Prof. Takeshi Fujino
at Ritsumeikan Univ
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 20 May 2006 Paper
Yoshihiko Kajiya, Akihiro Nakamura, Masaya Yoshikawa, Takeshi Fujino
Proceedings Volume 6283, 62832M (2006) https://doi.org/10.1117/12.681798
KEYWORDS: Logic, Electron beam direct write lithography, Lithography, Photomasks, Electron beams, Mirrors, Very large scale integration, Electron beam lithography, Statistical analysis, Fabrication

Proceedings Article | 28 June 2005 Paper
Takeshi Fujino, Yoshihiko Kajiya, Masaya Yoshikawa
Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617427
KEYWORDS: Photomasks, Logic, Multiplexers, Lithography, Standards development, Field programmable gate arrays, System on a chip, Optical lithography, Digital electronics, Metals

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