D. Riley, T. Dzelzainis, A. Nelson, R. Lee, P. Heimann, B. Nagler, S. Vinko, J. Wark, T. Whitcher, S. Toleikis, T. Tschentscher, R. Faustlin, H. Wabnitz, S. Bajt, H. Chapman, J. Krzywinski, R. Sobierajski, D. Klinger, M. Jurek, J. Pelka, S. Hau-Riege, R. London, J. Kuba, N. Stojanovic, K. Sokolowski-Tinten, A. Gleeson, M. Störmer, J. Andreasson, J. Hajdu, N. Timneanu

Proceedings Volume 7361, 73610P (2009) https://doi.org/10.1117/12.822766

KEYWORDS: Aluminum, Plasma, Silicon, Ions, Free electron lasers, Copper, Chemical species, Spectroscopy, Mirrors, Emission spectroscopy

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Proceedings Article | 18 May 2009 Paper

Paper

Sub-micron focusing of soft x-ray free electron laser beam

S. Bajt, H. Chapman, A. Nelson, R. Lee, S. Toleikis, P. Mirkarimi, J. Alameda, S. Baker, H. Vollmer, R. Graff, A. Aquila, E. Gullikson, J. Meyer Ilse, E. Spiller, J. Krzywinski, L. Juha, J. Chalupský, V. Hájková, J. Hajdu, T. Tschentscher

Proceedings Volume 7361, 73610J (2009) https://doi.org/10.1117/12.822498

KEYWORDS: Reflectivity, Carbon, Contamination, Mirrors, Plasma, Oxygen, Free electron lasers, Wavefronts, X-rays, Diffraction

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Proceedings Article | 1 April 2008 Paper

Paper

EUV optics contamination studies in presence of selected hydrocarbons

R. Garg, A. Wüest, E. Gullikson, S. Bajt, G. Denbeaux

Proceedings Volume 6921, 692136 (2008) https://doi.org/10.1117/12.772770

KEYWORDS: Carbon, Contamination, Reflectivity, Extreme ultraviolet lithography, Mirrors, EUV optics, Ruthenium, Extreme ultraviolet, Molecules, Xenon

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Proceedings Article | 28 March 2008 Paper

Paper

Extreme ultraviolet resist outgassing and its effect on nearby optics

Gregory Denbeaux, Rashi Garg, Chimaobi Mbanaso, Justin Waterman, Leonid Yankulin, Alin Antohe, Yu-Jen Fan, Warren Montgomery, Kim Dean, Kevin Orvek, Andrea Wüest, Yayi Wei, Frank Goodwin, Obert Wood, Chiew-Seng Koay, Eric Gullikson, Andy Aquila, Charles Tarrio, Steven Grantham, Saša Bajt

Proceedings Volume 6921, 69211G (2008) https://doi.org/10.1117/12.772670

KEYWORDS: Mirrors, Reflectivity, EUV optics, Molecules, Extreme ultraviolet lithography, Contamination, Spectroscopy, Extreme ultraviolet, Photoresist materials, Calibration

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Proceedings Article | 18 May 2007 Paper

Paper

Multilayers for next-generation x-ray sources

S. Bajt, H. Chapman, E. Spiller, S. Hau-Riege, J. Alameda, A. Nelson, C. Walton, B. Kjornrattanawanich, A. Aquila, F. Dollar, E. Gullikson, C. Tarrio, S. Grantham

Proceedings Volume 6586, 65860J (2007) https://doi.org/10.1117/12.724786

KEYWORDS: Reflectivity, Mirrors, Multilayers, Free electron lasers, Silicon, X-ray optics, X-rays, X-ray sources, Coating, Optical components

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Proceedings Article | 19 March 2007 Paper

Paper

Critical parameters influencing the EUV-induced damage of Ru-capped multilayer mirrors

