Fast neutrons, which are neutrons with energies greater than 1 MeV, are expected to be a source of nondestructive inspection for a large-size infrastructure such as a bridge girder because of their mean free path exceeding the meter. A neutron-imaging device with 10-ns time resolution can discriminate pulsed neutrons from X-rays via time of flight. For this purpose, we require a fast-response neutron imager with large aperture and high image resolution. A neutron-imaging device with time resolution of 10 ns and aperture size of 40 cm × 60 cm was developed. It was filled with fast response liquid scintillator [1] in an aluminum honeycomb plate, which converts neutrons to optical light images. The scintillation light images were relayed using an optical lens and detected using a fast response image intensified CCD. The detector was tested at an electron linear accelerator (LINAC) facility in Osaka University. A short X-ray pulse (30 ps pulse duration) was generated using LINAC, and X-ray radiograph images were obtained with a 10- ns exposure time duration. The radiograph images were well attenuated within 10-ns from the X-ray injection. A high energy X-ray image and a neutron radiograph image of a 30-cm thick concrete block with iron blocks located behind it were successfully observed. This promising technique could facilitate nondestructive inspection of large concrete constructions.
LFEX is the world’s largest high-energy petawatt laser. So far it delivers 3 kJ/1 ps and is planed to finally deliver 10 kJ/10-20 ps. It has been constructed and became partially operational since 2008, and with full beams since 2014. LFEX is synchronized to nsec Gekko-XII laser for variety of experiments with nsec and psec simultaneous laser beams irradiating the targets for fast ignition and other high-energy density physics.
EUV emission from spherical and planer targets were precisely characterized as an experimental database for use in
EUV source generation at high repetition rates. In the single-shot base experiments, conversion efficiency as high as
those for the plasma geometry has been demonstrated. The integrated experiment was made with 10 Hz plasma
generation.
We propose a new scheme for high conversion efficiency from laser energy to 13.5 nm extreme ultra violet emission
within 2 % band width, a double pulse laser irradiation scheme with a tin droplet target. We consider two-color lasers, a
Nd:YAG laser with 1.06 µm in wavelength as a prepulse and a carbon dioxide laser with 10.6 µm in wavelength for a
main pulse. We show the possibility of obtaining a CE of 5 - 7 % using a benchmarked radiation hydro code. We have
experimentally tested the new scheme and observed increase of CE greater than 4 %. We show many additional
advantages of the new scheme, such as reduction of neutral debris, energy reduction of debris ions, and decrease of out
of band emission. We also discuss debris problems, such as ion sputtering using newly developed MD simulations, ion
mitigation by a newly designed magnetic coil using 3-PIC simulations and tin cleaning experiments.
Laser-produced Sn plasma is an efficient extreme ultraviolet (EUV) light source, however the highest risk in the Sn-based EUV light source is contamination of the first EUV collection mirror caused by debris emitted from the Sn plasma. Minimum mass target is a key term associated with relaxation of the mirror contamination problem. For design of the optimum minimum mass Sn target, opacity effects on the EUV emission from the laser-produced Sn plasma should be considered. Optically thinner plasma produced by shorter laser pulse emits 13.5 nm light more efficiently; 2.0% of conversion efficiency was experimentally attained with drive laser of 2.2 ns in pulse duration, 1.0 × 1011 W/cm2 in intensity, and 1.064 μm in wavelength. Under the optimum laser conditions, the minimum mass required for sufficient EUV emission, which is also affected by the opacity, is equal to the product of the ablation thickness and the required laser spot size. Emission properties of ionized and neutral debris from laser-produced minimum mass Sn plasmas have been measured with particle diagnostics and spectroscopic method. The higher energy ions have higher charge states, and those are emitted from outer region of expanding plasmas. Feasibility of the minimum mass target has been demonstrated to reduce neutral particle generation for the first time. In the proof-of-principle experiments, EUV emission from a punch-out target is found to be comparable to that from a static target, and expansion energy of ion debris was drastically reduced with the use of the punch-out target.
