Mr. Takashi Sasaki Profile

Takashi Sasaki

at AGC Inc.

SPIE Involvement:

Author

Publications (8)

Proceedings Article | 26 March 2008 Paper

Highly hydrophobic materials for ArF immersion lithography

Yoko Takebe, Naoko Shirota, Takashi Sasaki, Koichi Murata, Osamu Yokokoji

Proceedings Volume 6923, 69231U (2008) https://doi.org/10.1117/12.772525

KEYWORDS: Polymers, Immersion lithography, Sputter deposition, Polymer thin films, Interfaces, Photoresist processing, Polymerization, Lithography, Scanning electron microscopy, Ions

Read Abstract +

Proceedings Article | 26 March 2008 Paper

Development of partially fluorinated EUV-resist polymers for LER and sensitivity improvement

Takashi Sasaki, Osamu Yokokoji, Takeo Watanabe, Hiroo Kinoshita

Proceedings Volume 6923, 692347 (2008) https://doi.org/10.1117/12.772542

KEYWORDS: Polymers, Extreme ultraviolet lithography, Fluorine, Line edge roughness, Extreme ultraviolet, Etching, Chemical species, Polymerization, Spectroscopy, Lithography

Read Abstract +

Proceedings Article | 2 April 2007 Paper

Development of top coat materials for ArF immersion lithography

Yoko Takebe, Naoko Shirota, Takashi Sasaki, Osamu Yokokoji

Proceedings Volume 6519, 65191Y (2007) https://doi.org/10.1117/12.711867

KEYWORDS: Polymers, Fluorine, Immersion lithography, Thin film coatings, Lithography, Polymerization, Scanning electron microscopy, Polymer thin films, Optical lithography, Semiconducting wafers

Read Abstract +

Proceedings Article | 2 April 2007 Paper

Development of non-topcoat resist polymers for 193-nm immersion lithography

Naoko Shirota, Yoko Takebe, Shu-Zhong Wang, Takashi Sasaki, Osamu Yokokoji

Proceedings Volume 6519, 651905 (2007) https://doi.org/10.1117/12.712057

KEYWORDS: Polymers, Immersion lithography, Polymer thin films, Polymerization, Photoresist processing, Coating, Fluorine, Imaging systems, Lithography, Semiconducting wafers

Read Abstract +

Proceedings Article | 29 March 2006 Paper

Development of fluoropolymer for 193nm immersion lithography

Naoko Shirota, Yoko Takebe, Takashi Sasaki, Osamu Yokokoji, Minoru Toriumi, Hiroshi Masuhara

Proceedings Volume 6153, 615324 (2006) https://doi.org/10.1117/12.656234

KEYWORDS: Polymers, Diffusion, Fluorine, Immersion lithography, Crystals, Quartz, Silicon, Water, Data analysis, Oscillators

Read Abstract +

Proceedings Article | 29 March 2006 Paper

Development of new resist materials for 193-nm dry and immersion lithography

Takashi Sasaki, Naoko Shirota, Yoko Takebe, Osamu Yokokoji

Proceedings Volume 6153, 61530E (2006) https://doi.org/10.1117/12.656141

KEYWORDS: Polymers, Diffusion, Fluorine, Lithography, Resistance, Immersion lithography, Dry etching, Transparency, Etching, Absorption

Read Abstract +

Proceedings Article | 4 May 2005 Paper

A new monocyclic fluoropolymer for 157-nm and 193-nm photoresists

Takashi Sasaki, Yoko Takebe, Osamu Yokokoji, Akihiko Otoguro, Kiyoshi Fujii

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599162

KEYWORDS: Polymers, Resistance, Transparency, Lithography, Fluorine, Polymerization, Etching, Virtual colonoscopy, Absorption, Photoresist materials

Read Abstract +

Proceedings Article | 14 May 2004 Paper

Fluoropolymers for 157-nm single-layer resists developed using a new etching rate estimation model (KI-Model)

Yasuhide Kawaguchi, Takashi Sasaki, Jun Irisawa, Osamu Yokokoji, Shigeo Irie, Akihiko Otoguro, Toshiro Itani, Kiyoshi Fujii

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.533907

KEYWORDS: Polymers, Dry etching, Resistance, Etching, Chemical species, Transparency, Fluorine, Plasma etching, Lithography, Absorption

Read Abstract +

Showing 5 of 8 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years