S. Hill, I. Ermanoski, C. Tarrio, T. Lucatorto, T. Madey, S. Bajt, M. Fang, M. Chandhok

Proceedings Volume 6517, 65170G (2007) https://doi.org/10.1117/12.712286

KEYWORDS: Reflectivity, Mirrors, Extreme ultraviolet lithography, Extreme ultraviolet, Carbon, Silicon, Ruthenium, Electrons, Ions, Oxidation

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SPIE Journal Paper | 1 April 2006

Oxidation resistance and microstructure of ruthenium-capped extreme ultraviolet lithography multilayers

Sasa Bajt, Zu Rong Dai, Erik Nelson, Mark Wall, Jennifer Alameda, Nhan Nguyen, Sherry Baker, Jeffrey Robinson, John Taylor, Andrew Aquila, Nora Edwards

JM3, Vol. 5, Issue 02, 023004, (April 2006) https://doi.org/10.1117/12.10.1117/1.2201027

KEYWORDS: Ruthenium, Silicon, Molybdenum, Extreme ultraviolet lithography, Reflectivity, Electrons, Oxides, Resistance, Transmission electron microscopy, Oxidation

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Proceedings Article | 23 March 2006 Paper

Paper

EUV testing of multilayer mirrors: critical issues

S. Hill, I. Ermanoski, S. Grantham, C. Tarrio, T. Lucatorto, T. Madey, S. Bajt, M. Chandhok, P. Yan, O. Wood, S. Wurm, N. Edwards

Proceedings Volume 6151, 61510F (2006) https://doi.org/10.1117/12.656502

KEYWORDS: Mirrors, Extreme ultraviolet, Reflectivity, Carbon monoxide, Extreme ultraviolet lithography, Molecules, EUV optics, Carbon, Reflectometry, Synchrotrons

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Proceedings Article | 8 September 2005 Paper

Paper

Ultra-high-accuracy optical testing: creating diffraction-limited short-wavelength optical systems

Kenneth Goldberg, Patrick Naulleau, Senajith Rekawa, Paul Denham, J. Liddle, Eric Gullikson, Keith Jackson, Erik Anderson, John Taylor, Gary Sommargren, Henry Chapman, Donald Phillion, Michael Johnson, Anton Barty, Regina Soufli, Eberhard Spiller, Christopher Walton, Sasa Bajt

Proceedings Volume 5900, 59000G (2005) https://doi.org/10.1117/12.618066

KEYWORDS: Extreme ultraviolet, Optical testing, Interferometry, EUV optics, X-ray optics, X-rays, Lenses, Light sources, Astronomical imaging, X-ray astronomy

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Proceedings Article | 6 May 2005 Paper

Paper

Substrate smoothing for high-temperature condenser operation in EUVL source environments

Regina Soufli, Sherry Baker, Susan Ratti, Jeff Robinson, Sasa Bajt, Jennifer Alameda, Eberhard Spiller, John Taylor, Eric Gullikson, Franklin Dollar, Andrew Aquila, Robert Bristol

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.606466

KEYWORDS: Extreme ultraviolet lithography, Aluminum, Annealing, Silicon, Atomic force microscopy, Multilayers, Reflectivity, Coating, Extreme ultraviolet, Ceramics

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Proceedings Article | 6 May 2005 Paper

Paper

Oxidation resistance of Ru-capped EUV multilayers

Sasa Bajt, Zu Rong Dai, Erik Nelson, Mark Wall, Jennifer Alameda, Nhan Nguyen, Sherry Baker, Jeffrey Robinson, John Taylor, Miles Clift, Andy Aquila, Eric Gullikson, N. V. Ginger Edwards

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.597443

KEYWORDS: Ruthenium, Reflectivity, Silicon, Multilayers, Oxides, Electron beams, Resistance, Molybdenum, Extreme ultraviolet lithography, Oxidation

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Proceedings Article | 3 November 2004 Paper

Paper

Synchrotron x-ray study of multilayers in Laue geometry

Hyon Chol Kang, Gregory Stephenson, Chian Liu, Ray Conley, Albert Macrander, Jorg Maser, Sasa Bajt, Henry Chapman

