Mr. Tito Dutta Chowdhury Profile

Tito Dutta Chowdhury

Principal Engineer

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Publications (3)

Proceedings Article | 29 April 2004 Paper

Propagation of APC models across product boundaries

Tito Chowdhury, Mark Freeland, Ole Krogh, Geethakrishnan Narasimhan, Gayathri Raghavendra

Proceedings Volume 5378, (2004) https://doi.org/10.1117/12.536454

KEYWORDS: Etching, Instrument modeling, Performance modeling, Semiconducting wafers, Process modeling, Process control, Calibration, Data modeling, Semiconductors, Photomasks

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Proceedings Article | 12 June 2003 Paper

Line-edge roughness reduction for advanced metal gate etch with 193-nm lithography in a silicon decoupled plasma source etcher (DPSII)

Tito Chowdhury, Hanna Bamnolker, Roni Khen, Chan-Lon Yang, Hean-Cheal Lee, Yan Du, Meihua Shen, Jinhan Choi, Shashank Deshmukh

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485151

KEYWORDS: Line edge roughness, Etching, Chemistry, Polymers, Plasma etching, Plasma, Critical dimension metrology, Photomasks, Photoresist processing, Semiconducting wafers

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Proceedings Article | 2 June 2003 Paper

Gate etch process control

Ole Krogh, Mark Freeland, Ron Mori, Tito Chowdhury

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.483671

KEYWORDS: Etching, Semiconducting wafers, Process control, Photomasks, Process modeling, Chromium, Semiconductors, Metals, Critical dimension metrology, Lithography

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