Reducing metrology fleet variation through improved matching techniques is a never-ending journey. In exceeding
vendor specifications, CD-SEM matching of < 1nm were demonstrated between two tools. Details and methods are
discussed, including FOV Factor matching, automated SEM tuning, new qual sampling plans (termed 5x5x5), and a 1st
difference monitoring plan for tool drift. The results obtained in this paper were collected over a year and included data
before and after maintenance events (ie. Tip changes.)
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