Dr. Chin-Wei Shen
Section Manager at Taiwan Semiconductor Manufacturing Co Ltd
SPIE Involvement:
Author
Area of Expertise:
EUV mask process , Photomask inspection , Photomask cleaning , Photomask repair , Pellicle handling , Equipment developement
Publications (2)

Proceedings Article | 28 June 2013 Paper
C. W. Shen, K. W. Lin, C. L. Lu, Luke Hsu, Angus Chin, Anthony Yen
Proceedings Volume 8701, 870106 (2013) https://doi.org/10.1117/12.2028484
KEYWORDS: Particles, SRAF, Mask cleaning, Photomasks, Inspection, Binary data, Acoustics, Opacity, Cavitation, Diffractive optical elements

Proceedings Article | 8 November 2012 Paper
Kuan-Wen Lin, Chi-Lun Lu, Chin-Wei Shen, Luke Hsu, Angus Chin, Anthony Yen
Proceedings Volume 8522, 852213 (2012) https://doi.org/10.1117/12.975822
KEYWORDS: Particles, Mask cleaning, Photomasks, Quartz, Chemical analysis, Critical dimension metrology, Semiconductor manufacturing, Silicon, Inspection, Manufacturing

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