Mr. Tetsuya Oshino Profile

Tetsuya Oshino

at Nikon Corp

SPIE Involvement:

Author

Publications (26)

Proceedings Article | 23 March 2012 Paper

Paper

Development of EUV lithography tool technologies at Nikon

Katsuhiko Murakami, Tetsuya Oshino, Hiroyuki Kondo, Hiroshi Chiba, Yoshio Kawabe, Takuro Ono, Noriaki Kandaka, Atsushi Yamazaki, Takashi Yamaguchi, Ryo Shibata, Masayuki Shiraishi

Proceedings Volume 8322, 832215 (2012) https://doi.org/10.1117/12.917676

KEYWORDS: Extreme ultraviolet lithography, Mirrors, Contamination, Extreme ultraviolet, Multilayers, Reflectivity, Carbon, Silicon, Apodization, Oxidation

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Proceedings Article | 6 April 2011 Paper

Paper

A simple modeling of carbon contamination on EUV exposure tools based on contamination experiments with synchrotron source

M. Shiraishi, T. Yamaguchi, A. Yamazaki, N. Kandaka, T. Oshino, K. Murakami

Proceedings Volume 7969, 79690N (2011) https://doi.org/10.1117/12.879392

KEYWORDS: Contamination, Extreme ultraviolet, Oxygen, Photons, Carbon, Mirrors, Reflectivity, Protactinium, Molecules, Chemical species

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Proceedings Article | 5 April 2011 Paper

Paper

Development of EUV lithography tools at Nikon

Katsuhiko Murakami, Tetsuya Oshino, Hiroyuki Kondo, Hiroshi Chiba, Kazushi Nomura, Hidemi Kawai, Yoshiaki Kohama, Kenji Morita, Kazunari Hada, Yukiharu Ohkubo

Proceedings Volume 7969, 79690P (2011) https://doi.org/10.1117/12.879305

KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Contamination, Mirrors, Carbon, Synchrotrons, Wavefront metrology, Oxygen, Optical design, Transmittance

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Proceedings Article | 23 March 2010 Paper

Paper

Flare modeling and calculation on EUV optics

M. Shiraishi, T. Oshino, K. Murakami, H. Chiba

Proceedings Volume 7636, 763629 (2010) https://doi.org/10.1117/12.846472

KEYWORDS: Point spread functions, Mirrors, Semiconducting wafers, Light scattering, Multilayers, Extreme ultraviolet, Surface roughness, Wafer-level optics, Spatial frequencies, Reflectivity

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SPIE Journal Paper | 1 October 2009

Development progress of optics for extreme ultraviolet lithography at Nikon

Katsuhiko Murakami, Tetsuya Oshino, Hiroyuki Kondo, Masayuki Shiraishi, Hiroshi Chiba, Hideki Komatsuda, Kazushi Nomura, Jin Nishikawa

JM3, Vol. 8, Issue 04, 041507, (October 2009) https://doi.org/10.1117/12.10.1117/1.3238522

KEYWORDS: Projection systems, Extreme ultraviolet lithography, Mirrors, Extreme ultraviolet, Wavefronts, EUV optics, Resolution enhancement technologies, Multilayers, Reflectivity, Lithographic illumination

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Proceedings Article | 18 March 2009 Paper

Paper

Development progress of optics for EUVL at Nikon

Katsuhiko Murakami, Tetsuya Oshino, Hiroyuki Kondo, Masayuki Shiraishi, Hiroshi Chiba, Hideki Komatsuda, Kazushi Nomura, Jin Nishikawa

Proceedings Volume 7271, 72711Z (2009) https://doi.org/10.1117/12.813638

KEYWORDS: Projection systems, Mirrors, Extreme ultraviolet lithography, Extreme ultraviolet, Wavefronts, Eye, Resolution enhancement technologies, Reflectivity, Polishing, Aspheric optics

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Proceedings Article | 4 December 2008 Paper

Paper

Development of EUV lithography tools at Nikon

Katsuhiko Murakami, Tetsuya Oshino, Hiroyuki Kondo, Hiroshi Chiba, Kazushi Nomura, Hidemi Kawai, Yoshiaki Kohama, Kenji Morita, Kazunari Hada, Yukiharu Ohkubo, Takaharu Miura

