Mr. Seong-Yong Moon Profile

Seong-Yong Moon

SVP at FST-Fine Semitech Co Ltd

SPIE Involvement:

Author

Publications (31)

Proceedings Article | 22 February 2021 Poster + Presentation

Introduction of fully automated EUV pellicle mounter and demounter (EPMD)

Dongyoung Shin, Seongyong Moon, Sungchul Jeon, Sunwoo Lee

Proceedings Volume 11609, 116091H (2021) https://doi.org/10.1117/12.2583476

Read Abstract +

Proceedings Article | 14 October 2020 Poster + Presentation + Paper

Study on the multi layers for EUV pellicle

Sang Jin Cho, Kyoungwon Seo, Kyoungsoo Kim, Lan Yu, Seong-yong Moon

Proceedings Volume 11517, 115171E (2020) https://doi.org/10.1117/12.2574586

KEYWORDS: Extreme ultraviolet, Pellicles, Atomic layer deposition, Transmittance, Semiconductors

Read Abstract +

Proceedings Article | 9 September 2013 Paper

Mask automation: need a revolution in mask makers and equipment industry

Seong-yong Moon, Sang-yong Yu, Young-hwa Noh, Ki-jung Son, Hyun-Joo Lee, Han-Ku Cho

Proceedings Volume 8880, 888016 (2013) https://doi.org/10.1117/12.2025569

KEYWORDS: Photomasks, Manufacturing, Control systems, Process control, Semiconductors, Semiconducting wafers, Telecommunications, Wafer manufacturing, Mask making, Extreme ultraviolet

Read Abstract +

Proceedings Article | 8 November 2012 Paper

Study for compensation of unexpected image placement error caused by VSB mask writer deflector

Hyun-joo Lee, Min-kyu Choi, Seong-yong Moon, Han-Ku Cho, Jonggul Doh, Jinho Ahn

Proceedings Volume 8522, 852228 (2012) https://doi.org/10.1117/12.964098

KEYWORDS: Vestigial sideband modulation, Photomasks, Associative arrays, Contamination, Electron beams, Beam shaping, Reliability, Calibration, Data modeling, Semiconductors

Read Abstract +

Proceedings Article | 11 May 2009 Paper

The novel plasma etching process for defect reduction in photomask fabrication

Ji-Hyun Lee, Il-Yong Jang, Yu Suk Jeong, Byounghoon Seung, Seong-Yong Moon, Sang-Gyun Woo, Han Ku Cho

Proceedings Volume 7379, 737906 (2009) https://doi.org/10.1117/12.824247

KEYWORDS: Etching, Chromium, Plasma, Fluorine, Particles, Chlorine, Dielectrics, Plasma etching, Photomasks, Aluminum

Read Abstract +

Proceedings Article | 17 October 2008 Paper

Control of the sidewall angle of an absorber stack using the Faraday cage system for the change of pattern printability in EUVL

Il-Yong Jang, Sung-Min Huh, Seong-Yong Moon, Sang-Gyun Woo, Jin-Kwan Lee, Sang Heup Moon, HanKu Cho

Proceedings Volume 7122, 712228 (2008) https://doi.org/10.1117/12.801413

KEYWORDS: Etching, Critical dimension metrology, Photomasks, Oxides, Tantalum, Extreme ultraviolet lithography, Optical properties, Plasma, Semiconducting wafers, Extreme ultraviolet

Read Abstract +

Proceedings Article | 17 October 2008 Paper

Analysis of process margin in EUV mask repair with nano-machining

Su-Young Lee, Geun-Bae Kim, Hong-Seok Sim, Sang-Hyeon Lee, Hwa-Sung Kim, Jung-Hwan Lee, Hwan-Seok Seo, Hak-Seung Han, Seong-Sue Kim, Seong-Yong Moon, Sang-Gyun Woo, Ron Bozak, Andrew Dinsdale, Tod Robinson, David Lee, HanKu Cho

Proceedings Volume 7122, 71222I (2008) https://doi.org/10.1117/12.801415

KEYWORDS: Photomasks, Extreme ultraviolet, Error analysis, Extreme ultraviolet lithography, Scanning electron microscopy, Semiconducting wafers, Diffractive optical elements, Image processing, Critical dimension metrology, Factor analysis