Proceedings Volume 5537, (2004) https://doi.org/10.1117/12.560173

KEYWORDS: Multilayers, Zone plates, Diffraction, X-rays, Hard x-rays, X-ray optics, Multiple scattering, Synchrotrons, Scattering, X-ray diffraction

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Proceedings Article | 14 October 2004 Paper

Paper

An assessment of yttrium optical constants EUV using Mo/Y multilayers designed as in the linear polarizers

Benjawan Kjornrattanawanich, Regina Soufli, Sasa Bajt, David Windt, John Seely

Proceedings Volume 5538, (2004) https://doi.org/10.1117/12.560465

KEYWORDS: Multilayers, Polarization, Yttrium, Reflectivity, Transmittance, Extreme ultraviolet, Linear polarizers, Wave plates, Photodiodes, Molybdenum

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Proceedings Article | 29 January 2004 Paper

Paper

Multilayer-coated photodiodes with polarization sensitivity at EUV wavelength

Benjawan Kjornrattanawanich, Sasa Bajt, John Seely

Proceedings Volume 5168, (2004) https://doi.org/10.1117/12.507115

KEYWORDS: Multilayers, Photodiodes, Polarization, Reflectivity, Transmittance, Extreme ultraviolet, Coating, Silicon, Molybdenum, Polarizers

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Proceedings Article | 19 December 2003 Paper

Paper

Near-field spatial imaging of the 11.9-nm Ni-like Sn soft x-ray laser

Juerg Balmer, Felix Staub, Sasa Bajt, Jennifer Alameda, Joseph Nilsen

Proceedings Volume 5197, (2003) https://doi.org/10.1117/12.507455

KEYWORDS: Tin, X-ray lasers, Mirrors, Near field, Palladium, X-rays, Laser beam propagation, Pulsed laser operation, Plasma, Picosecond phenomena

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Proceedings Article | 16 June 2003 Paper

Paper

Atomic hydrogen cleaning of EUV multilayer optics

Samuel Graham, Charles Steinhaus, W. Miles Clift, Leonard Klebanoff, Sasa Bajt

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.499373

KEYWORDS: Hydrogen, Carbon, Extreme ultraviolet, EUV optics, Reflectivity, Wafer-level optics, Spectroscopy, Lithography, Contamination, Silicon

Read Abstract +

Recent studies have been conducted to investigate the use of atomic hydrogen as an in-situ contamination removal method for EUV optics. In these experiments, a commercial source was used to produce atomic hydrogen by thermal dissociation of molecular hydrogen using a hot filament. Samples for these experiments consisted of silicon wafers coated with sputtered carbon, Mo/Si optics with EUV-induced carbon, and bare Si-capped and Ru-B4C-capped Mo/Si optics. Samples were exposed to an atomic hydrogen source at a distance of 200 - 500 mm downstream and angles between 0-90° with respect to the source. Carbon removal rates and optic oxidation rates were measured using Auger electron spectroscopy depth profiling. In addition, at-wavelength peak reflectance (13.4 nm) was measured using the EUV reflectometer at the Advanced Light Source. Data from these experiments show carbon removal rates up to 20 Å/hr for sputtered carbon and 40 Å/hr for EUV deposited carbon at a distance of 200 mm downstream. The cleaning rate was also observed to be a strong function of distance and angular position. Experiments have also shown that the carbon etch rate can be increased by a factor of 4 by channeling atomic hydrogen through quartz tubes in order to direct the atomic hydrogen to the optic surface. Atomic hydrogen exposures of bare optic samples show a small risk in reflectivity degradation after extended periods. Extended exposures (up to 20 hours) of bare Si-capped Mo/Si optics show a 1.2% loss (absolute) in reflectivity while the Ru-B₄C-capped Mo/Si optics show a loss on the order of 0.5%. In order to investigate the source of this reflectivity degradation, optic samples were exposed to atomic deuterium and analyzed using low energy ion scattering direct recoil spectroscopy to determine any reactions of the hydrogen with the multilayer stack. Overall, the results show that the risk of over-etching with atomic hydrogen is much less than previous studies using RF discharge cleaning while providing cleaning rates suitable for EUV lithography operations.

