CONFERENCE PROCEEDINGS
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Takahito Chibana
Engineer at Canon Inc
SPIE Involvement:
Author
Publications (4)
Proceedings Article | 7 March 2008 Paper
Immersion defect performance and particle control method for 45nm mass production
Takahito Chibana, Masamichi Kobayashi, Hitoshi Nakano, Mikio Arakawa, Yoichi Matsuoka, Youji Kawasaki, Masayuki Tanabe, Hirohisa Oda
Proceedings Volume 6924, 69241B (2008) https://doi.org/10.1117/12.774672
KEYWORDS: Semiconducting wafers, Particles, Contamination, Inspection, Scanning probe microscopy, Bridges, Liquids, Water, Deep ultraviolet, Defect inspection
Proceedings Article | 26 March 2007 Paper
Contamination and particle control system in immersion exposure tool
Masamichi Kobayashi, Hitoshi Nakano, Mikio Arakawa, Masayuki Tanabe, Koji Toyoda, Takahito Chibana, Yoichi Matsuoka, Youji Kawasaki
Proceedings Volume 6520, 652014 (2007) https://doi.org/10.1117/12.711289
KEYWORDS: Particles, Contamination, Semiconducting wafers, Bridges, Defect inspection, Water, Inspection, Pulsed laser operation, Control systems, Transmittance
Proceedings Article | 15 March 2006 Paper
Development status of a 193-nm immersion exposure tool
Takahito Chibana, Hitoshi Nakano, Hideo Hata, Nobuhiro Kodachi, Naoto Sano, Mikio Arakawa, Yoichi Matsuoka, Youji Kawasaki, Sunao Mori, Keiko Chiba
Proceedings Volume 6154, 61541V (2006) https://doi.org/10.1117/12.657010
KEYWORDS: Contamination, Semiconducting wafers, Transmittance, Immersion lithography, Defect inspection, Water, Liquids, Particles, Laser irradiation, Scanners
Proceedings Article | 12 May 2005 Paper
Development of ArF immersion exposure tool
Hitoshi Nakano, Hideo Hata, Kazuhiro Takahashi, Mikio Arakawa, Takahito Chibana, Tokuyuki Honda, Keiko Chiba, Sunao Mori
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600492
KEYWORDS: Semiconducting wafers, Water, Contamination, Control systems, Immersion lithography, Scanners, Transmittance, Temperature metrology, Optical lithography, Microfluidics
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