For EUV lithography the generation of clean and efficient light source and the high-power laser technology are key issues. Theoretical understanding with modeling and simulation of laser-produced EUV source based on detailed experimental database gives us the prediction of optimal plasma conditions and their suitable laser conditions for different target materials (tin, xenon and lithium). With keeping etendue limit the optimal plasma size is determined by an appropriate optical depth which can be controlled by the combination of laser wavelength and pulse width. The most promising candidate is tin (Sn) plasma heated by Nd:YAG laser with a pulse width of a few ns. Therefore the generation technology of clean Sn plasma is a current important subject to be resolved for practical use. For this purpose we have examined the feasibility of laser-driven rocket-like injection of extremely mass-limited Sn or SnO2 (punched-out target) with a speed exceeding 100m/s. Such a mass-limited low-density target is most preferable for substantial reduction of ion energy compared with usual bulk target. For high average power EUV generation we are developing a laser system which is CW laser diode pumped Nd:YAG ceramic laser (master oscillator and power amplifier system) operating at 5-10 kHz repetition rate. The design of practical laser for EUV source is being carried out based on the recent performance of >1 kW output power.
We have developed an integrated Laser Ablation Fluid Radiation simulation Code (LAFRAC) to estimate the behaviors of highly energetic ions and neutral particles from LPP EUV light sources, and estimated recombination and charge transfer processes between the particles from laser-produced Xe EUV light sources. We clarify that charge transfer effects greatly affect on the number density of neutral particles, especially high energy (more than roughly 500 eV) neutral particles.
Our institute has been investigating laser-produced tin plasma and EUV emission, and found the highest conversion efficiency of 3% at 13.5 nm in 2% bandwidth. In the present paper, we introduce fabrication methods of density-controlled tin targets to generate relatively monochromatic EUV with keeping similar conversion efficiency.
The first method is the nano-template method, where liquid tin solution was immersed into a polymer film with monodispersed size nanoparticle. The density can be controlled by tin concentration of the solution. The target can be classified into mass-limited target. We have shown a tendency of monochromatic EUV emission around 13.5 nm with decreasing of tin density. The intensity was higher than tin foil with bulk density. The tendency has a merit to mitigate heat effect of the first EUV mirror. The fabrication method has another merit to control not only density but also the poresize of tin oxide to be 100 nm ~ 10 mm. Recent experiments exhibited an EUV character depending on the poresize.
The second is liquid crystalline template method to obtain porous tin oxide. The precursor with tin oxide and cellulose provides mechanically stable and transparent film. The film has wavy sub-microstructure derived from microscopic liquid crystal domain structure. The method is simple and short duration for the hydrolysis reaction to solidify tin compound. This material has a merit of feasibility of fabrication, and was applied for rotation target for 10 Hz and 5 kHz laser repetition.
Properties of laser-produced tin (Sn) plasmas were experimentally investigated for application to the Extreme Ultra-Violet (EUV) lithography. Optical thickness of the Sn plasmas affects strongly to EUV energy, efficiency, and spectrum. Opacity structure of uniform Sn plasma was measured with a temporally resolved EUV spectrograph coupled with EUV backlighting technique. Dependence of the EUV conversion efficiency and spectra on Sn target thickness were studied, and the experimental results indicate that control of optical thickness of the Sn plasma is essential to obtain high EUV conversion efficiency and narrow spectrum. The optical thickness is able to be controlled by changing initial density of targets: EUV emission from low-density targets has narrow spectrum peaked at 13.5 nm. The narrowing is attributed to reduction of satellite emission and opacity broadening in the plasma. Furthermore, ion debris emitted from the Sn plasma were measured using a charge collector and a Thomson parabola ion analyzer. Measured ablation thickness of the Sn target is between 30 and 50 nm for the laser intensity of 1.0 x 1011 W/cm2 (1.064 μm of wavelength and 10 ns of pulse duration), and the required minimum thickness for sufficient EUV emission is found to be about 30 nm under the same condition. Thus almost all debris emitted from the 30 nm-thick mass-limited Sn targets are ions, which can be screened out by an electro-magnetic shield. It is found that not only the EUV generation but also ion debris are affected by the Sn target thickness.
