Prof. Sikun Li Profile

Prof. Sikun Li

at Shanghai Institute of Optics and Fine Mechanics

SPIE Involvement:

Author

Publications (31)

Proceedings Article | 10 December 2024 Paper

TransUNet-based end-to-end proximity effect correction for electron beam lithography

Hongwei Huang, Haolan Wang, Yuyang Liu, Sikun Li

Proceedings Volume 13423, 1342317 (2024) https://doi.org/10.1117/12.3053060

KEYWORDS: Education and training, Machine learning, Electron beam lithography, Point spread functions, Monte Carlo methods, Data processing, Data modeling, Optical proximity correction, Scattering

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SPIE Journal Paper | 19 December 2023

Multiple patterning via layout decomposition method for directed self-assembly lithography

Tao Zhang, Hengyu Zhou, Shisheng Xiong, Sikun Li

JM3, Vol. 22, Issue 04, 043001, (December 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.4.043001

KEYWORDS: Directed self assembly, Lithography, Optical lithography, Electron beam lithography, Block copolymers, Mathematical optimization, Design, Printing, Manufacturing, Very large scale integration

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Proceedings Article | 24 November 2023 Paper

Multilayer defect compensation based on three dimensional absorber correction in EUV lithography

Zheng Hang, Sikun Li, Dongchao Pang, Longqiao Zhang, Shuai Yuan, Xiangzhao Wang

Proceedings Volume 12935, 129354E (2023) https://doi.org/10.1117/12.3007995

KEYWORDS: Printing, 3D mask effects, Multilayers, Extreme ultraviolet lithography, Extreme ultraviolet, Simulations, Diffraction, Deformation, 3D image processing, Reflection, Phase compensation

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Proceedings Article | 24 November 2023 Paper

Analysis of extreme ultraviolet mask defect inspection based on complex amplitudes of the aerial images

Longqaio Zhang, Sikun Li, Hang Zheng, Shuai Yuan, Xiangzhao Wang

Proceedings Volume 12935, 129353D (2023) https://doi.org/10.1117/12.3007756

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Phase reconstruction, Image analysis

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Proceedings Article | 1 November 2021 Paper

A scanner matching method based on covariance matrix adaptation evolution strategy

Yuguang Chen, Sikun Li, Shaobo Hu, Guodong Chen, Ming Tang, Weijie Shi, Xiangzhao Wang

Proceedings Volume 12057, 120572F (2021) https://doi.org/10.1117/12.2605879

KEYWORDS: Scanners, Particle swarm optimization, Lithography, Lithographic illumination, Particles, Computer simulations, Optimization (mathematics), Genetic algorithms, Resolution enhancement technologies, Photomasks

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SPIE Journal Paper | 24 January 2019

Predictor of thermal aberrations via particle filter for online compensation

Yanjie Mao, Sikun Li, Gang Sun, Lifeng Duan, Weijie Shi, Yang Bu, Xiangzhao Wang

JM3, Vol. 18, Issue 01, 013502, (January 2019) https://doi.org/10.1117/12.10.1117/1.JMM.18.1.013502

KEYWORDS: Particle filters, Filtering (signal processing), Thermal modeling, Particles, Semiconducting wafers, Projection systems, Lithography, Photomasks, Data modeling, Calibration

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SPIE Journal Paper | 3 December 2018

Optimization of defect compensation for extreme ultraviolet lithography mask by covariance-matrix-adaption evolution strategy

Heng Zhang, Sikun Li, Xiangzhao Wang, Chaoxing Yang, Wei Cheng

JM3, Vol. 17, Issue 04, 043505, (December 2018) https://doi.org/10.1117/12.10.1117/1.JMM.17.4.043505

KEYWORDS: Photomasks, Optimization (mathematics), Extreme ultraviolet lithography, Computer programming, Computer simulations, Evolutionary algorithms, Lithography, Manufacturing, Lithium, High volume manufacturing

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Proceedings Article | 2 November 2018 Paper

Digital sinusoidal fringe generation with defocusing for profilometry: exponential binary vs squared binary patterns

Abel Kamagara, Xiangzhao Wang, Sikun Li, Changzhe Peng

Proceedings Volume 10819, 108190V (2018) https://doi.org/10.1117/12.2500179

KEYWORDS: Binary data, Fringe analysis, Projection systems, Gaussian filters, 3D metrology, Phase shifts, Error analysis, Phase measurement, 3D image processing

