Prof. Tsai-Sheng Gau Profile

Prof. Tsai-Sheng Gau

Distinguished Professor at Taiwan National Tsinghua University

SPIE Involvement:

Author

Publications (49)

SPIE Journal Paper | 14 June 2023 Open Access

Ultra-fast aerial image simulation algorithm using wavelength scaling and fast Fourier transformation to speed up calculation by more than three orders of magnitude

Tsai-Sheng Gau, Po-Hsiung Chen, Burn J. Lin, Fu-Hsiang Ko, Chun-Kung Chen, Anthony Yen

JM3, Vol. 22, Issue 02, 023201, (June 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.2.023201

KEYWORDS: Fourier transforms, Computer simulations, Light sources and illumination, Diffraction, Ultrafast phenomena, Lithography, Matrices, Optical proximity correction, Partial coherence, Optical lithography

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Proceedings Article | 15 March 2016 Paper

Inverse polarizer on immersion lithography mask

Minfeng Chen, Shuo-Yen Chou, Chun-Kuang Chen, Ru-Gun Liu, Tsai-Sheng Gau

Proceedings Volume 9780, 97801R (2016) https://doi.org/10.1117/12.2225127

KEYWORDS: Diffraction, Photomasks, Polarizers, Dielectric polarization, Image quality, Polarization, Transmittance, Immersion lithography, Lithography, Diffraction gratings

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Proceedings Article | 8 March 2016 Paper

A novel method to quantify the complex mask patterns

Yu-Lung Tung, Che-Yuan Sun, Shu-Chuan Chuang, Woei-Bin Luo, Jia-Rui Hu, Hsiang-Lin Chen, Hua-Tai Lin, Chih-Ming Ke, Tsai-Sheng Gau

Proceedings Volume 9778, 97783S (2016) https://doi.org/10.1117/12.2218346

KEYWORDS: Photomasks, Optical lithography, Critical dimension metrology, Optical proximity correction, Image processing, Process control, 193nm lithography, Lithography, Semiconductors, Performance modeling, Electron beam lithography, Mask making, Metrology

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Proceedings Article | 19 March 2015 Paper

Simulation of AIMS measurements using rigorous mask 3D modeling

Chih-Shiang Chou, Hsu-Ting Huang, Fu-Sheng Chu, Yuan-Chih Chu, Wen-Chun Huang, Ru-Gun Liu, Tsai-Sheng Gau

Proceedings Volume 9424, 94241A (2015) https://doi.org/10.1117/12.2085113

KEYWORDS: Photomasks, 3D modeling, Inspection, Diffraction, 3D metrology, Semiconducting wafers, 3D image processing, Calibration, Scattering, Wafer inspection

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Proceedings Article | 2 April 2014 Paper

Improving on-product performance at litho using integrated diffraction-based metrology and computationally designed device-like targets fit for advanced technologies (incl. FinFET)

Kai-Hsiung Chen, GT Huang, KS Chen, C. Hsieh, YC Chen, CM Ke, TS Gau, YC Ku, Kaustuve Bhattacharyya, Jacky Huang, Arie den Boef, Maurits v. d. Schaar, Martijn Maassen, Reinder Plug, Youping Zhang, Steffen Meyer, Martijn van Veen, Chris de Ruiter, Jon Wu, Hua Xu, Tatung Chow, Charlie Chen, Eric Verhoeven, Pu Li, Paul Hinnen, Greet Storms, Kelvin Pao, Gary Zhang, Christophe Fouquet, Takuya Mori

Proceedings Volume 9050, 90500S (2014) https://doi.org/10.1117/12.2047098

KEYWORDS: Overlay metrology, Metrology, Semiconducting wafers, Back end of line, Scanners, Diffraction, Front end of line, Process control, Etching

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Proceedings Article | 31 March 2014 Paper

Resist profile simulation with fast lithography model

Yan-Ying He, Chih-Shiang Chou, Yu-Po Tang, Wen-Chun Huang, Ru-Gun Liu, Tsai-Sheng Gau