Read Abstract +

Proceedings Article | 9 November 2005 Paper

Analysis of various blur effects on mask CD distortion

Hak-Seung Han, Sang-Hee Lee, Byung-Gook Kim, Seong-Yong Moon, Sung Woon Choi, Woo-Sung Han

Proceedings Volume 5992, 59924V (2005) https://doi.org/10.1117/12.632268

KEYWORDS: Backscatter, Scattering, Electron beam lithography, Photomasks, Critical dimension metrology, Electrons, Distortion, Photoresist processing, Laser scattering, Lithography

Read Abstract +

Proceedings Article | 9 November 2005 Paper

Improved modeling of fogging and loading effect correction

Sanghee Lee, Byunggook Kim, Hakseung Han, Dongseok Nam, Seongyong Moon, Seongwoon Choi, Woosung Han

Proceedings Volume 5992, 59924U (2005) https://doi.org/10.1117/12.632078

KEYWORDS: Etching, Critical dimension metrology, Modulation, Dry etching, Photomasks, System on a chip, Backscatter, Data modeling, Electron beams, Electron beam lithography

Read Abstract +

Proceedings Article | 8 November 2005 Paper

How large MEEF is acceptable for the low-k₁ lithography?

Dongseok Nam, Dong-Gun Lee, Byunggook Kim, Seong-Yong Moon, Seong-Woon Choi, Woo-Sung Han

Proceedings Volume 5992, 59922W (2005) https://doi.org/10.1117/12.632066

KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Tolerancing, Optical testing, Mask making, Scanning electron microscopy, Lithography, Semiconductors, Data processing

Read Abstract +

Proceedings Article | 5 November 2005 Paper

A study of Cr to Mosi in situ dry etching process to reduce plasma induced defect

Il-Yong Jang, Young-Ju Park, Hyuk-Joo Kwon, Seong-Yong Moon, Seong-Woon Choi, Woo-Sung Han

Proceedings Volume 5992, 59920O (2005) https://doi.org/10.1117/12.631951

KEYWORDS: Etching, Chromium, Particles, Plasma, Chlorine, Reactive ion etching, Dry etching, Photomasks, Chemistry, Manufacturing

Read Abstract +

Proceedings Article | 28 June 2005 Paper

Implementing chemically amplified resist to 10kV raster e-beam process in photomask manufacturing

Sook-Kyeong Kim, Byung-Gook Kim, Seong-Yong Moon, Sung-Woon Choi, Woo-Sung Han

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617092

KEYWORDS: Raster graphics, Control systems, Etching, Photomasks, Photoresist processing, Manufacturing, Chemically amplified resists, Vestigial sideband modulation, Modulation, Beam shaping

Read Abstract +

Proceedings Article | 28 June 2005 Paper

Evaluations of optical performance for micro-trench on quartz etch in ArF lithography

Won-Suk Ahn, Hyuk-Joo Kwon, Seong-Yong Moon, Seong-Woon Choi, Woo-Sung Han

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617227

KEYWORDS: Photomasks, Quartz, Etching, Semiconducting wafers, Fluorine, Dry etching, Chemistry, Wafer-level optics, Lithography, Nanoimprint lithography

Read Abstract +

Proceedings Article | 10 May 2005 Paper

Repair simulation with image processing and artificial intelligence

Yo-Han Choi, Moon-Kyu Sung, Sang-Hyun Lee, Ji-Hyung Lee, Jin-Hong Park, Ji-Hyun Choi, Seong-Yong Moon, Sung-Woon Choi, Woo-Sung Han

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.599369

KEYWORDS: Neural networks, Neurons, Optical simulations, Image segmentation, Quartz, Edge detection, Artificial intelligence, Photomasks, Inspection, Image processing

Read Abstract +

Proceedings Article | 6 December 2004 Paper

Quantitative analysis of develop loading effect and its application

Hak-Seung Han, Se-Gun Moon, Je-Bum Yoon, Byung-Gook Kim, Seong-Yong Moon, Seong-Woon Choi, Woo-Sung Han