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Proceedings Article | 9 August 2018 Paper

Sparse and adaptive fringe-enhancement efficiency analysis in 3D optical digital fringe-projection imaging

Abel Kamagara, Xiangzhao Wang, Sikun Li, Changzhe Peng

Proceedings Volume 10806, 108063H (2018) https://doi.org/10.1117/12.2502876

KEYWORDS: Fringe analysis, Image enhancement, 3D image processing, Phase shifts, 3D metrology, Adaptive optics, Image filtering, Digital filtering, Reconstruction algorithms, Image processing

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SPIE Journal Paper | 11 April 2018

Modeling and optimization of lens heating effect for lithographic projector

Yanjie Mao, Sikun Li, Gang Sun, Lifeng Duan, Yang Bu, Xiangzhao Wang

JM3, Vol. 17, Issue 02, 023501, (April 2018) https://doi.org/10.1117/12.10.1117/1.JMM.17.2.023501

KEYWORDS: Projection systems, Lithography, Optical components, Optimization (mathematics), Thermal modeling, Refractive index, Photomasks, Optical design, Lithographic illumination, Thermography

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SPIE Journal Paper | 21 March 2018

Nonlinear gamma correction via normed bicoherence minimization in optical fringe projection metrology

Abel Kamagara, Xiangzhao Wang, Sikun Li

OE, Vol. 57, Issue 03, 034107, (March 2018) https://doi.org/10.1117/12.10.1117/1.OE.57.3.034107

KEYWORDS: Fringe analysis, Projection systems, Calibration, Lithium, Nonlinear optics, Metrology, Optical engineering, Statistical analysis, Coherence (optics), 3D metrology

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Proceedings Article | 20 March 2018 Paper

Prediction of lens heating induced aberration via particle filter in optical lithography

Yanjie Mao, Sikun Li, Gang Sun, Lifeng Duan, Weijie Shi, Yang Bu, Xiangzhao Wang

Proceedings Volume 10587, 105871K (2018) https://doi.org/10.1117/12.2297338

KEYWORDS: Particle filters, Semiconducting wafers, Lithography, Thermal modeling, Projection systems, Data modeling, Optical lithography, Manufacturing

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Proceedings Article | 24 March 2017 Paper

The thermal aberration analysis of a lithography projection lens

Yanjie Mao, Sikun Li, Gang Sun, Jian Wang, Lifeng Duan, Yang Bu, Xiangzhao Wang

Proceedings Volume 10147, 101471P (2017) https://doi.org/10.1117/12.2258037

KEYWORDS: Lens design, Thermal modeling, Lithography, Optical lithography, Refractive index, Optical design, Thermal analysis, Wavefront aberrations, Optical components, Silica, Photomasks

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Proceedings Article | 15 March 2016 Paper

Pixel-based mask optimization via particle swarm optimization algorithm for inverse lithography

Lei Wang, Sikun Li, Xiangzhao Wang, Chaoxing Yang, Feng Tang

Proceedings Volume 9780, 97801V (2016) https://doi.org/10.1117/12.2230404

KEYWORDS: Source mask optimization, Particle swarm optimization, Lithography, Optical lithography, Resolution enhancement technologies, Photomasks, Particles, Molybdenum, Algorithm development, Manufacturing

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SPIE Journal Paper | 19 February 2016

Pixelated source optimization for optical lithography via particle swarm optimization

Lei Wang, Sikun Li, Xiangzhao Wang, Guanyong Yan, Chaoxing Yang

JM3, Vol. 15, Issue 01, 013506, (February 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.1.013506

KEYWORDS: Particle swarm optimization, Particles, Photomasks, Optical lithography, Lithographic illumination, Lithography, Optimization (mathematics), Source mask optimization, Image quality, Resolution enhancement technologies

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SPIE Journal Paper | 20 October 2015

Analytical analysis of the impact of polarization aberration of projection lens on lithographic imaging

Lina Shen, Sikun Li, Xiangzhao Wang, Guanyong Yan

JM3, Vol. 14, Issue 04, 043504, (October 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.4.043504