Proceedings Volume 9052, 90520Y (2014) https://doi.org/10.1117/12.2045538

KEYWORDS: 3D modeling, Scanning electron microscopy, Diffusion, Data modeling, Lithography, Calibration, Semiconducting wafers, Visual process modeling, 3D image processing, Optical proximity correction

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Proceedings Article | 18 April 2013 Paper

Reduction of image-based ADI-to-AEI overlay inconsistency with improved algorithm

Yen-Liang Chen, Shu-Hong Lin, Kai-Hsiung Chen, Chih-Ming Ke, Tsai-Sheng Gau

Proceedings Volume 8681, 86812P (2013) https://doi.org/10.1117/12.2010570

KEYWORDS: Semiconducting wafers, Overlay metrology, Artificial intelligence, Evolutionary algorithms, Quality measurement, Microscopes, Etching, Semiconductor manufacturing, Optical properties, Chemical mechanical planarization

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Proceedings Article | 12 April 2013 Paper

Interference harmonics and rigorous EM spectrum analysis method for low-k1 CD Bossung tilt correction

Shuo-Yen Chou, Hoi-Tou Ng, Yi-Yin Chen, Chien-Fu Lee, Ru-Gun Liu, Tsai-Sheng Gau

Proceedings Volume 8683, 868315 (2013) https://doi.org/10.1117/12.2010599

KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Diffraction, Reflectivity, Polarization, Spectrum analysis, Control systems, Critical dimension metrology, Resolution enhancement technologies

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Proceedings Article | 10 April 2013 Paper

On-product overlay enhancement using advanced litho-cluster control based on integrated metrology, ultra-small DBO targets and novel corrections

Kaustuve Bhattacharyya, Chih-Ming Ke, Guo-Tsai Huang, Kai-Hsiung Chen, Henk-Jan Smilde, Andreas Fuchs, Martin Jak, Mark van Schijndel, Murat Bozkurt, Maurits van der Schaar, Steffen Meyer, Miranda Un, Stephen Morgan, Jon Wu, Vincent Tsai, Frida Liang, Arie den Boef, Peter ten Berge, Michael Kubis, Cathy Wang, Christophe Fouquet, L. Terng, David Hwang, Kevin Cheng, TS Gau, Y. C. Ku

Proceedings Volume 8681, 868104 (2013) https://doi.org/10.1117/12.2011878

KEYWORDS: Overlay metrology, Metrology, Semiconducting wafers, Time metrology, Chemical mechanical planarization, Scanners, Diffraction, Thin film coatings, Tin, High volume manufacturing

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Proceedings Article | 10 April 2013 Paper

Joint calibration of 3D resist image and CDSEM

C. S. Chou, Y. Y. He, Y. P. Tang, Y. T. Chang, W. C. Huang, R. G. Liu, T. S. Gau

Proceedings Volume 8681, 868113 (2013) https://doi.org/10.1117/12.2010846

KEYWORDS: 3D modeling, Scanning electron microscopy, Photoresist materials, Diffusion, Calibration, Critical dimension metrology, Performance modeling, 3D image processing, Optical proximity correction, Lithography

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Proceedings Article | 5 April 2012 Paper

Quality indicators of image-based overlay

Yen-Liang Chen, Jacky Huang, Rita Lee, Chen-Ming Wang, Chih-Ming Ke, Tsai-Sheng Gau

Proceedings Volume 8324, 83241C (2012) https://doi.org/10.1117/12.917995

KEYWORDS: Overlay metrology, Artificial intelligence, Image quality, Quality measurement, Image processing, Tolerancing, Process control, Semiconducting wafers, Optical alignment, Metrology

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Proceedings Article | 14 March 2012 Paper

Building 3D aerial image in photoresist with reconstructed mask image acquired with optical microscope

C. S. Chou, Y. P. Tang, F. S. Chu, W. C. Huang, R. G. Liu, T. S. Gau

Proceedings Volume 8326, 83261L (2012) https://doi.org/10.1117/12.917794

KEYWORDS: Photomasks, Semiconducting wafers, Reticles, 3D image reconstruction, Photoresist materials, Scanning electron microscopy, Reflection, Calibration, Refraction, 3D acquisition