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569199

KEYWORDS: Fluctuations and noise, Critical dimension metrology, Photomasks, Photoresist processing, Quantitative analysis, Chemical analysis, Tolerancing, Electron beam lithography, Data conversion, Semiconductors

Read Abstract +

Proceedings Article | 20 August 2004 Paper

Analysis of mask CD error by dose modulation for fogging effect

Hojune Lee, Seung-Hune Yang, Byung-Gook Kim, Sung-Yong Moon, Sung-Woon Choi, Hee-Sun Yoon, Woo-Sung Han

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557713

KEYWORDS: Photomasks, Error analysis, Critical dimension metrology, Electron beams, Modulation, Monte Carlo methods, Optical testing, Optical simulations, Systems modeling, Laser scattering

Read Abstract +

Proceedings Article | 17 December 2003 Paper

Dose-modulation-induced mask CD error on simultaneous correction of fogging and loading effect

Hojune Lee, Seung-Hune Yang, Jin-Hong Park, Seong-Yong Moon, Seong-Woon Choi, Jung-Min Sohn

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518283

KEYWORDS: Monte Carlo methods, Modulation, Etching, Critical dimension metrology, Photomasks, Scattering, Dry etching, Lithography, Cadmium, Error analysis

Read Abstract +

Proceedings Article | 17 December 2003 Paper

New method for approaching the loading-free process for photomask Cr etching

Il-Yong Jang, Jeong-Yun Lee, Sung-Yong Moon, Seong-Woon Choi, Jung-Min Sohn

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.517842

KEYWORDS: Etching, Chromium, Photomasks, Oxygen, Dry etching, Chlorine, Critical dimension metrology, Manufacturing, Mask making, Scanning electron microscopy

Read Abstract +

Proceedings Article | 27 December 2002 Paper

PSM defect printability of extremely low-k1 sub-130-nm KrF lithography

Won-Il Cho, Gisung Yeo, Seong-Yong Moon, Hee-Sun Yoon, Jung-Min Sohn

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468095

KEYWORDS: Inspection, Semiconducting wafers, Lithography, Reticles, Photomasks, Defect detection, Critical dimension metrology, Scanning electron microscopy, Lithographic illumination, Chromium

Read Abstract +

Proceedings Article | 27 December 2002 Paper

Identification of defect source to control reticle defect density for CAR and dry etching in the photomask process

Sung-Yong Cho, Won-Suk Ahn, Won-Il Cho, Moon-Gyu Sung, Seong-Yong Moon, Seong-Woon Choi, Hee-Sun Yoon, Jung-Min Sohn

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468096

KEYWORDS: Particles, Inspection, Photomasks, Reticles, Dry etching, Manufacturing, Defect inspection, Scanning electron microscopy, Atomic force microscopy, Quartz

Read Abstract +

Proceedings Article | 14 September 2001 Paper

Mask considerations for manufacturing assist features

Ji-Hyeon Choi, Won-Il Cho, Byeongsoo Kim, Seung-Hune Yang, Seong-Yong Moon, Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435681

KEYWORDS: Photomasks, Inspection, Optical proximity correction, Manufacturing, Critical dimension metrology, Semiconducting wafers, Transmittance, Defect detection, Phase shifts, Mask making

Read Abstract +

Proceedings Article | 5 September 2001 Paper

Application of chemically amplified resist to 10-keV e-beam system

Sung-Hee Ahn, Chang-Hwan Kim, Seung-Hune Yang, Seong-Yong Moon, Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438348

KEYWORDS: Chromium, Chemically amplified resists, Scattering, Fluctuations and noise, Photomasks, Mask making, Etching, Electron beam lithography, Lithography, Scanning electron microscopy

Read Abstract +

Proceedings Article | 5 September 2001 Paper

Resolution improvement of chemical-amplification resist using process-induced effect correction

Ji-Hyeon Choi, Chang-Hwan Kim, Jeong-Yun Lee, Seong-Yong Moon, Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438359

KEYWORDS: Etching, Dry etching, Critical dimension metrology, Photoresist processing, Chromium, Data modeling, Photomasks, Instrument modeling, Scattering, Diffusion