KEYWORDS: Polarization, Lithography, Photomasks, Imaging systems, Diffraction, Lithographic illumination, Computer simulations, Image analysis, Zernike polynomials, Image processing

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Proceedings Article | 18 March 2015 Paper

Analytical analysis for impact of polarization aberration of projection lens on lithographic imaging quality

Lina Shen, Sikun Li, Xiangzhao Wang, Guanyong Yan

Proceedings Volume 9426, 94261E (2015) https://doi.org/10.1117/12.2181336

KEYWORDS: Polarization, Lithography, Imaging systems, Diffraction, Photomasks, Received signal strength, Zernike polynomials, Image analysis, Matrices, Amplifiers

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Proceedings Article | 18 March 2015 Paper

Source optimization using particle swarm optimization algorithm in photolithography

Lei Wang, Sikun Li, Xiangzhao Wang, Guanyong Yan, Chaoxing Yang

Proceedings Volume 9426, 94261L (2015) https://doi.org/10.1117/12.2181335

KEYWORDS: Particle swarm optimization, Particles, Optimization (mathematics), Optical lithography, Source mask optimization, Photomasks, Genetic algorithms, Resolution enhancement technologies, Lithography, Image quality

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SPIE Journal Paper | 13 November 2014

In situ aberration measurement method using a phase-shift ring mask

Sikun Li, Xiangzhao Wang, Jishuo Yang, Lifeng Duan, Feng Tang, Guanyong Yan

JM3, Vol. 14, Issue 01, 011005, (November 2014) https://doi.org/10.1117/12.10.1117/1.JMM.14.1.011005

KEYWORDS: Photomasks, In situ metrology, Process modeling, Image processing, Lithography, Principal component analysis, Error analysis, Image retrieval, Semiconducting wafers, Zernike polynomials

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SPIE Journal Paper | 2 October 2014

Efficient source mask optimization using multipole source representation

Chaoxing Yang, Sikun Li, Xiangzhao Wang

JM3, Vol. 13, Issue 04, 043001, (October 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.4.043001

KEYWORDS: Source mask optimization, Computer simulations, Lithium, Lithography, Lithographic illumination, Genetic algorithms, Logic, Optimization (mathematics), Zernike polynomials, Airborne remote sensing

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SPIE Journal Paper | 8 August 2014

Fast model for mask spectrum simulation and analysis of mask shadowing effects in extreme ultraviolet lithography

Xiaolei Liu, Xiangzhao Wang, Sikun Li, Guanyong Yan, Andreas Erdmann

JM3, Vol. 13, Issue 03, 033007, (August 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.3.033007

KEYWORDS: Photomasks, Diffraction, Critical dimension metrology, Extreme ultraviolet lithography, Waveguides, Extreme ultraviolet, Calibration, Mathematical modeling, Reflectivity, Wave propagation

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Proceedings Article | 17 April 2014 Paper

Fast rigorous model for mask spectrum simulation and analysis of mask shadowing effects in EUV lithography

Xiaolei Liu, Xiangzhao Wang, Sikun Li, Guanyong Yan, Andreas Erdmann

Proceedings Volume 9048, 90483E (2014) https://doi.org/10.1117/12.2046333

KEYWORDS: Photomasks, Diffraction, Extreme ultraviolet lithography, Critical dimension metrology, Extreme ultraviolet, Silicon, Mathematical modeling, Lithographic illumination, Laser sintering, Reflectivity

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Proceedings Article | 31 March 2014 Paper

A defocus measurement method for an in situ aberration measurement method using a phase-shift ring mask

Sikun Li, Xiangzhao Wang, Jishuo Yang, Feng Tang, Guanyong Yan, Andreas Erdmann

Proceedings Volume 9052, 90521L (2014) https://doi.org/10.1117/12.2046649

KEYWORDS: Photomasks, Image processing, Process modeling, In situ metrology, Lithography, Principal component analysis, Image retrieval, Polarization, Error analysis, Databases

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Proceedings Article | 31 March 2014 Paper

In situ aberration measurement method using a phase-shift ring mask

Xiangzhao Wang, Sikun Li, Jishuo Yang, Feng Tang, Guanyong Yan, Andreas Erdmann

Proceedings Volume 9052, 90521J (2014) https://doi.org/10.1117/12.2046257

KEYWORDS: Photomasks, In situ metrology, Lithography, Principal component analysis, Process modeling, Image processing, Zernike polynomials, Lenses, Image retrieval, Monochromatic aberrations