Proceedings Volume 7140, 71401C (2008) https://doi.org/10.1117/12.804706

KEYWORDS: Projection systems, Extreme ultraviolet lithography, Mirrors, Extreme ultraviolet, Wavefronts, Lithography, Polishing, Aspheric optics, Multilayers, Optical design

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Proceedings Article | 20 March 2008 Paper

Paper

Development status of projection optics and illumination optics for EUV1

Katsuhiko Murakami, Tetsuya Oshino, Hiroyuki Kondo, Hiroshi Chiba, Hideki Komatsuda, Kazushi Nomura, Hiromitsu Iwata

Proceedings Volume 6921, 69210Q (2008) https://doi.org/10.1117/12.772435

KEYWORDS: Projection systems, Mirrors, Wavefronts, Polishing, Extreme ultraviolet, Point spread functions, Multilayers, Optical coatings, Extreme ultraviolet lithography, Reflection

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Proceedings Article | 15 March 2007 Paper

Paper

Development of optics for EUV lithography tools

Katsuhiko Murakami, Tetsuya Oshino, Hiroyuki Kondo, Hiroshi Chiba, Hideki Komatsuda, Kazushi Nomura, Hiromitsu Iwata

Proceedings Volume 6517, 65170J (2007) https://doi.org/10.1117/12.711738

KEYWORDS: Mirrors, Projection systems, Coating, Polishing, Eye, Wavefronts, Extreme ultraviolet lithography, Multilayers, Aspheric optics, Wavefront metrology

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Proceedings Article | 6 May 2005 Paper

Paper

Lithographic performance of high-numerical-aperture (NA=0.3) EUV small-field exposure tool (HINA)

H. Oizumi, Y. Tanaka, F. Kumasaka, I. Nishiyama, H. Kondo, M. Shiraishi, T. Oshino, K. Sugisaki, K. Murakami

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599435

KEYWORDS: Extreme ultraviolet lithography, Lithography, Photomasks, Projection systems, Mirrors, Lithographic illumination, Light sources, Printing, Extreme ultraviolet, Spherical lenses

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Proceedings Article | 18 October 2004 Paper

Paper

Fabrication of aspherical mirrors for EUV projection optics set-3 of HiNA

Tetsuya Oshino, Shin-ichi Takahashi, Takahiro Yamamoto, Tatsuro Miyoshi, Masayuki Shiraishi, Takaharu Komiya, Noriaki Kandaka, Hiroyuki Kondo, Kiyoto Mashima, Kazushi Nomura, Katsuhiko Murakami, Hiroaki Oizumi, Iwao Nishiyama, Shinji Okazaki

Proceedings Volume 5533, (2004) https://doi.org/10.1117/12.559210

KEYWORDS: Mirrors, Wavefronts, Projection systems, Polishing, Semiconducting wafers, Extreme ultraviolet lithography, Spatial frequencies, Photomasks, Coating, Mirror mounts

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Proceedings Article | 20 May 2004 Paper

Paper

Fabrication of aspherical mirrors for HiNA (high numerical aperture EUV exposure tool) set-3 projection optics

Tetsuya Oshino, Takahiro Yamamoto, Tatsuro Miyoshi, Masayuki Shiraishi, Takaharu Komiya, Noriaki Kandaka, Hiroyuki Kondo, Kiyoto Mashima, Kazushi Nomura, Katsuhiko Murakami, Hiroaki Oizumi, Isa Nishiyama, Shinji Okazaki

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.562365

KEYWORDS: Mirrors, Wavefronts, Projection systems, Spatial frequencies, Semiconducting wafers, Polishing, Extreme ultraviolet lithography, Photomasks, Mirror mounts, Reflectivity

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Proceedings Article | 16 June 2003 Paper

Paper

Development of illumination optics and projection optics for high-NA EUV exposure tool (HiNA)