It is very effective for mass-limited tin-foil targets to adapt for the EUV source. Tin-foil targets in account of formation, size, and thickness have been developed for debris mitigation. The amount of ions from targets is 40 % decreased tin-foil targets of 1μm or 5μm thickness than tin-bulk targets. The ion velocity is one order of magnitude less than bulk targets. The EUV emission spectra of tin-foil are more narrowing than bulk targets. The targets supply for high repetition rate of 10 kHz is applied for a novel method. It is called "Punch-out" method. The flight of graphite foil that it is a test targets was succeed to observe by using a gated ICCD camera. The target velocity is achieved to be about 120 m/s. This value can be applied for targets supply with high repetition rate of 10 kHz.
Extreme ultraviolet (EUV) emission from laser produced tin plasma was investigated for 1064, 532 and 266 nm laser wavelengths. The EUV conversion with tin target tends to be high for shorter laser wavelength and is optimized at 4-5x1010 W/cm2 for 1064 and 532 nm. The EUV emission exhibits laser wavelength dependence in terms of angular distribution and structures of emission spectra. It is found that spectra for 532 nm and 266 nm showed spectral dips at around 13.5 nm and these dips are well replicated in computer simulations. Both the angular distribution together with the spectral dips may suggest existence of opaque plasmas surrounding the EUV emission region.
Hydrodynamic instabilities are key issues of the physics of inertial confinement fusion (ICF) targets. Among the instabilities, Rayleigh-Taylor (RT) instability is the most important because it gives the largest growth factor in the ICF targets. Perturbations on the laser irradiated surface grow exponentially, but the growth rate is reduced by ablation flow. The growth rate γ is written as Takabe-Betti formula: γ = [kg/(1+kL)]1/2–βkm/pa, where k is wave number of the perturbation, g is acceleration, L is density scale-length, β is a coefficient, m is mass ablation rate per unit surface, and ρa is density at the ablation front. We experimentally measured all the parameters in the formula for polystyrene (CH) targets. Experiments were done on the HIPER laser facility at Institute of Laser Engineering, Osaka University. We found that the β value in the formula is ~ 1.7, which is in good agreements with the theoretical prediction, whereas the β for certain perturbation wavelengths are larger than the prediction. This disagreement between the experiment and the theory is mainly due to the deformation of the cutoff surface, which is created by non-uniform ablation flow from the ablation surface. We also found that high-Z doped plastic targets have multiablation structure, which can reduce the RT growth rate. When a low-Z target with high-Z dopant is irradiated by laser, radiation due to the high-Z dopant creates secondary ablation front deep inside the target. Since, the secondary ablation front is ablated by x-rays, the mass ablation rate is larger than the laser-irradiated ablation surface, that is, further reduction of the RT growth is expected. We measured the RT growth rate of Br-doped polystyrene targets. The experimental results indicate that of the CHBr targets show significantly small growth rate, which is very good news for the design of the ICF targets.
Extreme Ultra Violet (EUV) light source produced by laser irradiation emits not only the desired EUV light of
13 ~ 14 nm (about 90 eV) but also shorter x-rays. For example, emissions around 4 ~ 8 nm (about 150 ~ 300 eV)
and 1 ~ 2.5 nm (about 0.5 ~ 1.2 keV) are experimentally observed from Sn and/or SnO2 plasmas. These
emissions are correspond to the N-shell and M-shell transitions, respectively. From the view point of energy
balance and efficiency, these transitions should be suppressed. However, they may, to some extent, contribute
to provide the 5p and 4f levels with electrons which eventually emit the EUV light and enhance the intensity.
To know well about radiative properties and kinematic of the whole plasma, atomic population kinetics and
spectral synthesis codes have been developed. These codes can estimate the atomic population with nl-scheme
and spectral shapes of the EUV light. Radiation hydrodynamic simulation have been proceeding in this analysis.
Finally, the laser intensity dependence of the conversion efficiency calculated by these codes agrees with that of
the corresponding experimental results.
Extremely ultraviolet (EUV) light at around 13.5 nm of wavelength is the most probable candidate of the light source for lithography for semiconductors of next generation. We have been studying about the EUV light source from laser-produced plasma. Detailed understanding of the EUV plasma is required for developments of modeling with simulation codes. Several parameters should be experimentally measured to develop the important issues in the simulation codes. We focused on density profile, properties of EUV emission, and opacity of the laser-produced plasmas. We present re-cent experimental results on these basic properties of the laser-produced EUV plasmas.
