Mr. Stefan N. Smith-Meerman Profile

Stefan N. Smith-Meerman

at ASML Netherlands BV

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 13 November 2024 Presentation

High-resolution lithography: latest generation in EUV lithograph with 0.55 NA

Aysegul Cumurcu Gysen, Cheuk-Wah Man, Bas van Meerten, Hilbert van Loo, Eelco van Setten, Stefan Smith-Meerman, Gokay Yegen, Diederik de Bruin, Jan van Schoot, Rudy Peeters, Kaustuve Bhattacharyya, Greet Storms, Peter Vanoppen

Proceedings Volume PC13215, PC1321505 (2024) https://doi.org/10.1117/12.3036955

KEYWORDS: Extreme ultraviolet, Lithography, Metals, Extreme ultraviolet lithography, Design, Chip manufacturing, Overlay metrology, Optical lithography

Read Abstract +

Proceedings Article | 10 April 2024 Poster + Paper

Multi-wavelength continuous-bias DBO metrology for improved ADI process-robustness

Jungmin Lee, Inbeom Lim, Byeong Seon Park, Changyeon Lee, Mincheol Kwak, Jeongjin Lee, Seung Yoon Lee, Chan Hwang, Jay Mummery, Bruno Gregorio Almeida, Han-Gyeol Park, Mi-Yeon Baek, Kemal Dahha, Ki-Youn Lee, Se-Hui Lee, Arno van Leest, Thao Nguyen, Marc Noot, Stefan Smith-Meerman, Koen van Witteveen, Jong-Hyuk Yim, Olger Zwier

Proceedings Volume 12955, 129553P (2024) https://doi.org/10.1117/12.3012950

KEYWORDS: Overlay metrology, Signal to noise ratio, Denoising, Semiconducting wafers, Metrology, Inspection, Phase shifts, Optical gratings, Industrial applications, Diffraction

Read Abstract +

Proceedings Article | 27 April 2023 Presentation + Paper

EPE-aware process optimization for scanner dose and overlay in DRAM use case

Inho Kwak, Nanhyung Kim, Inbeom Yim, Jeongjin Lee, Seung Yoon Lee, Chan Hwang, Pieter Brandt, Kateryna Lyakhova, Marco Mueller, Ferhad Kamalizadeh, Antonio Corradi, Yun-A Sung, Thomas Kim, Stefan Smith-Meerman, Stefan van der Sanden, Sung-Min Park, Bob Boo, Hyok-Man Kwon

Proceedings Volume 12496, 124960N (2023) https://doi.org/10.1117/12.2658274

KEYWORDS: Scanners, Overlay metrology, Semiconducting wafers, Lithography, Metrology, Dysprosium, Distributed interactive simulations, Design and modelling, Critical dimension metrology, Yield improvement

Read Abstract +

Proceedings Article | 27 April 2023 Presentation + Paper

Using active asymmetry control and blind source separation to improve the accuracy of after develop overlay measurements

Jungmin Lee, Doogyu Lee, Eunji Lee, Inbeom Yim, Jeongjin Lee, Seung Yoon Lee, Chan Hwang, Marc Noot, Arno van Leest, Simon Mathijssen, Yao Gao, Seung-Bin Yang, Mi-Yeon Baek, Do-Haeng Lee, Han-Gyeol Park, Jong-Hyuk Yim, Thomas Kim, Ho-Hyuk Lee, Kemal Dahha, Stefan Smith-Meerman, Koen van Witteveen, Elliott McNamara, Matthew McLaren

Proceedings Volume 12496, 124960H (2023) https://doi.org/10.1117/12.2658330

KEYWORDS: Semiconducting wafers, Overlay metrology, Metrology, Matrices, Polarization, Wafer testing, Signal processing, Independent component analysis, Education and training, Diffraction

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years