Dr. SungEun Hong Profile

Dr. SungEun Hong

at EMD Electronics

SPIE Involvement:

Author

Publications (10)

Proceedings Article | 7 April 2017 Paper

Spin-on metal oxide materials for N7 and beyond patterning applications

G. Mannaert, E. Altamirano-Sanchez, T. Hopf, F. Sebaai, C. Lorant, C. Petermann, S.-E. Hong, S. Mullen, E. Wolfer, D. Mckenzie, H. Yao, D. Rahman, J.-Y. Cho, M. Padmanaban, D. Piumi

Proceedings Volume 10149, 101490T (2017) https://doi.org/10.1117/12.2264323

KEYWORDS: Etching, Metals, Optical lithography, Photomasks, Plasma, System on a chip, Oxides, Contamination, Reflectivity, Silicon

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SPIE Journal Paper | 17 August 2016

Influence of template fill in graphoepitaxy directed self-assembly

Jan Doise, Joost Bekaert, Boon Teik Chan, Sung Eun Hong, Guanyang Lin, Roel Gronheid

JM3, Vol. 15, Issue 03, 031603, (August 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.3.031603

KEYWORDS: Directed self assembly, Polymethylmethacrylate, Atomic force microscopy, Critical dimension metrology, System on a chip, Optical lithography, Semiconducting wafers, Etching, Silicon, Photomasks

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Proceedings Article | 25 March 2016 Paper

Spin-on metal oxide materials with high etch selectivity and wet strippability

Huirong Yao, Salem Mullen, Elizabeth Wolfer, Douglas McKenzie, Dalil Rahman, JoonYeon Cho, Munirathna Padmanaban, Claire Petermann, SungEun Hong, YoungJun Her

Proceedings Volume 9779, 97791O (2016) https://doi.org/10.1117/12.2220293

KEYWORDS: Resistance, Oxygen, Silicon, Semiconducting wafers

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Proceedings Article | 25 March 2016 Paper

Influence of template fill in graphoepitaxy DSA

Jan Doise, Joost Bekaert, Boon Teik Chan, SungEun Hong, Guanyang Lin, Roel Gronheid

Proceedings Volume 9779, 97791G (2016) https://doi.org/10.1117/12.2219580

KEYWORDS: Optical lithography, Lithography, Materials processing, Directed self assembly, Polymethylmethacrylate, Atomic force microscopy, Etching, Semiconducting wafers, Critical dimension metrology, System on a chip, Photoresist developing

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Proceedings Article | 25 March 2016 Paper

Directed self-assembly materials for high resolution beyond PS-b-PMMA

Eri Hirahara, Margareta Paunescu, Orest Polishchuk, EunJeong Jeong, Edward Ng, Jianhui Shan, Jian Yin, Jihoon Kim, Yi Cao, Jin Li, SungEun Hong, Durairaj Baskaran, Guanyang Lin

Proceedings Volume 9779, 977914 (2016) https://doi.org/10.1117/12.2220424

KEYWORDS: Directed self assembly, Semiconducting wafers, Scanning electron microscopy, Etching, Silicon, Optical lithography, Polymers, Line edge roughness, Photomicroscopy, Annealing

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Proceedings Article | 22 March 2016 Paper

DSA materials contributions to the defectivity performance of 14nm half-pitch LiNe flow at IMEC

Hari Pathangi, Varun Vaid, Boon Teik Chan, Nadia Vandenbroeck, Jin Li, Sung Eun Hong, Yi Cao, Baskaran Durairaj, Guanyang Lin, Mark Somervell, Takahiro Kitano, Ryota Harukawa, Kaushik Sah, Andrew Cross, Hareen Bayana, Lucia D’Urzo, Roel Gronheid

Proceedings Volume 9777, 97770G (2016) https://doi.org/10.1117/12.2219936

KEYWORDS: Directed self assembly, Metrology, Optical lithography, Silicon, Semiconducting wafers, Etching, Bridges, Polymers, Manufacturing, Scanning electron microscopy, Epitaxy, Lithography, Thin film coatings

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Proceedings Article | 20 March 2015 Paper

Directed self-assembly of topcoat-free, integration-friendly high-X block copolymers

Eri Hirahara, Margareta Paunescu, Orest Polishchuk, EunJeong Jeong, Edward Ng, Jianhui Shan, Jihoon Kim, SungEun Hong, Durairaj Baskaran, Guanyang Lin, Ankit Vora, Melia Tjio, Noel Arellano, Charles Rettner, Elizabeth Lofano, Chi-Chun Liu, Hsinyu Tsai, Anindarupa Chunder, Khanh Nguyen, Alexander Friz, Amy Bowers, Srinivasan Balakrishnan, Joy Cheng, Daniel Sanders

Proceedings Volume 9425, 94250P (2015) https://doi.org/10.1117/12.2087398

KEYWORDS: Scanning electron microscopy, Etching, Photomicroscopy, Dry etching, Annealing, Thin films, Plasma etching, Polymers, Coating, Directed self assembly

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Proceedings Article | 1 April 2009 Paper

Comparison of thermal flow and chemical shrink processes for 193 nm contact hole patterning

Takanori Kudo, Charito Antonio, John Sagan, Srinivasan Chakrapani, Deepa Parthasarathy, Sungeun Hong, Muthiah Thiyagarajan, Yi Cao, Munirathna Padmanaban

Proceedings Volume 7273, 72730X (2009) https://doi.org/10.1117/12.816633

KEYWORDS: Chemical reactions, Photoresist processing, Polymers, Semiconducting wafers, Industrial chemicals, Lithography, Optical lithography, Glasses, Resolution enhancement technologies, Fourier transforms

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Proceedings Article | 14 May 2004 Paper

Acid diffusion characteristics of RELACS coating for 193nm lithography

Sungeun Hong, Takeshi Nishibe, Tetsuo Okayasu, Kiyohisa Takahashi, Yusuke Takano, Wenbing Kang, Hatsuyuki Tanaka

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.534612

KEYWORDS: Polymers, Diffusion, Photoresist processing, Molecules, Coating, Polymer thin films, Interfaces, 193nm lithography, Chemically amplified resists, Hydrogen

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Proceedings Article | 12 June 2003 Paper

Advanced RELACS (resolution enhancment of lithography by assist of chemical shrink) material for 193-nm lithography

Sungeun Hong, Yusuke Takano, Takashi Kanda, Takanori Kudo, Munirathna Padmanaban, Hatsuyuki Tanaka, Si-Hyeung Lee, Jung-Hyeon Lee, Sang-Gyun Woo

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485155

KEYWORDS: Line edge roughness, Photomasks, Lithography, Resolution enhancement technologies, Polymers, 193nm lithography, Diffusion, Photoresist processing, Surface roughness, Critical dimension metrology

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Showing 5 of 10 publications

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