Dr. Tina Clausnitzer Profile

Dr. Tina Clausnitzer

Researcher at Friedrich-Schiller-Univ Jena

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Author

Publications (14)

Proceedings Article | 25 February 2008 Paper

Spectral combining of pulsed fiber lasers: scaling considerations

O. Schmidt, S. Klingebiel, B. Ortac, F. Röser, F. Brückner, T. Clausnitzer, E.-B. Kley, J. Limpert, A. Tünnermann

Proceedings Volume 6873, 687317 (2008) https://doi.org/10.1117/12.763580

KEYWORDS: Fiber amplifiers, Pulsed fiber lasers, Fiber lasers, Diffraction gratings, Diffraction, Laser systems engineering, Semiconductor lasers, Optical amplifiers, Dielectrics, Modulation

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Proceedings Article | 6 February 2008 Paper

100% reflectivity from a monolithic dielectric microstructured surface

Frank Brückner, Tina Clausnitzer, Oliver Burmeister, Daniel Friedrich, Ernst-Bernhard Kley, Karsten Danzmann, Andreas Tünnermann, Roman Schnabel

Proceedings Volume 6883, 68830X (2008) https://doi.org/10.1117/12.767775

KEYWORDS: Reflectivity, Diffraction gratings, Mirrors, Waveguides, Dielectrics, Diffraction, Tolerancing, Silicon, Reflection, Coating

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Proceedings Article | 6 February 2008 Paper

Highly dispersive dielectric transmission gratings with 100% diffraction efficiency

Tina Clausnitzer, Thomas Kämpfe, Frank Brückner, Roland Heinze, Ernst-Bernhard Kley, Andreas Tünnermann, Olivier Parriaux, Alexandre Tishchenko

Proceedings Volume 6883, 68830U (2008) https://doi.org/10.1117/12.767783

KEYWORDS: Diffraction gratings, Diffraction, Reflection, Interfaces, Silica, Reflectivity, Dielectrics, Coating, Optical design, Antireflective coatings

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Proceedings Article | 20 October 2005 Paper

Near-field holography with a two-dimensional phase mask for fabrication of two-dimensional structures in a single exposure step

H. Hartung, T. Clausnitzer, E.-B. Kley, A. Tünnermann

Proceedings Volume 5965, 596505 (2005) https://doi.org/10.1117/12.625105

KEYWORDS: Photomasks, Diffraction, Holography, Near field, Scanning electron microscopy, Polarization, Electron beam lithography, Wave propagation, Lithography, Free space

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Proceedings Article | 15 October 2005 Paper

High-efficiency transmission gratings for unpolarized illumination: an intelligible analysis of the diffraction process

T. Clausnitzer, T. Kämpfe, E.-B. Kley, A. Tuennermann, U. Peschel, A. Tishchenko, O. Parriaux

Proceedings Volume 5962, 596219 (2005) https://doi.org/10.1117/12.625170

KEYWORDS: Diffraction gratings, Diffraction, Wave propagation, Light wave propagation, Polarization, Waveguides, Silica, Dielectrics, Optical design, Geometrical optics

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Proceedings Article | 28 September 2005 Paper

Elongated gold nanostructures in silica for metamaterials: Technology and optical properties

F. Garwe, U. Huebner, T. Clausnitzer, E.-B. Kley, U. Bauerschaefer

Proceedings Volume 5955, 59550T (2005) https://doi.org/10.1117/12.626854

KEYWORDS: Gold, Glasses, Magnetism, Nanostructures, Metamaterials, Infrared radiation, Metals, Optical properties, Nanowires, Nanorods

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Proceedings Article | 20 August 2005 Paper

Low-loss gratings for next-generation gravitational wave detectors

T. Clausnitzer, E.-B. Kley, A. Tuennermann, A. Bunkowski, O. Burmeister, K. Danzmann, R. Schnabel, A. Duparre, S. Gliech

Proceedings Volume 5870, 58700J (2005) https://doi.org/10.1117/12.617334

KEYWORDS: Diffraction gratings, Diffraction, Scattering, Coating, Reflectivity, Mirrors, Dielectrics, Silica, Sensors, Scatter measurement

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Proceedings Article | 21 March 2005 Paper

Highly efficient dielectric gratings for high-power ultrafast femtosecond fiber laser systems

T. Clausnitzer, Thomas Schreiber, Fabian Roeser, Jens Limpert, H.-J. Fuchs, Ernst-Bernhard Kley, Andreas Tunnermann

Proceedings Volume 5714, (2005) https://doi.org/10.1117/12.590461

KEYWORDS: Diffraction gratings, Diffraction, Cladding, Dielectrics, Fiber amplifiers, Silica, Femtosecond phenomena, Photonic crystal fibers, Fiber lasers, Laser systems engineering