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Proceedings Article | 13 March 2012 Paper

Multiple-image-depth modeling for hotspot and AF printing detections

Y. P. Tang, C. S. Chou, W. C. Huang, R. G. Liu, T. S. Gau

Proceedings Volume 8326, 832619 (2012) https://doi.org/10.1117/12.917402

KEYWORDS: Printing, Optical proximity correction, Atrial fibrillation, Calibration, Semiconducting wafers, Data modeling, 3D modeling, SRAF, Scanning electron microscopy, Cadmium

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Proceedings Article | 20 April 2011 Paper

Overlay and focus stability control for 28-nm nodes on immersion scanners

Guo-Tsai Huang, Kai-Hsiung Chen, Li-Jui Chen, Tsai-Sheng Gau, Reiner Jungblut, Albert Chen, Ethan Lee, Lester Wang, Miranda Un, Wei-Shun Tzeng, Jim Chen, Spencer Lin, Jon Wu

Proceedings Volume 7971, 79711M (2011) https://doi.org/10.1117/12.879055

KEYWORDS: Scanners, Semiconducting wafers, Metrology, Overlay metrology, Feedback control, Lithography, Finite element methods, Control systems, Scatterometry, Data modeling

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Proceedings Article | 2 April 2010 Paper

Detection of lateral CD shift with scatterometry on grating structures in production layout

Jacky Huang, Jiarui Hu, Willie Wang, Ya-Ping Lee, Chih-Ming Ke, Tsai-Sheng Gau

Proceedings Volume 7638, 76381Q (2010) https://doi.org/10.1117/12.848522

KEYWORDS: Overlay metrology, Scatterometry, Reflectivity, Critical dimension metrology, Laser marking, Metrology, Double patterning technology, Analytical research, Optical alignment, Semiconducting wafers

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Proceedings Article | 2 April 2010 Paper

A paradigm shift in scatterometry-based metrology solution addressing the most stringent needs of today as well as future lithography

C. Ke, Victor Shih, Jacky Huang, L. Chen, Willie Wang, G. Huang, W. Yang, Sophia Wang, C. Liang, H. Liu, H. Lee, L. Terng, T. Gau, John Lin, Kaustuve Bhattacharyya, Maurits van der Schaar, Noelle Wright, Marc Noot, Mir Shahrjerdy, Vivien Wang, Spencer Lin, Jon Wu, Sophie Peng, Gavin Liu, Wei-Shun Tzeng, Jim Chen, Andreas Fuchs, Omer Adam, Cathy Wang

Proceedings Volume 7638, 76383P (2010) https://doi.org/10.1117/12.853318

KEYWORDS: Overlay metrology, Metrology, Semiconducting wafers, Scanners, Back end of line, Lithography, 3D metrology, Finite element methods, Scatterometry, Critical dimension metrology

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Proceedings Article | 11 December 2009 Paper

A sophisticated metrology solution for advanced lithography: addressing the most stringent needs of today as well as future lithography

Victor Shih, Jacky Huang, Willie Wang, G. T. Huang, H. L. Chung, Alan Ho, W. T. Yang, Sophia Wang, Chih-Ming Ke, L. J. Chen, C. R. Liang, H. H. Liu, H. J. Lee, L. G. Terng, T. S. Gau, John Lin, Kaustuve Bhattacharyya, Maurits van der Schaar, Noelle Wright, Mir Shahrjerdy, Vivien Wang, Spencer Lin, Jon Wu, Sophie Peng, Dennis Chang, Cathy Wang, Andreas Fuchs, Omer Adam, Karel van der Mast

Proceedings Volume 7520, 75201A (2009) https://doi.org/10.1117/12.837353

KEYWORDS: Overlay metrology, Semiconducting wafers, Metrology, Scanners, Lithography, Back end of line, Metals, Scatterometry, Front end of line, Signal to noise ratio

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Proceedings Article | 22 March 2008 Paper

