Mr. Seokkyun Kim Profile

Seokkyun Kim

at Hynix Semiconductor Inc

SPIE Involvement:

Author

Publications (17)

Proceedings Article | 2 April 2014 Paper

Investigation on reticle heating effect induced overlay error

Mijung Lim, Geunhak Kim, SeoMin Kim, Byounghoon Lee, Seokkyun Kim, Chang-moon Lim, Myoungsoo Kim, Sungki Park

Proceedings Volume 9050, 905014 (2014) https://doi.org/10.1117/12.2048281

KEYWORDS: Reticles, Semiconducting wafers, Transmittance, Overlay metrology, Photomasks, Optical parametric oscillators, Scanners, Semiconductors, HVAC controls, Distortion

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Proceedings Article | 23 March 2012 Paper

Study on CD variation in the vicinity of the exposure field edge in EUV lithography

Chang-Moon Lim, Seokkyun Kim, Jun-Taek Park, Yoonsuk Hyun, Jong-Su Lee, Sunyoung Koo, Myoungsoo Kim, Hyosang Kang

Proceedings Volume 8322, 83221O (2012) https://doi.org/10.1117/12.916108

KEYWORDS: Critical dimension metrology, Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Optical proximity correction, Scanners, Deep ultraviolet, EUV optics, Semiconductors, Reticles

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Proceedings Article | 8 April 2011 Paper

Comparison between ADT and PPT for 2X DRAM patterning

Sunyoung Koo, Jun-Taek Park, Yoonsuk Hyun, Keundo Ban, Seokkyun Kim, Chang-Moon Lim, Donggyu Yim, Sungki Park

Proceedings Volume 7969, 79691N (2011) https://doi.org/10.1117/12.879450

KEYWORDS: Extreme ultraviolet lithography, Nanoimprint lithography, Optical lithography, Extreme ultraviolet, Photomasks, Lithography, Lithographic illumination, Line width roughness, High volume manufacturing, Scanners

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Proceedings Article | 6 April 2011 Paper

Feasibility of EUVL thin absorber mask for sub-32nm half pitch patterning

Yoonsuk Hyun, Juntaek Park, Sunyoung Koo, Yongdae Kim, Seokkyun Kim, Changmoon Lim, Donggyu Yim, Sungki Park

Proceedings Volume 7969, 79690Y (2011) https://doi.org/10.1117/12.879371

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Reticles, Reflectivity, Extreme ultraviolet, Semiconducting wafers, Nanoimprint lithography, Printing, Optical lithography, Scanning electron microscopy

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Proceedings Article | 20 March 2010 Paper

Feasibility of EUVL thin absorber mask for minimization of mask shadowing effect

Yoonsuk Hyun, Juntaek Park, Sunyoung Koo, Yongdae Kim, Keundo Ban, Seokkyun Kim, Changmoon Lim, Donggyu Yim, Hyeongsoo Kim, Sungki Park

Proceedings Volume 7636, 763614 (2010) https://doi.org/10.1117/12.846506

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Reticles, Nanoimprint lithography, Critical dimension metrology, Extreme ultraviolet, Printing, Reflectivity, Silicon, Ruthenium

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Proceedings Article | 18 March 2009 Paper

EUV-patterning characterization using a 3D mask simulation and field EUV scanner

Jun-Taek Park, Yoon-Suk Hyun, Chang-Moon Lim, Tae-Seung Eom, Sunyoung Koo, Sarohan Park, Suk-Kyun Kim, Keun-Do Ban, Hyun-Jo Yang, Chang-Il Oh, Byung-Ho Nam, Chang-Reol Kim, HyeongSoo Kim, Seung-Chan Moon, Sungki Park

Proceedings Volume 7271, 72711G (2009) https://doi.org/10.1117/12.814407

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Scanners, Critical dimension metrology, Extreme ultraviolet, Silicon, Optical lithography, Deep ultraviolet, Semiconducting wafers, Laser scanners

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Proceedings Article | 21 March 2006 Paper

Implementation of contact hole patterning performance with KrF resist flow process for 60nm node DRAM application

Hyoung-ryeun Kim, Yeong-Bae Ahn, JongKuk Kim, SeokKyun Kim, DongHeok Park, Young-Sik Kim

Proceedings Volume 6154, 615441 (2006) https://doi.org/10.1117/12.659398

KEYWORDS: Optical lithography, Photoresist processing, Photoresist materials, Semiconducting wafers, Lithography, Etching, Cadmium sulfide, Oxides, Lithographic illumination, Scanning electron microscopy

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Proceedings Article | 12 May 2005 Paper

Implementation of KrF 0.29 k1 lithography

Hyeong Soo Kim, Seok Kyun Kim, Young Sik Kim, Sang Man Bae, Dong Heok Park, Young Deuk Kim, Yoon Suk Hyun, Hyoung Reun Kim, Keun Kyu Kong, Min Seok Son, Yong Soon Jung, Bong Ho Choi

