Dr. Thomas Schnattinger Profile

Dr. Thomas Schnattinger

at Fraunhofer IISB

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 19 May 2008 Paper

Increasing the predictability of AIMS measurements by coupling to resist simulations

Balint Meliorisz, Andreas Erdmann, Thomas Schnattinger, Ulrich Ströβner, Thomas Scherübl, Peter De Bisschop, Vicky Philipsen

Proceedings Volume 7028, 70282S (2008) https://doi.org/10.1117/12.793098

KEYWORDS: Semiconducting wafers, Photoresist materials, Data modeling, Photomasks, Scanners, Diffusion, Lithography, Photoresist processing, Calibration, Photoresist developing

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Proceedings Article | 1 April 2008 Paper

Rigorous electromagnetic field simulation of two-beam interference exposures for the exploration of double patterning and double exposure scenarios

Andreas Erdmann, Peter Evanschitzky, Tim Fühner, Thomas Schnattinger, Cheng-Bai Xu, Chuck Szmanda

Proceedings Volume 6924, 692452 (2008) https://doi.org/10.1117/12.772741

KEYWORDS: Semiconducting wafers, Lithography, Refractive index, Double patterning technology, Photomasks, Computer simulations, Optical properties, Photoresist processing, Nonlinear optics, Superposition

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Proceedings Article | 26 March 2008 Paper

A comprehensive resist model for the prediction of line-edge roughness material and process dependencies in optical lithography

Thomas Schnattinger, Andreas Erdmann

Proceedings Volume 6923, 69230R (2008) https://doi.org/10.1117/12.772507

KEYWORDS: Line edge roughness, Polymers, Diffusion, Molecules, Materials processing, Photoresist processing, Stochastic processes, Monte Carlo methods, Image quality, Projection systems

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Proceedings Article | 27 March 2007 Paper

Dr.LiTHO: a development and research lithography simulator

Tim Fühner, Thomas Schnattinger, Gheorghe Ardelean, Andreas Erdmann

Proceedings Volume 6520, 65203F (2007) https://doi.org/10.1117/12.709535

KEYWORDS: Visualization, Lithography, Data modeling, Human-machine interfaces, Computer programming, Computer simulations, Computer programming languages, C++, Data conversion, Photoresist materials

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Proceedings Article | 2 November 2004 Paper

Genetic algorithms for geometry optimization in lithographic imaging systems

Tim Fuehner, Andreas Erdmann, Thomas Schnattinger

Proceedings Volume 5558, (2004) https://doi.org/10.1117/12.560085

KEYWORDS: Photomasks, Genetic algorithms, Optimization (mathematics), Manufacturing, Lithography, Critical dimension metrology, Imaging systems, Lithographic illumination, Binary data, Resolution enhancement technologies

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Proceedings Article | 28 May 2004 Paper

Toward automatic mask and source optimization for optical lithography

Andreas Erdmann, Tim Fuehner, Thomas Schnattinger, Bernd Tollkuehn

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.533215

KEYWORDS: Photomasks, Lithography, Optimization (mathematics), Critical dimension metrology, Genetic algorithms, Manufacturing, Binary data, Resolution enhancement technologies, Optical lithography, Lithographic illumination

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Showing 5 of 6 publications

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