Dr. Shravan Matham Profile

Dr. Shravan Matham

at IBM Corp

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Author

Publications (7)

SPIE Journal Paper | 1 July 2020 Open Access

Fundamental characterization of stochastic variation for improved single-expose extreme ultraviolet patterning at aggressive pitch

Jennifer Church, Luciana Meli, Jing Guo, Martin Burkhardt, Chris Mack, Anuja De Silva, Karen Petrillo, Mary Breton, Ravi Bonam, Romain Lallement, Eric Miller, Brad Austin, Shravan Matham, Nelson Felix

JM3, Vol. 19, Issue 03, 034001, (July 2020) https://doi.org/10.1117/12.10.1117/1.JMM.19.3.034001

KEYWORDS: Stochastic processes, Fiber optic illuminators, Line edge roughness, Critical dimension metrology, Defect inspection, Extreme ultraviolet, Inspection, Optical lithography, Yield improvement

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Proceedings Article | 23 March 2020 Presentation + Paper

Fundamental characterization of stochastic variation for improved single-expose EUV patterning at aggressive pitch

Jennifer Church, Luciana Meli, Jing Guo, Martin Burkhardt, Chris Mack, Anuja DeSilva, Karen Petrillo, Mary Breton, Ravi Bonam, Romain Lallement, Eric Miller, Brad Austin, Shravan Matham, Nelson Felix

Proceedings Volume 11323, 113230O (2020) https://doi.org/10.1117/12.2551487

KEYWORDS: Stochastic processes, Line edge roughness, Inspection, Defect inspection, Critical dimension metrology, Extreme ultraviolet, Optical lithography, Etching, Bridges

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SPIE Journal Paper | 5 September 2018

Defect detection strategies and process partitioning for single-expose EUV patterning

Luciana Meli, Karen Petrillo, Anuja De Silva, John Arnold, Nelson Felix, Chris Robinson, Benjamin Briggs, Shravan Matham, Yann Mignot, Jeffrey Shearer, Bassem Hamieh, Koichi Hontake, Lior Huli, Corey Lemley, Dave Hetzer, Eric Liu, Ko Akiteru, Shinichiro Kawakami, Takeshi Shimoaoki, Yusaku Hashimoto, Hiroshi Ichinomiya, Akiko Kai, Koichiro Tanaka, Ankit Jain, Heungsoo Choi, Barry Saville, Chet Lenox

JM3, Vol. 18, Issue 01, 011006, (September 2018) https://doi.org/10.1117/12.10.1117/1.JMM.18.1.011006

KEYWORDS: Inspection, Semiconducting wafers, Stochastic processes, Extreme ultraviolet, Etching, Defect detection, Electron beam lithography, Modulation, Coating, Extreme ultraviolet lithography

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Proceedings Article | 28 March 2018 Presentation + Paper

Defect detection strategies and process partitioning for SE EUV patterning

Proceedings Volume 10583, 105830E (2018) https://doi.org/10.1117/12.2297362

KEYWORDS: Inspection, Semiconducting wafers, Etching, Stochastic processes, Extreme ultraviolet, Modulation, Defect detection, Extreme ultraviolet lithography, Coating, Electron beam lithography

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SPIE Journal Paper | 23 May 2017

Development of TiO₂ containing hardmasks through plasma-enhanced atomic layer deposition

Anuja De Silva, Indira Seshadri, Kisup Chung, Abraham Arceo, Luciana Meli, Brock Mendoza, Yasir Sulehria, Yiping Yao, Madhana Sunder, Hoa Truong, Shravan Matham, Ruqiang Bao, Heng Wu, Nelson Felix, Sivananda Kanakasabapathy

JM3, Vol. 16, Issue 02, 023504, (May 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.2.023504

KEYWORDS: Titanium dioxide, Metals, Atomic layer deposition, Optical lithography, Etching, Dry etching, Contamination, Modulation, Wet etching, Lithography

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Proceedings Article | 27 March 2017 Presentation + Paper

Development of TiO2 containing hardmasks through PEALD deposition

Anuja De Silva, Indira Seshadri, Kisup Chung, Abraham Arceo, Luciana Meli, Brock Mendoza, Yasir Sulehria, Yiping Yao, Madhana Sunder, Hao Truong, Shravan Matham, Ruqiang Bao, Heng Wu, Nelson Felix, Sivananda Kanakasabapathy

Proceedings Volume 10146, 1014615 (2017) https://doi.org/10.1117/12.2258380

KEYWORDS: Metals, Titanium, Lithography, Optical lithography, Dry etching, Etching, Photoresist materials, Titanium dioxide, Wet etching, Plasma, Carbon

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Proceedings Article | 24 March 2017 Presentation + Paper

Printability and actinic AIMS review of programmed mask blank defects

Erik Verduijn, Pawitter Mangat, Obert Wood, Jed Rankin, Yulu Chen, Francis Goodwin, Renzo Capelli, Sascha Perlitz, Dirk Hellweg, Ravi Bonam, Shravan Matham, Nelson Felix, Daniel Corliss

Proceedings Volume 10143, 101430K (2017) https://doi.org/10.1117/12.2260053

KEYWORDS: Photomasks, Semiconducting wafers, Scanning electron microscopy, Extreme ultraviolet, Printing, Bridges, Extreme ultraviolet lithography, Inspection, Chromium, Atomic force microscopy

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Showing 5 of 7 publications

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