Sub-nanometer pitch calibration and data quality evaluation methodology

Chih-Ming Ke, Yu-hsi Wang, Jaffee Huang, Jimmy Hu, Jacky Huang, Tsai-Sheng Gau, Burn Lin

Proceedings Volume 6922, 69220I (2008) https://doi.org/10.1117/12.775410

KEYWORDS: Metrology, Critical dimension metrology, Scanning electron microscopy, Calibration, Semiconducting wafers, Process control, Silicon, Photomasks, Chemical species, Scatterometry

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Average CD of CD SEM and scatterometry CD (OCD) have been adopted for advanced CD control. The advantages and disadvantages of these two CD metrologies have been well discussed. The target of CD uniformity (CDU) for advanced technology has been driven to 1 nm, i.e. about three and half the size of a silicon atom, which is 0.29 nm. In the real production environment, engineers need to face sub-nanometer (< 1 nm) CD variations and do the necessary process corrections to meet the 1-nm CDU requirement. In other words, advanced CD process control has already been in the world of atomic scale. It turns out that methodology to ensure the accuracy of sub-nanometer CD has become essential for advanced CD control. In this paper, we introduced a methodology to produce 0.25, 0.5, and 1 nm programmed pitch offsets through mask design. These offsets are attainable with current process capability. Pitch offsets instead of line/space width offsets were used because the pitch is relatively process insensitive. The pitch has already been widely used as a CD SEM magnification calibration standard, e.g. Hitachi m-scale 240-nm pitch and VLSI 100-nm pitch standards. We produced large and small pitch splits to meet different magnification linearity requirements. We also used optical CD to verify the programmed pitch offset. Using the raw spectrum of OCD, systematic pitch signal changes in 0.25-nm steps can be detected, ensuring that 0.25-nm pitch offset standards are meaningful. Interestingly, 0.25 nm is smaller than the 0.29-nm Si atom. We also used this standard wafer to do the sampling size or data quality evaluation for different CD SEM measurement methodologies, e.g. 150K by 150K or 80K by 35K magnifications that in turn dictates the sample size. Pitch sensitivity is strongly related to the sampling size and line-edge roughness (LER). For example, 0.25-nm pitch sensitivity needs a larger sampling size than those of 0.5-nm and 1- nm pitch sensitivities. By means of this standard wafer, we can easily quantify metrology quality as well as choose the right metrology and sampling size for advanced process control.

Proceedings Article | 20 March 2008 Paper

Patterning fidelity on low-energy multiple-electron-beam direct write lithography

S. M. Chang, S. J. Lin, C. A. Lin, J. H. Chen, T. S. Gau, Burn Lin, P. Veltman, R. Hanfoug, E. Slot, M. Wieland, B. Kampherbeek

Proceedings Volume 6921, 69211R (2008) https://doi.org/10.1117/12.771392

KEYWORDS: Electrons, Line width roughness, Electron beam lithography, Scattering, Laser scattering, Monte Carlo methods, Optical simulations, Lithography, Raster graphics, Image resolution

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Proceedings Article | 17 March 2008 Paper

Influence of shot noise on CDU with DUV, EUV, and E-beam

Zhih-Yu Pan, Chun-Kuang Chen, Tsai-Sheng Gau, Burn Lin

Proceedings Volume 6924, 69241K (2008) https://doi.org/10.1117/12.776776

KEYWORDS: Extreme ultraviolet, Critical dimension metrology, Electron beam lithography, Deep ultraviolet, Lithography, Extreme ultraviolet lithography, Raster graphics, Quantum physics, Photons, Semiconducting wafers

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Proceedings Article | 6 April 2007 Paper

Effect of novel rinsing material and surfactant treatment on the resist pattern performance

Victor Huang, C. Chiu, C. Lin, Ching Yu Chang, T. Gau, Burn Lin

Proceedings Volume 6519, 65193C (2007) https://doi.org/10.1117/12.713051

KEYWORDS: Line width roughness, Capillaries, Scanners, Scanning electron microscopy, Logic, Liquids, Semiconducting wafers, Skin, Image processing, Immersion lithography

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Proceedings Article | 5 April 2007 Paper

