Syouhei Yamauchi
at Tokyo Electron Yamanashi Ltd
SPIE Involvement:
Author
Publications (32)

Proceedings Article | 5 April 2017 Paper
Proceedings Volume 10146, 101461M (2017) https://doi.org/10.1117/12.2258154
KEYWORDS: Optical lithography, Double patterning technology, Line edge roughness, Carbon, Etching, Silica, Atomic layer deposition, Silicon films, Lithography, Line width roughness

Proceedings Article | 27 March 2017 Presentation + Paper
Proceedings Volume 10143, 1014315 (2017) https://doi.org/10.1117/12.2258210
KEYWORDS: Extreme ultraviolet, Lithography, Image processing, Edge roughness, Imaging arrays, Extreme ultraviolet lithography, Line edge roughness, Optical lithography, Critical dimension metrology, Stochastic processes, Etching, Logic, Overlay metrology

Proceedings Article | 27 March 2017 Paper
Proceedings Volume 10146, 101461N (2017) https://doi.org/10.1117/12.2258221
KEYWORDS: Extreme ultraviolet, Etching, Process control, Critical dimension metrology, Optical lithography, Lithography, Inspection, Logic, Immersion lithography, Extreme ultraviolet lithography, 193nm lithography

Proceedings Article | 25 March 2016 Paper
Proceedings Volume 9779, 97790V (2016) https://doi.org/10.1117/12.2218961
KEYWORDS: Optical lithography, Logic, Lithography, Etching, Process control, System on a chip, Photoresist materials, Line edge roughness, Photoresist processing, Critical dimension metrology, Atomic layer deposition

Proceedings Article | 25 March 2016 Paper
Proceedings Volume 9779, 97791V (2016) https://doi.org/10.1117/12.2218774
KEYWORDS: Directed self assembly, Optical lithography, Edge roughness, Etching, Atomic layer deposition, Reactive ion etching, Photomasks, Manufacturing, Extreme ultraviolet, Lithography

Showing 5 of 32 publications
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