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.598610

KEYWORDS: Lithography, Photomasks, Optical lithography, Quartz, Optical proximity correction, Device simulation, Lithographic illumination, Manufacturing, Scanners, Photography

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Proceedings Article | 26 June 2003 Paper

Sub-100-nm DRAM cell patterning results and relation with lens aberration at 248-nm lithography era

Tae-Jun You, Hyeong-Soo Kim, Jin-Soo Kim, Seok-Kyun Kim, Young-Deuk Kim, Hyeong Sun Youn, Keun-Kyu Kong

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485331

KEYWORDS: Lithography, Reticles, Optical lithography, Lithographic illumination, Monochromatic aberrations, Semiconducting wafers, Resolution enhancement technologies, Chemical mechanical planarization, Photoresist processing, Image processing

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Proceedings Article | 26 June 2003 Paper

Printing 95-nm DRAM full chip patterns in KrF lithography

Seok-Kyun Kim, Jin-Soo Kim, Tae-Jun Yoo, Keun-Kyu Kong, Hyoung-Soon Yun, Young-Deuk Kim, Hyoung-Ryeun Kim, Young-Sik Kim, Hyeong-Soo Kim

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485435

KEYWORDS: Lithography, Lithographic illumination, Photomasks, Photoresist processing, Printing, Etching, Semiconducting wafers, Critical dimension metrology, Forward error correction, Optical proximity correction

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Proceedings Article | 2 June 2003 Paper

Analysis of total CD uniformity at sub-100-nm DRAM patterning by using KrF lithography

Young-Sik Kim, Tae Jun You, Jin-Soo Kim, Seok-Kyun Kim, Keun-Kyu Kong, Young-Deuk Kim, HyeongSoo Kim

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.485009

KEYWORDS: Photomasks, Lithography, Semiconducting wafers, Optical lithography, Forward error correction, Chemical mechanical planarization, Lithographic illumination, Photoresist processing, Monochromatic aberrations, Critical dimension metrology

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Proceedings Article | 30 July 2002 Paper

0.33-k1 ArF lithography for 100-nm DRAM

Cheol-Kyu Bok, Seok-Kyun Kim, Hee-Bom Kim, Jin-Sung Oh, Chang-Nam Ahn, Ki-Soo Shin

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474631

KEYWORDS: Lithography, Photomasks, Photoresist processing, Lithographic illumination, Optical proximity correction, Etching, Scanners, Scanning electron microscopy, Resistance, Optical lithography

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Proceedings Article | 30 July 2002 Paper

Printing 100-nm and sub-100-nm DRAM full-chip patterns with crosspole illumination in 0.63-NA ArF lithography

Seok-Kyun Kim, Cheol-Kyu Bok, Ki-Soo Shin

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474536

KEYWORDS: Lithography, Lithographic illumination, Printing, Photoresist processing, Contamination, Reticles, Electron beams, Double patterning technology, Stray light, Semiconducting wafers

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Proceedings Article | 14 September 2001 Paper

Feasibility study of printing sub-100-nm with ArF lithography

Seok-Kyun Kim, Jong-Gyun Hong, Joo-On Park, Tea-Jun Yoo, Yoon-Suk Hyun, Cheol-Kyu Bok, Ki-Soo Shin

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435721

KEYWORDS: Lithography, Resolution enhancement technologies, Photomasks, Printing, Optical lithography, Photoresist processing, Lithographic illumination, Etching, Data modeling, Transistors

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Proceedings Article | 5 July 2000 Paper

Comparison study for sub-0.13-um lithography between ArF and KrF lithography

Seok-Kyun Kim, YoungSik Kim, Jin-Soo Kim, Cheol-Kyu Bok, Young-Mog Ham, Ki-Ho Baik

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389031

KEYWORDS: Lithography, Photoresist processing, Electroluminescence, Printing, Photomasks, Critical dimension metrology, Etching, Data modeling, Lithographic illumination, Resistance

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Proceedings Article | 5 July 2000 Paper

Optimization for full-chip process of 130-nm technology with 248-nm DUV lithography

Young-Mog Ham, Seok-Kyun Kim, Sang-Jin Kim, Cheol Hur, YoungSik Kim, Ki-Ho Baik, Bong-Ho Kim, Dong-Jun Ahn

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388941

KEYWORDS: Photomasks, Optical proximity correction, Lithography, Critical dimension metrology, Semiconducting wafers, Optical lithography, Electroluminescence, Deep ultraviolet, Structural design, Scanners

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Proceedings Article | 26 July 1999 Paper

Reduction of isolated-dense bias by optimization off-axis illumination for 150-nm lithography using KrF

Seok-Kyun Kim, Chang-Nam Ahn, Seo-Min Kim, Young-Mog Ham, Ki-Ho Baik

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354384

KEYWORDS: Lithography, Lithographic illumination, Optical proximity correction, Diffraction, Photomasks, Optical lithography, Semiconductors, Phase shifts, Electronics, Phase shifting

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Showing 5 of 17 publications

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