OCD metrology by floating n/k

Shinn-Sheng Yu, Jacky Huang, Chih-Ming Ke, Tsai-Sheng Gau, Burn Lin, Anthony Yen, Lawrence Lane, Vi Vuong, Yan Chen

Proceedings Volume 6518, 65183C (2007) https://doi.org/10.1117/12.713341

KEYWORDS: Metrology, Semiconducting wafers, Critical dimension metrology, Lithography, Thin films, Scanning electron microscopy, Process control, Deposition processes, Roentgenium, Error analysis

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Proceedings Article | 27 March 2007 Paper

Immersion defect reduction, part I: analysis of water leaks in an immersion scanner

Fu-Jye Liang, Hsing Chang, Lin-Hung Shiu, Chun-Kuang Chen, Li-Jui Chen, Tsai-Sheng Gau, Burn J. Lin

Proceedings Volume 6520, 65204U (2007) https://doi.org/10.1117/12.712531

KEYWORDS: Semiconducting wafers, Scanners, Digital watermarking, Particles, Superposition, Microfluidics, Printing, Computer simulations, System identification, Immersion lithography

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Proceedings Article | 26 March 2007 Paper

Immersion defect reduction, part II: the formation mechanism and reduction of patterned defects

Lin-Hung Shiu, Fu-Jye Liang, Hsing Chang, Chun-Kuang Chen, Li-Jui Chen, Tsai-Sheng Gau, Burn Lin

Proceedings Volume 6520, 652012 (2007) https://doi.org/10.1117/12.712527

KEYWORDS: Particles, Semiconducting wafers, Scanning electron microscopy, Digital watermarking, Printing, Defect inspection, Polymers, Immersion lithography, Neodymium, Wafer-level optics

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SPIE Journal Paper | 1 January 2007 Open Access

Defect reduction with special routing for immersion lithography

Fu-Jye Liang, Lin-Hung Shiu, Chun-Kuang Chen, Li-Jui Chen, Tsai-Sheng Gau, Burn Lin

JM3, Vol. 6, Issue 01, 010501, (January 2007) https://doi.org/10.1117/12.10.1117/1.2718941

KEYWORDS: Semiconducting wafers, Particles, Immersion lithography, Printing, Scanners, Double patterning technology, Liquids, Digital watermarking, Wafer testing, Reticles

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Proceedings Article | 24 March 2006 Paper

ArF scanner performance improvement by using track integrated CD optimization

Jacky Huang, Shinn-Sheng Yu, Chih-Ming Ke, Timothy Wu, Yu-Hsi Wang, Tsai-Sheng Gau, Dennis Wang, Allen Li, Wenge Yang, Araki Kaoru

Proceedings Volume 6152, 615228 (2006) https://doi.org/10.1117/12.656104

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Sensors, Calibration, Error analysis, Scanners, Infrared sensors, Metrology, Wafer-level optics, Integrated optics

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SPIE Journal Paper | 1 October 2005

Thin-film optimization strategy in high numerical aperture optical lithography, part 1: principles

Shinn-Sheng Yu, Burn Lin, Anthony Yen, Chih-Ming Ke, Te-Chih Huang, Bang-Chein Ho, Chun-Kuang Chen, Tsai-Sheng Gau, Hung-Chang Hsieh, Yao-Ching Ku

JM3, Vol. 4, Issue 04, 043003, (October 2005) https://doi.org/10.1117/12.10.1117/1.2137967

KEYWORDS: Thin films, Wave propagation, Magnetism, Optical lithography, Critical dimension metrology, Interfaces, Scanners, Absorption, Lithography, Multilayers

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Proceedings Article | 12 May 2005 Paper

Characterization of ArF immersion process for production

Jeng-Horng Chen, Li-Jui Chen, Tun-Ying Fang, Tzung-Chi Fu, Lin-Hung Shiu, Yao-Te Huang, Norman Chen, Da-Chun Oweyang, Ming-Che Wu, Shih-Che Wang, John Lin, Chun-Kuang Chen, Wei-Ming Chen, Tsai-Sheng Gau, Burn Lin, Richard Moerman, Wendy Gehoel-van Ansem, Eddy van der Heijden, Fred de Jong, Dorothe Oorschot, Herman Boom, Martin Hoogendorp, Christian Wagner, Bert Koek