Extreme ultraviolet (EUV) emission from laser produced plasma attracts much attention as a next generation lithography
source. The characterization of EUV emission has been carried out using GEKKO XII laser system. The twelve beams
irradiated tin or tin-oxide coated spherical targets uniformly and dependence of EUV spectra on laser intensity were
obtained with a transmission grating spectrometer and two grazing incidence spectrometers. The EUV Conversion
Efficiency (CE, the ratio of EUV energy at the wavelength of 13.5 nm with 2 % bandwidth to incident laser energy) was
measured using an absolutely calibrated EUV calorimeter. Optimum laser intensities for the highest conversion were
found to be 0.5- 1x1011 W/cm2 with CE of 3 %. The spectroscopic data indicate that shorter wavelength emission
increases at higher laser intensities due to excessive heating beyond optimum temperatures (20- 40 eV). The CE was
almost independent on the initial coating thickness down to 25 nm.
A new research project on extreme ultraviolet (EUV) source development has just been started at the Institute of Laser Engineering, Osaka University. The main task of this project is to find a scientific basis for generating efficient, high-quality, high power EUV plasma source for semiconductor industry. A set of experimental data is to be provided to develop a detailed atomic model included in computer code through experiments using GEKKO-XII high power laser and smaller but high-repetitive lasers. Optimum conditions for efficient EUV generation will be investigated by changing properties of lasers and targets. As the first step of the experiments, spherical solid tin and tin-oxide targets were illuminated uniformly with twelve beams from the GEKKO XII. It has been confirmed that maximum conversion efficiency into 13.5 nm EUV light is achieved at illumination intensity less than 2 x 1011 W/cm2. No significant difference is found between laser wavelengths of one μm and a half μm. Density structure of the laser-irradiated surface of a planar tin target has beem measured experimentally at 1012 W/cm2 to show formation of double ablation structure with density plateau by thermal radiation transport. An opacity experiment has just been initiated.
Ultra-fast x-ray imaging is of great importance for diagnosing laser-driven inertial confinement fusion (ICF) plasmas. Typical required spatial and temporal resolutions are 10 micrometer and 10 ps, respectively. We have developed variety of one- (1D) and two-dimensional (2D) image sampling technique for ultrafast time-resolved x-ray imaging with x-ray streak cameras. Moire imaging of an x-ray-backlit target has been developed as 1D image sampling of an objective with 1D repetitive structure with a spatial resolution of 5 micrometer for use in experiments on hydrodynamic instabilities in laser- accelerated targets. With 1D sampling of repetitive 2D images, a multi-imaging x-ray streak camera (MIXS) with temporal- and spatial-resolutions of 10 ps and 15 micrometer, respectively, has been developed and successfully utilized for diagnosing uniformity and heating process of the imploded core plasmas. Two types of spectroscopic applications of the MIXS have been developed. One is multi-channel MIXS (McMIXS) which has three MIXS channels with various spectral responses for time- resolved 2D temperature measurement. Another is monochromatic MIXS (M-MIXS) for temperature, density and material mixing measurement, in which monochromatic images with Bragg crystals are coupled to MIXS. Finally, 2D image sampling of a 2D image on an x-ray streak camera (2D-SIXS) was also developed.
IN order to directly observe low-mode implosion nonuniformities, especially of l equals 1, which prevents stable formation of a hot spark in the compressed core plasma at the final stage of the implosion, a series of direct-drive implosion experiments has been performed at the Gekko-XII glass laser facility by using gas-filled plastic- shell targets. Partially coherent light (PCL) was used as a drive laser to suppress middle- to higher-modes of the irradiation nonuniformity down to approximately 1 percent. A clear shift from the center of the chamber and a slight crosswise structure were seen in the time- and space- resolved shape of the shell in the accelerating phase with an x-ray framing camera and absorbed laser intensity were also estimated by using a rocket equation. In order to confirm the property of these results, separate experiments under similar laser conditions were performed by using Au- coated sapphire spheres as surrogate target. The x-ray intensity distribution on the circumference of the target in the XFCs image, which is strongly dependent on the drive nonuniformity in the accelerating shell resulted from the l equals 1 drive nonuniformity. In our experiments, the l equals 1 drive nonuniformity due to some reproducible factors was found to be of the order of approximately 10-20 percent.
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