KEYWORDS: Algorithm development, Data storage, Data modeling, Detection and tracking algorithms, Computing systems, Machine learning, Data acquisition, Artificial intelligence
Any program tasked with the evaluation and acquisition of algorithms for use in deployed scenarios must have an impartial, repeatable, and auditable means of benchmarking both candidate and fielded algorithms. Success in this endeavor requires a body of representative sensor data, data labels indicating the proper algorithmic response to the data as adjudicated by subject matter experts, a means of executing algorithms under review against the data, and the ability to automatically score and report algorithm performance. Each of these capabilities should be constructed in support of program and mission goals. By curating and maintaining data, labels, tests, and scoring methodology, a program can understand and continually improve the relationship between benchmarked and fielded performance of acquired algorithms. A system supporting these program needs, deployed in an environment with sufficient computational power and necessary security controls is a powerful tool for ensuring due diligence in evaluation and acquisition of mission critical algorithms. This paper describes the Seascape system and its place in such a process.
The Space Shuttle Program requires on-orbit inspection of the thermal protection system which covers the Orbiter spacecraft, including the critical leading-edge surfaces. A scannerless ladar system mounted on a 50-foot boom extension of the robotic arm provides this capability. This paper describes the sensor and ground processing system, which were developed by Sandia National Laboratories to meet the requirements of the Return to Flight mission in July of 2005. Mission operations for this sensor system are also reviewed.
Scatterometry is an optical measurement technology based on the analysis of light scattered, or diffracted, from a periodic array of features. It is not an optical imaging technique, but rather a model based metrology that determines measurement results by comparing measured light scatter against a model of theoretical scatter signatures. Angular scatterometers in particular function by scanning the features to be measured through a range of incident angles, and measuring the light scattered into the zeroth, or specular, diffraction order. Prior work in angular scatterometry used the technique for the measurement of line profiles in resist and etched materials. In this work applications of scatterometry for the measurement of asymmetric line profiles (unequal sidewall angles, for example) are presented. Beginning with simulated results form the theoretical model, the importance of measuring through complementary (positive and negative) angles of incidence will be demonstrated. Then, actual measurement data from three different sample sets will be presented. The results show that the method has good sensitivity for measuring line asymmetry, and can therefore be used for qualifying processes for which symmetric results might be desired, such as lithography and etch processing.
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