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.602025

KEYWORDS: Semiconducting wafers, Scanners, Immersion lithography, Particles, Lithography, Overlay metrology, Prototyping, Microfluidics, Water, Finite element methods

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Proceedings Article | 12 May 2005 Paper

Mask polarization effects in hyper NA systems

Chun-Kuang Chen, Tsai-Sheng Gau, Lin-Hung Shiu, Burn Lin

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.602032

KEYWORDS: Polarization, Photomasks, Diffraction, Optical lithography, Image acquisition, Semiconducting wafers, Projection systems, Immersion lithography, Computer simulations, Lenses

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Proceedings Article | 10 May 2005 Paper

Evaluation of line and hole measurement by high-resolution low-magnification CD SEM

Chih-Ming Ke, Chi-Chuang Lee, Yu-Hsi Wang, Heng-Jen Lee, Chin-Hsiang Lin, Tsai-Sheng Gau, Burn Lin, Hiroki Kawada, Kazuhiro Ueda, Hiroaki Nomura, Nelson Ren, Takashi Iizumi

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.601133

KEYWORDS: Critical dimension metrology, Scanning electron microscopy, Semiconducting wafers, Line edge roughness, Finite element methods, Metrology, Wafer-level optics, Optical testing, Cadmium, Inspection

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Proceedings Article | 6 December 2004 Paper

Phase-defocus windows for alternating phase shifting mask

Fu-Jye Liang, Chun-Kuang Chen, Jaw-Jung Shin, Jan-Wen You, Chun-Heng Lin, Zhin-Yu Pan, King-Chang Shu, Tsai-Sheng Gau, Burn Lin

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569216

KEYWORDS: Photomasks, Semiconducting wafers, Phase shifting, Phase shifts, Photomask technology, Optical lithography, Quartz, Etching, Mask making

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Proceedings Article | 20 August 2004 Paper

Study of mask corner rounding effects on lithographic patterning for 90-nm technology node and beyond

Shuo-Yen Chou, Jaw-Jung Shin, King-Chang Shu, Jan-Wen You, Lin-Hung Shiu, Bin-Chang Chang, Tsai-Sheng Gau, Burn Lin

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557745

KEYWORDS: Photomasks, Lithography, Scanning electron microscopy, Laser energy, Image processing, Electron beam lithography, Semiconducting wafers, Optical simulations, Optical proximity correction, Convolution

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Proceedings Article | 28 May 2004 Paper

General scaling law of optical lithography: optical theory

Chun-Kuang Chen, Tsai-Sheng Gau, Li-Jui Chen, Chi-Chuang Lee, Jaw-Jung Shin, Anthony Yen, Burn-Jeng Lin

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536667

KEYWORDS: Optical lithography, Optics manufacturing, Manufacturing

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Proceedings Article | 28 May 2004 Paper

Study of line edge roughness using continuous wavelet transform for 65-nm node

Lin-Hung Shiu, Chun-Kuang Chen, Tsai-Sheng Gau, Burn-Jeng Lin

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536649

KEYWORDS: Line edge roughness, Critical dimension metrology, Lithography, Continuous wavelet transforms, Photoresist processing, Image processing, Optical lithography, Polymers, Photomasks, Modulation

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Proceedings Article | 24 May 2004 Paper

Quantification of CD-SEM wafer global charging effect on CD and CD uniformity of 193 nm lithography

Chih-Ming Ke, Hsueh-Liang Hung, Anderson Chang, Jeng-Horng Chen, Tsai-Sheng Gau, Yao-Ching Ku, Burn Lin, Tadashi Otaka, Kazuhiro Ueda, Hiroki Kawada, Hiroaki Nomura, Nelson Ren

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.536147

KEYWORDS: Semiconducting wafers, Scanning electron microscopy, Critical dimension metrology, Lithography, Metrology, Silicon, Standards development, Very large scale integration, Distortion, Inspection