Proceedings Article | 16 June 2003 Paper

Paper

Design and performance of capping layers for EUV multilayer mirrors

Sasa Bajt, Henry Chapman, Nhan Nguyen, Jennifer Alameda, Jeffrey Robinson, Michael Malinowski, Eric Gullikson, Andy Aquila, Charles Tarrio, Steven Grantham

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484966

KEYWORDS: Reflectivity, Multilayers, Electron beams, Extreme ultraviolet lithography, Mirrors, Extreme ultraviolet, Ruthenium, Silicon, Molybdenum, Oxidation

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Proceedings Article | 16 June 2003 Paper

Paper

Relation between electron- and photon-caused oxidation in EUVL optics

Michael Malinowski, Charles Steinhaus, Donald Meeker, W. Miles Clift, Leonard Klebanoff, Sasa Bajt

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.499360

KEYWORDS: Extreme ultraviolet lithography, Silicon, Mirrors, Photons, Electron beams, Extreme ultraviolet, Lithography, Electrons, Oxidation

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SPIE Journal Paper | 1 August 2002

Improved reflectance and stability of Mo/Si multilayers

Sasa Bajt, Jennifer Alameda, Troy Barbee, W. Miles Clift, James Folta, Benjamin Kaufmann, Eberhard Spiller

OE, Vol. 41, Issue 08, (August 2002) https://doi.org/10.1117/12.10.1117/1.1489426

KEYWORDS: Multilayers, Reflectivity, Silicon, Interfaces, Molybdenum, Boron, Extreme ultraviolet lithography, Ruthenium, Extreme ultraviolet, Silicon carbide

Proceedings Article | 20 December 2001 Paper

Paper

Improved reflectance and stability of Mo/Si multilayers

Sasa Bajt, Jennifer Alameda, Troy Barbee, W. Miles Clift, James Folta, Benjamin Kaufmann, Eberhard Spiller

Proceedings Volume 4506, (2001) https://doi.org/10.1117/12.450946

KEYWORDS: Multilayers, Reflectivity, Silicon, Boron, Ruthenium, Molybdenum, Interfaces, Extreme ultraviolet, Extreme ultraviolet lithography, Silicon carbide

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Proceedings Article | 22 January 2001 Paper

Paper

Characterization of Be-based multilayer masks using x-ray reflectivity and Auger electron spectroscopy

James Wasson, Pawitter Mangat, Jon Slaughter, Scott Hector, Sasa Bajt, Patrick Kearney

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410748

KEYWORDS: Reflectivity, Mirrors, Etching, Beryllium, Extreme ultraviolet, X-rays, Chromium, Molybdenum, Optical lithography, Spectroscopy

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Proceedings Article | 21 July 2000 Paper

Paper

High-precision reflectometry of multilayer coatings for extreme ultraviolet lithography

Marco Wedowski, James Underwood, Eric Gullikson, Sasa Bajt, James Folta, Patrick Kearney, Claude Montcalm, Eberhard Spiller

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390107

KEYWORDS: Multilayers, Reflectivity, Optical coatings, Reflectometry, Mirrors, Extreme ultraviolet lithography, Calibration, Sensors, Projection systems, Extreme ultraviolet

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Proceedings Article | 21 July 2000 Paper

Paper

EUV mask fabrication using Be-based multilayer mirrors

Pawitter Mangat, James Wasson, Scott Hector, Gregory Cardinale, Sasa Bajt

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390123

KEYWORDS: Photomasks, Reflectivity, Multilayers, Extreme ultraviolet, Extreme ultraviolet lithography, Beryllium, Mirrors, Lithography, Optical lithography, Mask making

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Proceedings Article | 23 November 1999 Paper

