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Sophia Bourzgui
PhD student at EMSE
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Publications (1)
Proceedings Article | 4 September 2018 Paper
The light behavior from Shallow Trench Isolation profiles at Chemical Mechanical Planarization step and correlation with optical endpoint system by interferometry
S. Bourzgui, G. Georges, A. Roussy, J. Blue, E. Faivre, J. Pinaton
Proceedings Volume 10750, 107500C (2018) https://doi.org/10.1117/12.2320966
KEYWORDS: Chemical mechanical planarization, Polishing, Interferometry, Diffraction, Semiconducting wafers, Signal detection, Process control, Light scattering, Scattering
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