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Micromachining applications require high pulse energy (>1μJ) short pulse (<1ps) laser systems at high repetition rates. Rare-earth doped fibers are attractive to generate these target values by the amplification of ultrafast femtosecond seed sources. Two favored techniques have been used: the chirped pulse amplification (CPA) scheme where the pulses are stretched in the time domain to reduce nonlinearity in the amplifier stage and the parabolic pulse amplification scheme where the combined effect of nonlinearity, normal dispersion and gain in the fiber generate linearly chirped parabolic shaped pulses. Both approaches can be scaled to higher power by reducing the nonlinearity in the amplifiers. To achieve this, we discuss novel photonic crystal fiber designs which allow for larger single-mode core diameter and reduced absorption length and therefore reduced nonlinearity. The so generated high average power of >100 W at repetition rate up to several tens of MHz cannot be compressed by gold gratings to femtosecond pulse duration due to thermal heating. We focus on the development of dielectric gratings in fused silica which can handle this power levels due to their high damage threshold. Two kinds of gratings are discussed. Firstly, the transmission gratings with a period of 800 nm were designed to possess 96% diffraction efficiency over a spectral range from 1.03μm to 1.09μm. The fabrication of the rectangular groove profile was done using electron beam lithography and reactive ion beam etching into the fused silica substrate. The measured diffraction efficiency was 96.5% @ 1060nm. Secondly, dielectric reflection gratings, which consist of a dielectric grating on top of a high-reflective layerstack, can theoretically exhibit a diffraction efficiency of even higher than 99%. To achieve this we chose a period of 1060nm. The fabrication was done similar to the transmission gratings, though a HR-coated substrate had to be used instead of the simple fused substrate. The fabricated gratings show a diffraction efficiency of 99.6%. Both are applied to the discussed high power fiber amplifier stages to generate linearly polarized femtosecond pulses at ~100 W average power with a repetition rate of 80 MHz.

Proceedings Article | 7 February 2005 Paper

High efficiency in beam splitters fabricated over thin film stacks

Henna Elfstrom, Tuomas Vallius, Markku Kuittinen, Tina Clausnitzer, Ernst-Bernhard Kley

Proceedings Volume 5636, (2005) https://doi.org/10.1117/12.576785

KEYWORDS: Diffraction gratings, Diffraction, Antireflective coatings, Thin films, Beam splitters, Coating, Refractive index, Silicon, Silica, Titanium dioxide

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Proceedings Article | 26 February 2004 Paper

Highly efficient polarization-independent transmission gratings for pulse stretching and compression

Tina Clausnitzer, Ernst-Bernhard Kley, Hans-Joerg Fuchs, Andreas Tuennermann

Proceedings Volume 5252, (2004) https://doi.org/10.1117/12.514182

KEYWORDS: Diffraction gratings, Diffraction, Etching, Silica, Dielectric polarization, Polarization, Chromium, Optical design, Beam splitters, Dielectrics

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Proceedings Article | 29 December 2003 Paper

E-beam lithography and optical near-field lithography: new prospects in fabrication of various grating structures

Ernst-Bernhard Kley, Tina Clausnitzer

Proceedings Volume 5184, (2003) https://doi.org/10.1117/12.504583

KEYWORDS: Photomasks, Near field optics, Electron beam lithography, Holography, Binary data, Lithography, Diffraction gratings, Eye, Optical components, Antireflective coatings

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Proceedings Article | 3 November 2003 Paper

Polarizing metal stripe gratings for a micro-optical polarimeter

Tina Clausnitzer, Hans-Joerg Fuchs, Ernst-Bernhard Kley, Andreas Tuennermann, Uwe Zeitner

Proceedings Volume 5183, (2003) https://doi.org/10.1117/12.507283

KEYWORDS: Polarization, Chromium, Polarimetry, Metals, Polarizers, Silica, Etching, Refractive index, Coating, Lithography

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Proceedings Article | 3 November 2003 Paper

Alternative method of gray-tone lithography with potential for the fabrication of combined continuous 3D surface profiles and subwavelength structures

Lars-Christian Wittig, Tina Clausnitzer, Ernst-Bernhard Kley, Andreas Tuennermann

Proceedings Volume 5183, (2003) https://doi.org/10.1117/12.508492

KEYWORDS: Lithography, Photomasks, Calibration, Photoresist materials, Prisms, Optical lithography, Absorption, Photoresist developing, Optical components, Picture Archiving and Communication System

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Proceedings Article | 6 October 2000 Paper

Large-area gratings fabricated by ultrafast e-beam writing

Ernst-Bernhard Kley, T. Clausnitzer, Matthias Cumme, Karsten Zoellner, Bernd Schnabel, A. Stich

Proceedings Volume 4231, (2000) https://doi.org/10.1117/12.402775

KEYWORDS: Binary data, Diffraction gratings, Wavefronts, Error analysis, Chromium, Photoresist processing, Etching, Electron beam lithography, Beam shaping, Diffraction

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Showing 5 of 14 publications

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