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Proceedings Article | 24 May 2004 Paper

90-nm lithography process characterization using ODP scatterometry technology

Chih-Ming Ke, Shinn-Sheng Yu, Yu-Hsi Wang, Yu-Jun Chou, Jeng-Horng Chen, Bih-Huey Lee, Hong-Yuan Chu, Hua-Tai Lin, Tsai-Sheng Gau, Chih-Hsiang Lin, Yao-Ching Ku, Burn Lin, Jacky Huang, J. Hsu, Victor Liu, Dave Hetzer, Lip Yap, Wenge Yang, Kaoru Araki

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.536123

KEYWORDS: Critical dimension metrology, Scanning electron microscopy, Semiconducting wafers, Transmission electron microscopy, Metrology, Scatterometry, Finite element methods, Process control, Lithography, Wafer-level optics

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SPIE Journal Paper | 1 April 2004

Mask error tensor and causality of mask error enhancement for low-k₁ imaging: theory and experiments

Chun-Kuang Chen, Tsai-Sheng Gau, Jaw-Jung Shin, Ru-Gun Liu, Shinn-Sheng Yu, Anthony Yen, Burn-Jeng Lin

JM3, Vol. 3, Issue 02, (April 2004) https://doi.org/10.1117/12.10.1117/1.1669508

KEYWORDS: Photomasks, Critical dimension metrology, Semiconducting wafers, Tolerancing, Error analysis, Scanners, Diffraction, Solids, Lithography, Electroluminescence

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SPIE Journal Paper | 1 January 2004

Image characterization of bubbles in water for 193-nm immersion lithography-far-field approach

Tsai-Sheng Gau, Chun-Kuang Chen, Burn-Jeng Lin

JM3, Vol. 3, Issue 01, (January 2004) https://doi.org/10.1117/12.10.1117/1.1630602

KEYWORDS: Scattering, Water, Refractive index, Mie scattering, Rayleigh scattering, Image acquisition, Spherical lenses, Immersion lithography, Statistical analysis, Photons

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Proceedings Article | 28 August 2003 Paper

Pattern-dependence optical phase effect on alternating phase shift mask

Bin-Chang Chang, Jan-Wen You, Ming Lu, Chiu-Lien Lee, Li-Wei Kung, King-Chang Shu, Jaw-Jung Shin, Tsai-Sheng Gau, Burn-Jeng Lin

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504284

KEYWORDS: Photomasks, Quartz, Etching, Chromium, Phase shifts, Wet etching, Reactive ion etching, Semiconducting wafers, Mask making, Resolution enhancement technologies

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Proceedings Article | 2 June 2003 Paper

Application of scatterometry for CD and profile metrology in 193-nm lithography process development

Li-Jui Chen, Chih-Ming Ke, Shinn Sheng Yu, Tsai-Sheng Gau, Pei-Hung Chen, Yao Ching Ku, Burn Lin, Dan Engelhard, Dave Hetzer, Jason Yang, Kelly Barry, Lip Yap, Wenge Yang

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.483692

KEYWORDS: Scatterometry, Critical dimension metrology, Metrology, Lithography, Scanning electron microscopy, Semiconducting wafers, Deep ultraviolet, Scatter measurement, Reflectometry, Photoresist materials

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Proceedings Article | 2 June 2003 Paper

Characterization of charging in CD-SEM for 90-nm metrology and beyond

Li-Jui Chen, Shang-Wei Lin, Tsai-Sheng Gau, Burn Lin

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.483690

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Image quality, Optical proximity correction, Distance measurement, Scanning electron microscopy, Metrology, Time metrology, Electron beams, Electrons

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Proceedings Article | 27 December 2002 Paper

Alt-PSM of contact with phase-assist feature for 65-nm node

Jan-Wen You, Jaw-Jung Shin, Chung-Hsing Chang, Li-Wei Kung, Bin-Chang Chang, Chang-Min Dai, Tsai-Sheng Gau, Burn Lin