Read Abstract +

Proceedings Article | 22 January 2001 Paper

Analysis of photomask distortion caused by blank materials and open ratios

Seong-Yong Moon, Won-Tai Ki, Seung-Hune Yang, Tae Moon Jeong, Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410697

KEYWORDS: Photomasks, Chromium, Distortion, Semiconducting wafers, Error analysis, Lithography, Scanners, Printing, Overlay metrology, Dry etching

Read Abstract +

Proceedings Article | 22 January 2001 Paper

Effect of beam blur in mask fabrication

Seung-Hune Yang, Won-Tai Ki, Seong-Yong Moon, Tae Moon Jeong, Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410725

KEYWORDS: Beam shaping, Critical dimension metrology, Electron beams, Photoresist processing, Scanning electron microscopy, Optical simulations, Beam analyzers, Mask making, Convolution, Monte Carlo methods

Read Abstract +

SPIE Journal Paper | 1 November 2000

Chromium aluminum oxide films for ArF line high transmittance attenuated phase shifting mask application

Eunah Kim, Seong-Yong Moon, Yong-Hoon Kim, Hee-Sun Yoon, Kwangsoo No

OE, Vol. 39, Issue 11, (November 2000) https://doi.org/10.1117/12.10.1117/1.1312648

KEYWORDS: Transmittance, Chromium, Phase shifts, Refractive index, Inspection, Photomasks, Etching, Phase shifting, Aluminum, Optical testing

Proceedings Article | 19 July 2000 Paper

Dose latitude dependency on resist contrast in e-beam mask lithography

Byung-Cheol Cha, Seong-Yong Moon, Won-Tai Ki, Seung-Hune Yang, Seong-Woon Choi, Woo-Sung Han, Hee-Sun Yoon, Jung-Min Sohn

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392058

KEYWORDS: Photoresist processing, Photomasks, Etching, Electron beam lithography, Beam shaping, Critical dimension metrology, Lithography, Dry etching, Gaussian beams, Scattering

Read Abstract +

Proceedings Article | 30 December 1999 Paper

Simulation study and fabrication of high-transmittance attenuated phase-shifting mask

Eunah Kim, Seungbum Hong, Seong-Yong Moon, Yong-Hoon Kim, Hee-Sun Yoon, Kwangsoo No

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373384

KEYWORDS: Transmittance, Phase shifts, Inspection, Refractive index, Photomasks, Optical testing, Chromium, Device simulation, Phase shifting, Photoresist developing

Read Abstract +

Proceedings Article | 30 December 1999 Paper

Analysis of photomask CD errors depending on development methods

Seong-Yong Moon, Won-Tai Ki, Byung-Cheol Cha, Seong-Woon Choi, Hee-Sun Yoon, Jung-Min Sohn

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373352

KEYWORDS: Critical dimension metrology, Photomasks, Error analysis, Liquids, Optical lithography, Coating, Semiconductors, Electronics, Lithography, Scattering

Read Abstract +

Proceedings Article | 8 December 1995 Paper

Shifter slope variation effect of embedded half-tone phase-shift masks

Jongwook Kye, Seong-Yong Moon, Sang-Gyun Woo, Woo-Sung Han, Young-Bum Koh

Proceedings Volume 2621, (1995) https://doi.org/10.1117/12.228187

KEYWORDS: Photomasks, Phase shifts, Transmittance, Lithography, 3D image processing, Image processing, Phase shifting, Binary data, Scanning electron microscopy, Mask making

Read Abstract +

Proceedings Article | 26 May 1995 Paper

Fidelity comparison of island patterns with different types of illuminations and phase shift masks

Seong-Yong Moon, Woo-Sung Han, Sang-Gyun Woo, Chang-Jin Sohn, Chul Hong Kim, Young-Bum Koh, Moon-Yong Lee

Proceedings Volume 2440, (1995) https://doi.org/10.1117/12.209303

KEYWORDS: Photomasks, Tolerancing, Semiconducting wafers, Etching, Quartz, Scanning electron microscopy, Phase shifts, Lithographic illumination, Lithography, Transmittance

Read Abstract +

Showing 5 of 31 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years