Dr. Tim Fühner
at
SPIE Involvement:
Author
Area of Expertise:
computational lithography , artificial intelligence , optimization
Publications (35)

PROCEEDINGS ARTICLE | March 23, 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Image segmentation, Interfaces, Manufacturing, Electroluminescence, Bridges, Photomasks, Directed self assembly, Critical dimension metrology, Optimization (mathematics)

PROCEEDINGS ARTICLE | March 31, 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Lithography, Polymethylmethacrylate, Cadmium, Polymers, Interfaces, Computer simulations, Monte Carlo methods, Directed self assembly, Molecular interactions, Critical dimension metrology

SPIE Journal Paper | December 2, 2013
JM3 Vol. 13 Issue 01
KEYWORDS: Photomasks, Diffraction, Artificial neural networks, Data modeling, Optical lithography, Systems modeling, Lithography, Polarization, Neurons, Optical simulations

PROCEEDINGS ARTICLE | May 22, 2013
Proc. SPIE. 8789, Modeling Aspects in Optical Metrology IV
KEYWORDS: Lithography, Nanostructures, Monochromatic aberrations, Lithographic illumination, Defect detection, 3D modeling, Projection systems, Photomasks, Integrated optics, Optics manufacturing

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Diffraction, Optical lithography, Data modeling, Imaging systems, Artificial neural networks, Photomasks, Optical simulations, Performance modeling, Systems modeling

PROCEEDINGS ARTICLE | April 1, 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Lithography, Multilayers, Silicon, Photomasks, Extreme ultraviolet, Optical proximity correction, Nanoimprint lithography, Molybdenum, Binary data, Image quality standards

Showing 5 of 35 publications
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