Mr. Takayuki Nakamura Profile

Takayuki Nakamura

None at Advantest Corp

SPIE Involvement:

Author

Publications (22)

Proceedings Article | 10 May 2016 Paper

Paper

The study on quantifiable analysis for complex OPCed patterns based on Mask CD SEM contour information

Won Joo Park, Hyung-Joo Lee, Yoon Taek Han, Seuk Hwan Choi, Hak Seung Han, Dong Hoon Chung, Chan-Uk Jeon, Yoshiaki Ogiso, Soichi Shida, Jun Matsumoto, Takayuki Nakamura

Proceedings Volume 9984, 998407 (2016) https://doi.org/10.1117/12.2242496

KEYWORDS: Scanning electron microscopy, Photomasks, Critical dimension metrology, Metrology, Image processing, Statistical analysis, Image quality, Neodymium, Semiconductors, Optical proximity correction

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Proceedings Article | 23 October 2015 Paper

Paper

The capability of lithography simulation based on MVM-SEM system

Shingo Yoshikawa, Nobuaki Fujii, Koichi Kanno, Hidemichi Imai, Katsuya Hayano, Hiroyuki Miyashita, Soichi Shida, Tsutomu Murakawa, Masayuki Kuribara, Jun Matsumoto, Takayuki Nakamura, Shohei Matsushita, Daisuke Hara, Linyong Pang

Proceedings Volume 9635, 96351X (2015) https://doi.org/10.1117/12.2197818

KEYWORDS: Lithography, Photomasks, Scanning electron microscopy, Semiconducting wafers, 3D acquisition, 3D metrology, Defect inspection, Defect detection, Manufacturing, Standards development, Critical dimension metrology, Extreme ultraviolet, Bridges, Image analysis, 193nm lithography

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Proceedings Article | 9 July 2015 Paper

Paper

Study of defect verification based on lithography simulation with a SEM system

Shingo Yoshikawa, Nobuaki Fujii, Koichi Kanno, Hidemichi Imai, Katsuya Hayano, Hiroyuki Miyashita, Soichi Shida, Tsutomu Murakawa, Masayuki Kuribara, Jun Matsumoto, Takayuki Nakamura, Shohei Matsushita, Daisuke Hara, Linyong Pang

Proceedings Volume 9658, 96580V (2015) https://doi.org/10.1117/12.2197617

KEYWORDS: Photomasks, Lithography, Scanning electron microscopy, Semiconducting wafers, Critical dimension metrology, 193nm lithography, Defect inspection, Optical lithography, Signal to noise ratio, Source mask optimization

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Proceedings Article | 28 July 2014 Paper

Paper

Three dimensional profile measurement using multi-channel detector MVM-SEM

Makoto Yoshikawa, Sumito Harada, Keisuke Ito, Tsutomu Murakawa, Soichi Shida, Jun Matsumoto, Takayuki Nakamura

Proceedings Volume 9256, 92560G (2014) https://doi.org/10.1117/12.2064944

KEYWORDS: 3D metrology, Sensors, Atomic force microscopy, 3D image processing, Scanning electron microscopy, Algorithm development, Photomasks, Metrology, Transmission electron microscopy, Time metrology

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Proceedings Article | 28 July 2014 Paper

Paper

Novel CD-SEM measurement methodology for complex OPCed patterns

Hyung-Joo Lee, Won Joo Park, Seuk Hwan Choi, Dong Hoon Chung, Inkyun Shin, Byung-Gook Kim, Chan-Uk Jeon, Hiroshi Fukaya, Yoshiaki Ogiso, Soichi Shida, Takayuki Nakamura

Proceedings Volume 9256, 92560D (2014) https://doi.org/10.1117/12.2069368

KEYWORDS: Critical dimension metrology, Scanning electron microscopy, Photomasks, Metrology, Semiconductors, Error analysis, Optical proximity correction, Reliability, Tolerancing, Lithography

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Proceedings Article | 2 April 2014 Paper

Paper

Novel three dimensional (3D) CD-SEM profile measurements

Wataru Ito, Benjamin Bunday, Sumito Harada, Aaron Cordes, Tsutomu Murakawa, Abraham Arceo, Makoto Yoshikawa, Toshihiko Hara, Takehito Arai, Soichi Shida, Masayuki Yamagata, Jun Matsumoto, Takayuki Nakamura

Proceedings Volume 9050, 90500D (2014) https://doi.org/10.1117/12.2047374

KEYWORDS: Atomic force microscopy, 3D image processing, 3D metrology, Sensors, Semiconducting wafers, Metrology, Reticles, Line edge roughness, Scanning electron microscopy

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Proceedings Article | 28 June 2013 Paper

Paper

A study of phase defect measurement on EUV mask by multiple detectors CD-SEM

Isao Yonekura, Hidemitsu Hakii, Shinya Morisaki, Tsutomu Murakawa, Soichi Shida, Masayuki Kuribara, Toshimichi Iwai, Jun Matsumoto, Takayuki Nakamura

