Dr. Saul Lee Profile

Dr. Saul Lee

at Canon Nanotechnologies Inc

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 26 March 2013 Paper

Defect reduction for semiconductor memory applications using jet and flash imprint lithography

Zhengmao Ye, Kang Luo, J. W. Irving, Xiaoming Lu, Wei Zhang, Brian Fletcher, Weijun Liu, Matt Shafran, Saul Lee, Whitney Longsine, Van Truskett, Frank Xu, Dwayne LaBrake, Douglas Resnick, S. Sreenivasan

Proceedings Volume 8680, 86800C (2013) https://doi.org/10.1117/12.2013694

KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Particles, Neodymium, Semiconductors, Printing, Inspection, Ultraviolet radiation, Photoresist processing

Read Abstract +

Proceedings Article | 1 April 2009 Paper

Fundamental study of optical threshold layer approach towards double exposure lithography

Xinyu Gu, Adam Berro, Younjin Cho, Kane Jen, Saul Lee, Tomoki Ngai, Toshiyuki Ogata, William Durand, Arunkumar Sundaresan, Jeffrey Lancaster, Steffen Jockusch, Paul Zimmerman, Nicholas Turro, C. Willson

Proceedings Volume 7273, 72731C (2009) https://doi.org/10.1117/12.814298

KEYWORDS: Polymers, Lithography, Crystals, Diffusion, Temperature metrology, Extreme ultraviolet lithography, Sensors, Polymer thin films, Optical lithography, Photomasks

Read Abstract +

SPIE Journal Paper | 1 March 2009

Pattern recognition of shape-encoded hydrogel biosensor arrays

Jason Meiring, Saul Lee, Elizabeth Costner, Matthew Schmid, Timothy Michaelson, C. Grant Willson, Scott Grayson

OE, Vol. 48, Issue 03, 037201, (March 2009) https://doi.org/10.1117/12.10.1117/1.3099722

KEYWORDS: Sensors, Pattern recognition, Optical pattern recognition, Biosensors, Detection and tracking algorithms, Optical engineering, Optical alignment, Target recognition, Luminescence, Optical lithography

Read Abstract +

SPIE Journal Paper | 1 January 2009

Materials modeling and development for use in double-exposure lithography applications

Saul Lee, Kane Jen, C. Grant Willson, Jeffrey Byers, Paul Zimmerman, Nicholas Turro

JM3, Vol. 8, Issue 01, 011011, (January 2009) https://doi.org/10.1117/12.10.1117/1.3095589

KEYWORDS: Lithography, Picture Archiving and Communication System, Photomasks, Nonlinear response, Computer simulations, Imaging systems, Photons, Electroluminescence, Photoresist developing, Absorbance

Read Abstract +

Proceedings Article | 1 April 2008 Paper

An analysis of double exposure lithography options

Saul Lee, Jeffrey Byers, Kane Jen, Paul Zimmerman, Bryan Rice, Nicholas Turro, C. Grant Willson

Proceedings Volume 6924, 69242A (2008) https://doi.org/10.1117/12.773030

KEYWORDS: Lithography, Photomasks, Electroluminescence, Optical lithography, Nonlinear response, Semiconducting wafers, Double patterning technology, Imaging systems, Resolution enhancement technologies, Computer simulations

Read Abstract +

Proceedings Article | 26 March 2008 Paper

Non-chemically amplified resists for 193 nm lithography

Isao Nishimura, William Heath, Kazuya Matsumoto, Wei-Lun Jen, Saul Lee, Colin Neikirk, Tsutomu Shimokawa, Koji Ito, Koichi Fujiwara, C. Grant Willson

Proceedings Volume 6923, 69231C (2008) https://doi.org/10.1117/12.772646

KEYWORDS: Polymers, Diffusion, Line width roughness, Lithography, Optical lithography, Ultraviolet radiation, Semiconducting wafers, Chemically amplified resists, Polymer thin films, Polymethylmethacrylate

Read Abstract +

Showing 5 of 6 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years