Mr. Shinya Kikugawa Profile

Shinya Kikugawa

Director at AGC Inc

SPIE Involvement:

Author

Publications (10)

Proceedings Article | 20 October 2006 Paper

Development of EUVL mask blank in AGC

Takashi Sugiyama, Hiroshi Kojima, Masabumi Ito, Kouji Otsuka, Mika Yokoyama, Masaki Mikami, Kazuyuki Hayashi, Katsuhiro Matsumoto, Shinya Kikugawa

Proceedings Volume 6349, 63492J (2006) https://doi.org/10.1117/12.686618

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Multilayers, Reflectivity, Coating, Extreme ultraviolet, Glasses, Polishing, Particles, Surface roughness

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Proceedings Article | 23 March 2006 Paper

Novel low thermal expansion material for EUV application

Mitsuhiro Kawata, Akira Takada, Hideaki Hayashi, Naoki Sugimoto, Shinya Kikugawa

Proceedings Volume 6151, 61511A (2006) https://doi.org/10.1117/12.655931

KEYWORDS: Glasses, Silica, Tin, Silicon, Extreme ultraviolet, Quartz, Photomasks, Chlorine, Extreme ultraviolet lithography, Chemistry

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Proceedings Article | 2 June 2004 Paper

Hard pellicle investigation for 157-nm lithography: impact on overlay

Richard Bruls, Tammo Uitterdijk, Orlando Cicilia, Peter De Bisschop, Michael Kocsis, Andrew Grenville, Chris Van Peski, Roxann Engelstad, Jaehyuk Chang, Eric Cotte, Kaname Okada, Kazushige Ohta, Hitoshi Mishiro, Shinya Kikugawa

Proceedings Volume 5504, (2004) https://doi.org/10.1117/12.568003

KEYWORDS: Pellicles, Reticles, Distortion, Lithography, Overlay metrology, Polymers, Semiconducting wafers, Fluorine, Polymer thin films, Refraction

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Proceedings Article | 1 August 2002 Paper

Hard pellicle study for 157-nm lithography

Emily Shu, Fu-Chang Lo, Florence Eschbach, Eric Cotte, Roxann Engelstad, Edward Lovell, Kaname Okada, Shinya Kikugawa

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.477011

KEYWORDS: Pellicles, Reticles, Photomasks, Quartz, Interferometers, Refraction, Aluminum, Lithography, Glasses, Silica

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Proceedings Article | 1 August 2002 Paper

Development of hard pellicle for 157 nm

Kaname Okada, K. Ootsuka, I. Ishikawa, Yoshiaki Ikuta, H. Kojima, T. Kawahara, T. Minematsu, H. Mishiro, Shinya Kikugawa, Y. Sasuga

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476971

KEYWORDS: Pellicles, Silica, Glasses, Lithography, Birefringence, Photomasks, Laser irradiation, Polymers, Antireflective coatings, Reticles

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Proceedings Article | 12 April 2001 Paper

Damage behavior of SiO2 glass induced by 193-nm radiation under a simulated operating mode of lithography laser

Yoshiaki Ikuta, Shinya Kikugawa, Masahiro Hirano, Hideo Hosono

Proceedings Volume 4347, (2001) https://doi.org/10.1117/12.425021

KEYWORDS: Absorption, Glasses, Excimer lasers, Lithography, Hydrogen, Optical simulations, Silicon, Silica, Spectroscopy, Photolysis

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Proceedings Article | 19 July 2000 Paper

New modified silica glass for 157-nm lithography

Yoshiaki Ikuta, Shinya Kikugawa, T. Kawahara, H. Mishiro, Kaname Okada, Katsuhiro Ochiai, Keigo Hino, T. Nakajima, M. Kawata, Shuhei Yoshizawa

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392092

KEYWORDS: Pellicles, Silica, Glasses, Lithography, Photomasks, Birefringence, Optical properties, Transmittance, Polishing, Contamination

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Proceedings Article | 5 July 2000 Paper

New silica glass (AQF) for 157-nm lithography

Yoshiaki Ikuta, Shinya Kikugawa, T. Kawahara, H. Mishiro, Noriaki Shimodaira, Shuhei Yoshizawa

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388990

KEYWORDS: Silica, Glasses, Photomasks, Lithography, Birefringence, Optical lithography, Inspection, Transmittance, Manufacturing, Process control

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Proceedings Article | 30 December 1999 Paper

New silica glass for 157-nm lithography

Yoshiaki Ikuta, Shinya Kikugawa, T. Kawahara, H. Mishiro, Noriaki Shimodaira, H. Arishima, Shuhei Yoshizawa

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373303

KEYWORDS: Glasses, Silica, Photomasks, Lithography, Vacuum ultraviolet, Excimer lasers, Optical lithography, Transmittance, Crystals, Optical components

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Proceedings Article | 25 June 1999 Paper

New silica glass for 157-nm lithography

Yoshiaki Ikuta, Shinya Kikugawa, Akio Masui, Noriaki Shimodaira, Shuhei Yoshizawa, Masahiro Hirano

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351160

KEYWORDS: Glasses, Silica, Lithography, Transmittance, Vacuum ultraviolet, Resistance, Hydrogen, Absorption, Laser irradiation, Optical properties

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Showing 5 of 10 publications

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