Proceedings Volume 8701, 870110 (2013) https://doi.org/10.1117/12.2031846

KEYWORDS: 3D metrology, Sensors, 3D image processing, Atomic force microscopy, 3D vision, 3D acquisition, Extreme ultraviolet, Scanning electron microscopy, Phase measurement, Electron beams

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Proceedings Article | 28 June 2013 Paper

Paper

Next generation electron beam lithography system F7000 for wide range applications

Hirofumi Hayakawa, Masahiro Takizawa, Masaki Kurokawa, Akiyoshi Tsuda, Masami Takigawa, Shin-ichi Hamaguchi, Akio Yamada, Kiichi Sakamoto, Takayuki Nakamura

Proceedings Volume 8701, 870103 (2013) https://doi.org/10.1117/12.2029193

KEYWORDS: Semiconducting wafers, Silicon, Electron beam lithography, Photomasks, Microelectromechanical systems, Photonics, Nanofabrication, Glasses, Vestigial sideband modulation, Electron beams

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Proceedings Article | 28 June 2013 Paper

Paper

Photomask quality evaluation using lithography simulation and multi-detector MVM-SEM

Keisuke Ito, Tsutomu Murakawa, Naoki Fukuda, Soichi Shida, Toshimichi Iwai, Jun Matsumoto, Takayuki Nakamura, Shohei Matsushita, Kazuyuki Hagiwara, Daisuke Hara

Proceedings Volume 8701, 87010A (2013) https://doi.org/10.1117/12.2027201

KEYWORDS: Photomasks, Lithography, Scanning electron microscopy, Semiconducting wafers, 3D image processing, 3D metrology, Defect inspection, Optical inspection, Databases, Inspection

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Proceedings Article | 8 November 2012 Paper

Paper

Photomask quality evaluation using lithography simulation and precision SEM image contour data

Tsutomu Murakawa, Naoki Fukuda, Soichi Shida, Toshimichi Iwai, Jun Matsumoto, Takayuki Nakamura, Kazuyuki Hagiwara, Shohei Matsushita, Daisuke Hara, Anthony Adamov

Proceedings Volume 8522, 852226 (2012) https://doi.org/10.1117/12.964994

KEYWORDS: Photomasks, Lithography, Scanning electron microscopy, Semiconducting wafers, Image quality, Sensors, Signal detection, Databases, 3D metrology, Inspection

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Proceedings Article | 8 November 2012 Paper

Paper

Evaluation of CP shape correction for e-beam writing

Masahiro Takizawa, Keita Bunya, Hideaki Isobe, Hideaki Komami, Kenji Abe, Masaki Kurokawa, Akio Yamada, Kiichi Sakamoto, Takayuki Nakamura, Kazusumi Kuwano, Masahiro Tateishi, Larry Chau

Proceedings Volume 8522, 85222A (2012) https://doi.org/10.1117/12.964985

KEYWORDS: Chromium, Beam shaping, Vestigial sideband modulation, Printing, Manufacturing, Chemical elements, Semiconducting wafers, Photomasks, Scanning electron microscopy, Optical simulations

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Proceedings Article | 30 June 2012 Paper

Paper

New CDSEM technology and its performance for multiple patterning process

Yuta Chihara, Keisuke Ito, Masayuki Kuribara, Toshimichi Iwai, Soichi Shida, Masahiro Seyama, Jun Matsumoto, Takayuki Nakamura

Proceedings Volume 8441, 844109 (2012) https://doi.org/10.1117/12.964404

KEYWORDS: Scanning electron microscopy, Photomasks, Metrology, Electron beam lithography, Line scan image sensors, Electron beams, Lithography, Semiconductors, Capacitance, Absorption

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Proceedings Article | 14 October 2011 Paper

Paper

Addressing 3D metrology challenges by using a multiple detector CDSEM

Mitsuo Hiroyama, Tsutomu Murakawa, Masayuki Kuribara, Toshimichi Iwai, Minoru Soma, Ikuo Iko, Masahiro Seyama, Jun Matsumoto, Takayuki Nakamura, Hidemitsu Hakii, Isao Yonekura, Masashi Kawashita, Yasushi Nishiyama, Keishi Tanaka, Kenji Komoto

Proceedings Volume 8166, 81661R (2011) https://doi.org/10.1117/12.896982

KEYWORDS: Sensors, Signal detection, 3D metrology, Photomasks, Atomic force microscopy, Lithography, Scanning electron microscopy, Image sensors, Edge detection, Extreme ultraviolet

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Proceedings Article | 19 May 2011 Paper

Paper

New CD-SEM metrology method for the side wall angle measurement using multiple detectors

Hiroshi Fukaya, Tsutomu Murakawa, Soichi Shida, Masayuki Kuribara, Toshimichi Iwai, Jun Matsumoto, Takayuki Nakamura, Hidemitsu Hakii, Isao Yonekura, Masashi Kawashita, Yasushi Nishiyama, Keishi Tanaka, Yasutaka Kikuchi

Proceedings Volume 8081, 80810G (2011) https://doi.org/10.1117/12.899368

KEYWORDS: Sensors, Signal detection, Photomasks, Algorithm development, 3D metrology, Polonium, Metrology, Scanning electron microscopy, Electron beams, Detection and tracking algorithms