Paper

Lifetime studies of Mo/Si and Mo/Be multilayer coatings for extreme ultraviolet lithography

Marco Wedowski, Sasa Bajt, James Folta, Eric Gullikson, Ulf Kleineberg, Leonard Klebanoff, Michael Malinowski, W. Miles Clift

Proceedings Volume 3767, (1999) https://doi.org/10.1117/12.371120

KEYWORDS: Multilayers, Extreme ultraviolet lithography, Reflectivity, Extreme ultraviolet, Optical coatings, Carbon, Ozone, Mirrors, Contamination, Optical components

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Proceedings Article | 23 November 1999 Paper

Paper

Experimental investigation of beryllium-based multilayer coatings for extreme ultraviolet lithography

Sasa Bajt, Ricke Behymer, Paul Mirkarimi, Claude Montcalm, Mark Wall, Marco Wedowski, James Folta

Proceedings Volume 3767, (1999) https://doi.org/10.1117/12.371125

KEYWORDS: Multilayers, Reflectivity, Beryllium, Extreme ultraviolet lithography, Mirrors, Molybdenum, Extreme ultraviolet, Transmission electron microscopy, Crystals, Interfaces

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Proceedings Article | 23 November 1999 Paper

Paper

Optical constants of beryllium from photoabsorption measurements for x-ray optics applications

Regina Soufli, Sasa Bajt, Eric Gullikson

Proceedings Volume 3767, (1999) https://doi.org/10.1117/12.371124

KEYWORDS: Beryllium, Absorption, Reflectivity, Extreme ultraviolet, Scattering, Silicon, X-ray optics, X-rays, Oxides, Multilayers

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Proceedings Article | 25 June 1999 Paper

Paper

Advances in multilayer reflective coatings for extreme ultraviolet lithography

James Folta, Sasa Bajt, Troy Barbee, R. Fred Grabner, Paul Mirkarimi, Tai Nguyen, Mark Schmidt, Eberhard Spiller, Christopher Walton, Marco Wedowski, Claude Montcalm

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351156

KEYWORDS: Multilayers, Reflectivity, Extreme ultraviolet lithography, Optical coatings, Extreme ultraviolet, Mirrors, EUV optics, Lithography, Projection systems, Silicon

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Proceedings Article | 5 June 1998 Paper

Paper

Multilayer reflective coatings for extreme-ultraviolet lithography

Claude Montcalm, Sasa Bajt, Paul Mirkarimi, Eberhard Spiller, Frank Weber, James Folta

Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309600

KEYWORDS: Multilayers, Reflectivity, Extreme ultraviolet, Mirrors, Extreme ultraviolet lithography, Optical coatings, EUV optics, Silicon, Interfaces, Molybdenum

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Showing 5 of 37 publications

Proceedings Volume Editor (8)

SPIE Conference Volume | 8 July 2023

Optics Damage and Materials Processing by EUV/X-ray Radiation (XDam8)

SPIE Conference Volume | 12 May 2021

EUV and X-ray Optics, Sources, and Instrumentation

SPIE Conference Volume | 9 July 2019

Optics Damage and Materials Processing by EUV/X-ray Radiation VII

SPIE Conference Volume | 10 July 2017

Damage to VUV, EUV, and X-ray Optics VI

SPIE Conference Volume | 1 June 2015

Damage to VUV, EUV, and X-ray Optics V

Showing 5 of 8 publications

Conference Committee Involvement (14)

SPIE Optics + Optoelectronics

7 April 2025 | Prague, Czech Republic

Optics Damage and Materials Processing by EUV/X-ray Radiation (XDam9)

7 April 2025 | Prague, Czech Republic

Optics Damage and Materials Processing by EUV/X-ray Radiation (XDam8)

24 April 2023 | Prague, Czech Republic

SPIE Optics + Optoelectronics

24 April 2023 | Prague, Czech Republic

SPIE Optics + Optoelectronics

19 April 2021 | Online Only, Czech Republic

Showing 5 of 14 Conference Committees

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