Mr. Umar K. Whitney Profile

Umar K. Whitney

Product Marketing Manager at Xradia

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Author

Publications (4)

Proceedings Article | 24 March 2006 Paper

Enabling DFM and APC strategies with advanced process metrics

Kevin Monahan, Umar Whitney

Proceedings Volume 6152, 61521E (2006) https://doi.org/10.1117/12.655894

KEYWORDS: Metrology, Design for manufacturing, Scanning electron microscopy, Single crystal X-ray diffraction, Overlay metrology, Dielectrics, Critical dimension metrology, Data modeling, Calibration, Lithography

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Proceedings Article | 16 July 2002 Paper

Spectral scatterometry for 2D trench metrology of low-K dual-damascene interconnect

Vladimir Ukraintsev, Mak Kulkarni, Christopher Baum, Karen Kirmse, Marco Guevremont, Suresh Lakkapragada, Kamal Bhatia, Pedro Herrera, Umar Whitney

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473457

KEYWORDS: Scatterometry, Critical dimension metrology, Atomic force microscopy, Scanning electron microscopy, Transmission electron microscopy, Silicon, Metrology, Dielectrics, Reactive ion etching, Semiconducting wafers

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Proceedings Article | 22 August 2001 Paper

Implementation of spectroscopic critical dimension (SCD) (TM) for gate CD control and stepper characterization

John Allgair, David Benoit, Mark Drew, Robert Hershey, Lloyd Litt, Pedro Herrera, Umar Whitney, Marco Guevremont, Ady Levy, Suresh Lakkapragada

Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436771

KEYWORDS: Single crystal X-ray diffraction, Critical dimension metrology, Semiconducting wafers, Scanning electron microscopy, Process control, Spectroscopy, Spectroscopes, Metrology, Precision measurement, Control systems

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Proceedings Article | 2 June 2000 Paper

Manufacturing considerations for implementation of scatterometry for process monitoring

John Allgair, David Benoit, Robert Hershey, Lloyd Litt, Ibrahim Abdulhalim, William Braymer, Michael Faeyrman, John Robinson, Umar Whitney, Yiping Xu, Piotr Zalicki, Joel Seligson

Proceedings Volume 3998, (2000) https://doi.org/10.1117/12.386465

KEYWORDS: Scatterometry, Reflectivity, Scanning electron microscopy, Critical dimension metrology, Metrology, Silicon, Atomic force microscopy, Manufacturing, Process control, Semiconducting wafers

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