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Proceedings Article | 20 April 2011 Paper

Paper

Study of the three-dimensional shape measurement for mask patterns using Multiple Detector CD-SEM

Isao Yonekura, Hidemitsu Hakii, Masashi Kawashita, Yasushi Nishiyama, Keishi Tanaka, Yasutaka Kikuchi, Tsutomu Murakawa, Soichi Shida, Masayuki Kuribara, Toshimichi Iwai, Jun Matsumoto, Takayuki Nakamura

Proceedings Volume 7971, 797121 (2011) https://doi.org/10.1117/12.879400

KEYWORDS: Sensors, Atomic force microscopy, Signal detection, Photomasks, Etching, 3D metrology, Tantalum, Critical dimension metrology, Scanning electron microscopy, Extreme ultraviolet

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Proceedings Article | 25 September 2010 Paper

Paper

A new CDSEM metrology method for thin film hardmasks patterns using multiple detectors

Sumito Harada, Yuta Chihara, Motoji Hirano, Toshi Iwai, Masayuki Kuribara, Ikuo Iko, Masahiro Seyama, Jun Matsumoto, Takayuki Nakamura

Proceedings Volume 7823, 78233H (2010) https://doi.org/10.1117/12.864171

KEYWORDS: Sensors, Thin films, Detection and tracking algorithms, Algorithm development, Metrology, Double patterning technology, Electron beams, Scanning electron microscopy, Photomasks, Binary data

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Proceedings Article | 27 May 2010 Paper

Paper

The large contour data generation from divided image of photomask pattern of 32 nm and beyond

Tsutomu Murakawa, Yoshiaki Ogiso, Toshimichi Iwai, Jun Matsumoto, Takayuki Nakamura

Proceedings Volume 7748, 77481A (2010) https://doi.org/10.1117/12.866056

KEYWORDS: Scanning electron microscopy, Photomasks, Optical proximity correction, Semiconducting wafers, Data acquisition, Data conversion, Imaging arrays, Data modeling, Algorithm development, Distortion

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Proceedings Article | 23 September 2009 Paper

Paper

A study of contour image comparison measurement for photomask patterns of 32 nm and beyond

Isao Yonekura, Hidemitsu Hakii, Keishi Tanaka, Masaru Higuchi, Yoshiaki Ogiso, Toshihide Oba, Toshimichi Iwai, Jun Matsumoto, Takayuki Nakamura

Proceedings Volume 7488, 748831 (2009) https://doi.org/10.1117/12.833405

KEYWORDS: Photomasks, Distance measurement, Scanning electron microscopy, Cadmium, Critical dimension metrology, Image enhancement, Printing, Semiconducting wafers, Reticles, Software development

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Proceedings Article | 18 March 2009 Paper

Paper

Evaluation of the CD-SEM Vistec LWM90xx for line-width measurement of nanoimprint templates

Marcus Pritschow, Joerg Butschke, Mathias Irmscher, Lidia Parisoli, Toshihide Oba, Toshimichi Iwai, Takayuki Nakamura

Proceedings Volume 7271, 72711U (2009) https://doi.org/10.1117/12.814161

KEYWORDS: Quartz, Scanning electron microscopy, Photomasks, Contamination, Process control, Optical lithography, Nanoimprint lithography, Etching, Control systems, Metrology

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Proceedings Article | 17 October 2008 Paper

Paper

A study of the limited area scanning system in the mask CD-SEM

Toshi Iwai, Soichi Shida, Mitsuo Hiroyama, Takayuki Nakamura, Hisaya Sakaguchi, Hiroki Ueno, Masaru Higuchi, Tatsuya Aihara

Proceedings Volume 7122, 71222R (2008) https://doi.org/10.1117/12.801418

KEYWORDS: Scanning electron microscopy, Photomasks, Critical dimension metrology, Electron beams, Metrology, Electron microscopes, Process control, OLE for process control, Image resolution, Beam controllers

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Proceedings Article | 30 October 2007 Paper

Paper

2D measurement using CD SEM for arbitrarily shaped patterns

Hyung-Joo Lee, So-Yoon Bae, Dong-Hoon Chung, Sang-Gyun Woo, HanKu Cho, Jun Matsumoto, Takayuki Nakamura, Dong Il Shin, TaeJun Kim

Proceedings Volume 6730, 673037 (2007) https://doi.org/10.1117/12.746453

KEYWORDS: Critical dimension metrology, Photomasks, Scanning electron microscopy, Semiconducting wafers, Resolution enhancement technologies, Edge detection, Semiconductors, Optical metrology, Detection and tracking algorithms, Lithography

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Proceedings Article | 6 December 2004 Paper

Paper

Reticle CD-SEM for 65-nm technology node and beyond

Gerhard Schlueter, Takayuki Nakamura, Jun Matsumoto, Masahiro Seyama, John Whittey

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.568270

KEYWORDS: Contamination, Photomasks, Scanning electron microscopy, Critical dimension metrology, Opacity, Reticles, Manufacturing, Microsystems, Electron beams, Metrology

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Showing 5 of 22 publications

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