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467499

KEYWORDS: Photomasks, Resolution enhancement technologies, Etching, Wet etching, Optical lithography, Dry etching, Semiconducting wafers, Chromium, Reticles, Phase shifts

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SPIE Journal Paper | 1 October 2002

Customized illumination aperture filter design for through-pitch focus latitude enhancement of deep submicron contact hole printing

Shuo-Yen Chou, Jen-Chung Lou, Fu-Jye Liang, Tsai-Sheng Gau, Ru-Gun Liu, Chun-Kuang Chen, Chih-Ming Lai

JM3, Vol. 1, Issue 03, (October 2002) https://doi.org/10.1117/12.10.1117/1.1502261

KEYWORDS: Diffraction, Printing, Photomasks, Phase shifts, Lithographic illumination, Visualization, Monochromatic aberrations, Lithography, Optical lithography, Resolution enhancement technologies

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Proceedings Article | 30 July 2002 Paper

Mask error tensor and causality of mask error enhancement for low-k1 imaging: theory and experiments

Chun-Kuang Chen, Tsai-Sheng Gau, Jaw-Jung Shin, Ru-Gun Liu, Shinn Sheng Yu, Anthony Yen, Burn Lin

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474574

KEYWORDS: Photomasks, Critical dimension metrology, Semiconducting wafers, Mask making, Lithography, Tolerancing, Scanners, Optical lithography, Error analysis, Semiconductor manufacturing

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Proceedings Article | 16 July 2002 Paper

Effect of various ArF resist shrinkage amplitudes on CD bias

Chih-Ming Ke, Tsai-Sheng Gau, Pei-Hung Chen, Anthony Yen, Burn Lin, Tadashi Otaka, Takashi Iizumi, Katsuhiro Sasada, Kazuo Ueda

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473428

KEYWORDS: Scanning electron microscopy, Critical dimension metrology, Time metrology, Etching, Optical testing, Image resolution, Inspection, Plasma, Semiconducting wafers, Metrology

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Proceedings Article | 14 September 2001 Paper

Optimal positions for SB assignment and the specification of SB width variation

Chih-Ming Lai, Ru-Gun Liu, Tsai-Sheng Gau, Fu-Jye Liang, Shuo-Yen Chou, Lin-Hung Shiu

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435683

KEYWORDS: Antimony, Scattering, Critical dimension metrology, Double sideband modulation, Resolution enhancement technologies, Modulation, Superposition, Light scattering, Chromium, Photoresist processing

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Proceedings Article | 5 July 2000 Paper

Customized illumination aperture filter for low k1 photolithography process

Tsai-Sheng Gau, Ru-Gun Liu, Chun-Kuang Chen, Chih-Ming Lai, Fu-Jye Liang, Chin Hsia

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389016

KEYWORDS: Optical proximity correction, Diffraction, Printing, Optical lithography, Electroluminescence, Lithographic illumination, Resolution enhancement technologies, Photomasks, Scanning electron microscopy, Diffractive optical elements

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Proceedings Article | 26 July 1999 Paper

Customized off-axis illumination aperture filtering for sub-0.18-um KrF lithography

Chin Hsia, Tsai-Sheng Gau, Chuen-Huei Yang, Ru-Gun Liu, ChungHsing Chang, Li-Jui Chen, Chien-Ming Wang, J. Fung Chen, Bruce Smith, Gue-Wuu Hwang, JiannWen Lay, Dong-Yuan Goang

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354354

KEYWORDS: Optical proximity correction, Lithographic illumination, Optical filters, Resolution enhancement technologies, Electroluminescence, Lithography, Optical lithography, Photomasks, Modulation, Calcium

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Proceedings Article | 29 June 1998 Paper

Strategy for manipulating the optical proximity effect by postexposure bake processing

Tsai-Sheng Gau, Chien-Ming Wang, Chang-Ming Dai

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310823

KEYWORDS: Deep ultraviolet, Optical proximity correction, Resolution enhancement technologies, Lithography, Critical dimension metrology, Lithographic illumination, Chlorine, Phase shifting, Optical calibration, Reticles

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