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SPIE Journal Paper | 11 June 2013

In situ aberration measurement technique based on an aerial image with an optimized source

Guanyong Yan, Xiangzhao Wang, Sikun Li, Jishuo Yang, Dongbo Xu, Lifeng Duan, Anatoly Bourov, Andreas Erdmann

OE, Vol. 52, Issue 06, 063602, (June 2013) https://doi.org/10.1117/12.10.1117/1.OE.52.6.063602

KEYWORDS: In situ metrology, Image processing, Principal component analysis, Process modeling, Lithography, Matrices, Optical engineering, Image retrieval, Lithographic illumination, Zernike polynomials

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Proceedings Article | 22 May 2013 Paper

Defect parameters retrieval based on optical projection images

Dongbo Xu, Sikun Li, Xiangzhao Wang, Tim Fühner, Andreas Erdmann

Proceedings Volume 8789, 87890J (2013) https://doi.org/10.1117/12.2018210

KEYWORDS: Photomasks, 3D modeling, Defect detection, Lithography, Monochromatic aberrations, Projection systems, Integrated optics, Nanostructures, Lithographic illumination, Optics manufacturing

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SPIE Journal Paper | 7 May 2013

High-order aberration measurement technique based on a quadratic Zernike model with optimized source

Jishuo Yang, Xiangzhao Wang, Sikun Li, Lifeng Duan, Guanyong Yan, Dongbo Xu, Anatoly Bourov, Andreas Erdmann

OE, Vol. 52, Issue 05, 053603, (May 2013) https://doi.org/10.1117/12.10.1117/1.OE.52.5.053603

KEYWORDS: Photomasks, Lithography, Artificial intelligence, Principal component analysis, Optical engineering, Process modeling, Wavefront aberrations, Monochromatic aberrations, Instrument modeling, Mechanics

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Proceedings Article | 12 April 2013 Paper

Source mask optimization using real-coded genetic algorithms

Chaoxing Yang, Xiangzhao Wang, Sikun Li, Andreas Erdmann

Proceedings Volume 8683, 86831T (2013) https://doi.org/10.1117/12.2010137

KEYWORDS: Source mask optimization, Photomasks, Genetic algorithms, Binary data, Logic, Lithographic illumination, Genetics, Optimization (mathematics), Computer programming, Inverse problems

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Proceedings Article | 18 December 2012 Paper

In situ aberration measurement technique based on aerial image with optimized source

Guanyong Yan, Xiangzhao Wang, Sikun Li, Jishuo Yang, Dongbo Xu, Lifeng Duan, Anatoly Bourov, Andreas Erdmann

Proceedings Volume 8550, 85503N (2012) https://doi.org/10.1117/12.981334

KEYWORDS: Matrices, Lithographic illumination, Lithography, Image processing, Principal component analysis, Process modeling, Statistical analysis, Error analysis, Artificial intelligence, Imaging systems

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Proceedings Article | 18 December 2012 Paper

In situ aberration measurement technique based on quadratic Zernike model

Jishuo Yang, Xiangzhao Wang, Sikun Li, Lifeng Duan, Guanyong Yan, Dongbo Xu, Anatoly Bourov, Andreas Erdmann

Proceedings Volume 8550, 85503O (2012) https://doi.org/10.1117/12.981328

KEYWORDS: Lithography, Principal component analysis, Wavefront aberrations, In situ metrology, Semiconducting wafers, Image processing, Photomasks, Computer simulations, Metrology, Artificial intelligence

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Proceedings Article | 13 March 2012 Paper

Symmetric polarization aberration compensation method based on scalar aberration control for lithographic projection lens

Yuanying Tu, Xiangzhao Wang, Sikun Li, Lifeng Duan, Peng Bu

Proceedings Volume 8326, 83262T (2012) https://doi.org/10.1117/12.917909

KEYWORDS: Polarization, Lithography, Photomasks, Matrices, Resolution enhancement technologies, Birefringence, Critical dimension metrology, Wave plates, Polarizers, Received signal strength

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Showing 5 of 31 publications

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