Tetsuya Oshino, Masayuki Shiraishi, Noriaki Kandaka, Katsumi Sugisaki, Hiroyuki Kondo, Kazuya Ota, K. Mashima, Katsuhiko Murakami, Hiroaki Oizumi, Iwao Nishiyama, Shinji Okazaki

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484936

KEYWORDS: Mirrors, Projection systems, Wavefronts, Extreme ultraviolet lithography, Spherical lenses, Metals, Mirror mounts, Optical components, Lithographic illumination, Photography

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Proceedings Article | 16 June 2003 Paper

Paper

Development of an experimental EUV interferometer for benchmarking several EUV wavefront metrology schemes

Katsuhiko Murakami, Jun Saito, Kazuya Ota, Hiroyuki Kondo, Mikihiko Ishii, Jun Kawakami, Tetsuya Oshino, Katsumi Sugisaki, Yucong Zhu, Masanobu Hasegawa, Yoshiyuki Sekine, Seiji Takeuchi, Chidane Ouchi, Osamu Kakuchi, Yutaka Watanabe, Takayuki Hasegawa, Shinichi Hara, Akiyoshi Suzuki

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484935

KEYWORDS: Extreme ultraviolet, Wavefront metrology, Wavefronts, Optical testing, Interferometers, Shearing interferometers, Diffraction, Mirrors, Extreme ultraviolet lithography, Diffraction gratings

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Proceedings Article | 1 July 2002 Paper

Paper

Effect of argon and non-argon ion impingement on the stress reduction of multilayers for extreme-ultraviolet lithography

Masayuki Shiraishi, Wakana Ishiyama, Noriaki Kandaka, Tetsuya Oshino, Katsuhiko Murakami

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472329

KEYWORDS: Molybdenum, Silicon, Argon, Chemical species, Sputter deposition, Ions, Oxides, Ion beams, Oxygen, Extreme ultraviolet lithography

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Proceedings Article | 20 August 2001 Paper

Paper

In-situ stress measurement of molybdenum/silicon multilayers and low-stress multilayers for extreme-ultraviolet lithography

Masayuki Shiraishi, Wakana Ishiyama, Noriaki Kandaka, Tetsuya Oshino, Katsuhiko Murakami

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436713

KEYWORDS: Molybdenum, Silicon, Capacitance, Capacitors, Multilayers, Electrodes, Sputter deposition, Extreme ultraviolet lithography, Ion beams, Semiconducting wafers

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Proceedings Article | 20 August 2001 Paper

Paper

Feasibility study of EUV scanners

Kazuya Ota, Katsuhiko Murakami, Hiroyuki Kondo, Tetsuya Oshino, Katsumi Sugisaki, Hideki Komatsuda

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436704

KEYWORDS: Semiconducting wafers, Scanners, Mirrors, Reticles, Extreme ultraviolet lithography, Optical alignment, Sensors, Projection systems, Deep ultraviolet, Extreme ultraviolet

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Proceedings Article | 20 August 2001 Paper

Paper

Development of an EUV reflectometer using a single line emission from a laser-plasma x-ray source

Noriaki Kandaka, Hiroyuki Kondo, Katsumi Sugisaki, Tetsuya Oshino, Masayuki Shiraishi, Wakana Ishiyama, Katsuhiko Murakami

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436714

KEYWORDS: Extreme ultraviolet, Mirrors, Reflectivity, Carbon dioxide lasers, Reflectometry, Multilayers, Carbon dioxide, Interfaces, Plasma, Beryllium

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Proceedings Article | 2 November 2000 Paper

Paper

Development of an EUV reflectometer using a laser plasma x-ray source

Hiroyuki Kondo, Noriaki Kandaka, Katsumi Sugisaki, Tetsuya Oshino, Masayuki Shiraishi, Wakana Ishiyama, Katsuhiko Murakami

Proceedings Volume 4144, (2000) https://doi.org/10.1117/12.405906

KEYWORDS: Reflectometry, Mirrors, Reflectivity, X-rays, X-ray sources, Plasma, Carbon dioxide, Multilayers, Extreme ultraviolet, Carbon dioxide lasers

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Proceedings Article | 21 July 2000 Paper

Paper

Stress reduction of molybdenum/silicon multilayers deposited by ion-beam sputtering

Masayuki Shiraishi, Wakana Ishiyama, Tetsuya Oshino, Katsuhiko Murakami

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390102

KEYWORDS: Multilayers, Ion beams, Polishing, Interfaces, Sputter deposition, Reflectivity, Mirrors, Molybdenum, Argon, Extreme ultraviolet lithography

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Proceedings Article | 21 July 2000 Paper

Paper

Recent advances of three-aspherical-mirror system for EUVL

Hiroo Kinoshita, Takeo Watanabe, Yanqiu Li, Atsushi Miyafuji, Tetsuya Oshino, Katsumi Sugisaki, Katsuhiko Murakami, Shigeo Irie, Shigeru Shirayone, Shinji Okazaki

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390091

KEYWORDS: Mirrors, Extreme ultraviolet lithography, Interferometers, Multilayers, Optical alignment, Phase shifts, Reflectivity, Wavefronts, Coating, Imaging systems

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Proceedings Article | 21 July 2000 Paper

Paper

Assembly and alignment of three-aspherical-mirror optics for extreme ultraviolet projection lithography

Katsumi Sugisaki, Tetsuya Oshino, Katsuhiko Murakami, Takeo Watanabe, Hiroo Kinoshita, Atsushi Miyafuji, Shigeo Irie, Shigeru Shirayone

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390114

KEYWORDS: Mirrors, Optical alignment, Extreme ultraviolet, Projection systems, Extreme ultraviolet lithography, Wavefronts, Tolerancing, Assembly tolerances, Monochromatic aberrations, Multilayers

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Proceedings Article | 21 July 2000 Paper

Paper

Development for the alignment procedure of three-aspherical mirror optics

Shigeo Irie, Takeo Watanabe, Hiroo Kinoshita, Atsushi Miyafuji, Katsumi Sugisaki, Tetsuya Oshino, Katsuhiko Murakami

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390122

KEYWORDS: Mirrors, Alignment procedures, NOx, Tolerancing, Extreme ultraviolet lithography, Optical alignment, Interferometers, Ray tracing, Monochromatic aberrations, Geometrical optics

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Proceedings Article | 5 June 1998 Paper

Paper

Three-aspherical-mirror system for EUV lithography

Hiroo Kinoshita, Takeo Watanabe, Masahito Niibe, Masaaki Ito, H. Oizumi, Hiromasa Yamanashi, Katsuhiko Murakami, Tetsuya Oshino, Yuriy Platonov, Nicola Grupido

Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309580

KEYWORDS: Semiconducting wafers, Wafer-level optics, Photomasks, Optical alignment, Mirrors, Extreme ultraviolet lithography, Synchrotron radiation, Tolerancing, Assembly tolerances, Optical design

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Proceedings Article | 11 July 1997 Paper

Paper

Development of multilayer mirrors for the XUV Doppler telescope

Shin'ichi Nagata, Hirohisa Hara, Taro Sakao, Toshifumi Shimizu, Saku Tsuneta, Tsuyoshi Yoshida, Wakana Ishiyama, Katsuhiko Murakami, Tetsuya Oshino

Proceedings Volume 3113, (1997) https://doi.org/10.1117/12.278847

KEYWORDS: Mirrors, Reflectivity, Multilayers, Extreme ultraviolet, Doppler effect, Photomasks, Telescopes, Plasma, Silicon, Space telescopes

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Proceedings Article | 21 January 1993 Paper

Paper

Characterization of molybdenum/silicon multilayers deposited by ion beam sputtering and rf magnetron sputtering

Katsuhiko Murakami, Hiroshi Nakamura, Tetsuya Oshino, Masayuki Ohtani, Hiroshi Nagata

Proceedings Volume 1742, (1993) https://doi.org/10.1117/12.140572

KEYWORDS: Silicon, Reflectivity, Molybdenum, Sputter deposition, X-rays, Ion beams, Interfaces, Transmission electron microscopy, Chemical species, Analytical research

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Showing 5 of 26 publications

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